HK1019231A1 - Chemical mechanical polishing composition - Google Patents
Chemical mechanical polishing compositionInfo
- Publication number
- HK1019231A1 HK1019231A1 HK99104307A HK99104307A HK1019231A1 HK 1019231 A1 HK1019231 A1 HK 1019231A1 HK 99104307 A HK99104307 A HK 99104307A HK 99104307 A HK99104307 A HK 99104307A HK 1019231 A1 HK1019231 A1 HK 1019231A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- mechanical polishing
- chemical mechanical
- polishing composition
- composition
- chemical
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 97116569 CN1092696C (en) | 1997-10-08 | 1997-10-08 | Chemical Machinery grinding compsn. |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1019231A1 true HK1019231A1 (en) | 2000-01-28 |
Family
ID=5173947
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK99104307A HK1019231A1 (en) | 1997-10-08 | 1999-10-04 | Chemical mechanical polishing composition |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN1092696C (en) |
HK (1) | HK1019231A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100383209C (en) * | 2006-05-31 | 2008-04-23 | 河北工业大学 | Chemical and mechanical water-free polishing liquid for lithium-cessium borate crystal and leveling method |
-
1997
- 1997-10-08 CN CN 97116569 patent/CN1092696C/en not_active Expired - Fee Related
-
1999
- 1999-10-04 HK HK99104307A patent/HK1019231A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1092696C (en) | 2002-10-16 |
CN1213684A (en) | 1999-04-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PF | Patent in force | ||
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20061008 |