GR1005438B - Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων - Google Patents

Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων

Info

Publication number
GR1005438B
GR1005438B GR20050100472A GR20050100472A GR1005438B GR 1005438 B GR1005438 B GR 1005438B GR 20050100472 A GR20050100472 A GR 20050100472A GR 20050100472 A GR20050100472 A GR 20050100472A GR 1005438 B GR1005438 B GR 1005438B
Authority
GR
Greece
Prior art keywords
polycarbocycles
functionalized
components
resists based
photoresists
Prior art date
Application number
GR20050100472A
Other languages
English (en)
Inventor
Daman R. Gautam
Original Assignee
������ ������� ������� ��������� (�.�.�.�.�.) "����������"
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ������ ������� ������� ��������� (�.�.�.�.�.) "����������", filed Critical ������ ������� ������� ��������� (�.�.�.�.�.) "����������"
Priority to GR20050100472A priority Critical patent/GR1005438B/el
Priority to EP06779677A priority patent/EP1941324A2/en
Priority to PCT/GR2006/000050 priority patent/WO2007031803A2/en
Priority to US12/066,995 priority patent/US8247158B2/en
Publication of GR1005438B publication Critical patent/GR1005438B/el

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Η παρούσα εφεύρεση αναφέρεται σε νέα οργανικά μόρια που ανήκουν στην τάξη των παραγώγων των πολυκαρβοκυκλικών ενώσεων, ως συστατικών φωτοευαίσθητων λιθογραφικών υλικών (photoresists), και συγκεκριμένα ως συστατικών φωτοευαίσθητων λιθογραφικών υλικών(διαφορετικών συστάσεων) τα οποία δεν περιέχουν πολυμερές ως ένα εκ των συστατικών τους και στην εφαρμογή των μορίων αυτών. Στα υλικά αυτά φωτοευαίσθητων λιθογραφικών υλικών τα νέα μόρια συνιστούν τοκύριο ή τα κύρια συστατικά (ποσοστό μεγαλύτερο το50% κατά βάρος).
GR20050100472A 2005-09-16 2005-09-16 Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων GR1005438B (el)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GR20050100472A GR1005438B (el) 2005-09-16 2005-09-16 Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων
EP06779677A EP1941324A2 (en) 2005-09-16 2006-09-18 Molecular resists based on functionalized polycarbocycles
PCT/GR2006/000050 WO2007031803A2 (en) 2005-09-16 2006-09-18 Molecular resists based on functionalized polycarbocycles
US12/066,995 US8247158B2 (en) 2005-09-16 2006-09-18 Molecular resists based on functionalized polycarbocycles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GR20050100472A GR1005438B (el) 2005-09-16 2005-09-16 Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων

Publications (1)

Publication Number Publication Date
GR1005438B true GR1005438B (el) 2007-02-14

Family

ID=37865307

Family Applications (1)

Application Number Title Priority Date Filing Date
GR20050100472A GR1005438B (el) 2005-09-16 2005-09-16 Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων

Country Status (4)

Country Link
US (1) US8247158B2 (el)
EP (1) EP1941324A2 (el)
GR (1) GR1005438B (el)
WO (1) WO2007031803A2 (el)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000305270A (ja) * 1999-04-20 2000-11-02 Yasuhiko Shirota 化学増幅型新規低分子系レジスト材料を用いるパターン形成
WO2003038523A2 (en) * 2001-11-01 2003-05-08 Ncsr Demokritos Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties
US20030211421A1 (en) * 2001-03-29 2003-11-13 Makoto Hanabata Optically active compound and photosensitive resin composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000305270A (ja) * 1999-04-20 2000-11-02 Yasuhiko Shirota 化学増幅型新規低分子系レジスト材料を用いるパターン形成
US20030211421A1 (en) * 2001-03-29 2003-11-13 Makoto Hanabata Optically active compound and photosensitive resin composition
WO2003038523A2 (en) * 2001-11-01 2003-05-08 Ncsr Demokritos Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
FOX M ET AL: "Photophysics of 10-Substituted Bis[ 2-(9-anthryl)ethyl] Glutarates", JOURNAL OF PHYSICAL CHEMISTRY, vol. 94, no. 16, 1990, USAMERICAN CHEMICAL SOCIETY, pages 6351 - 6360, XP002385597 *
GOGOLIDES E ET AL: "Photoresist etch resistance enhancement using novel polycarbocyclic derivatives as additives", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B., vol. B21, no. 1, January 2003 (2003-01-01) - February 2003 (2003-02-01), USAVS / AIP, MELVILLE, NEW YORK, NY., pages 141 - 147, XP002385596 *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 14 5 March 2001 (2001-03-05) *
TAKAHASHI M ET AL: "Synthesis and characterization of anthracene-clustering dendrimers: observation of fluorescence resonance energy transfer in the multichromophoric system", TETRAHEDRON, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, NL, vol. 60, no. 51, 13 December 2004 (2004-12-13), pages 11771 - 11781, XP004638987, ISSN: 0040-4020 *

Also Published As

Publication number Publication date
US20090220887A1 (en) 2009-09-03
US8247158B2 (en) 2012-08-21
WO2007031803A3 (en) 2008-03-13
EP1941324A2 (en) 2008-07-09
WO2007031803A2 (en) 2007-03-22

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