GR1005438B - Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων - Google Patents
Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεωνInfo
- Publication number
- GR1005438B GR1005438B GR20050100472A GR20050100472A GR1005438B GR 1005438 B GR1005438 B GR 1005438B GR 20050100472 A GR20050100472 A GR 20050100472A GR 20050100472 A GR20050100472 A GR 20050100472A GR 1005438 B GR1005438 B GR 1005438B
- Authority
- GR
- Greece
- Prior art keywords
- polycarbocycles
- functionalized
- components
- resists based
- photoresists
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
- G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
- G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
Abstract
Η παρούσα εφεύρεση αναφέρεται σε νέα οργανικά μόρια που ανήκουν στην τάξη των παραγώγων των πολυκαρβοκυκλικών ενώσεων, ως συστατικών φωτοευαίσθητων λιθογραφικών υλικών (photoresists), και συγκεκριμένα ως συστατικών φωτοευαίσθητων λιθογραφικών υλικών(διαφορετικών συστάσεων) τα οποία δεν περιέχουν πολυμερές ως ένα εκ των συστατικών τους και στην εφαρμογή των μορίων αυτών. Στα υλικά αυτά φωτοευαίσθητων λιθογραφικών υλικών τα νέα μόρια συνιστούν τοκύριο ή τα κύρια συστατικά (ποσοστό μεγαλύτερο το50% κατά βάρος).
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GR20050100472A GR1005438B (el) | 2005-09-16 | 2005-09-16 | Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων |
EP06779677A EP1941324A2 (en) | 2005-09-16 | 2006-09-18 | Molecular resists based on functionalized polycarbocycles |
PCT/GR2006/000050 WO2007031803A2 (en) | 2005-09-16 | 2006-09-18 | Molecular resists based on functionalized polycarbocycles |
US12/066,995 US8247158B2 (en) | 2005-09-16 | 2006-09-18 | Molecular resists based on functionalized polycarbocycles |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GR20050100472A GR1005438B (el) | 2005-09-16 | 2005-09-16 | Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων |
Publications (1)
Publication Number | Publication Date |
---|---|
GR1005438B true GR1005438B (el) | 2007-02-14 |
Family
ID=37865307
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GR20050100472A GR1005438B (el) | 2005-09-16 | 2005-09-16 | Μοριακα λιθογραφικα υλικα (resists) βασισμενα σε παραγωγα πολυκαρβοκυκλικων ενωσεων |
Country Status (4)
Country | Link |
---|---|
US (1) | US8247158B2 (el) |
EP (1) | EP1941324A2 (el) |
GR (1) | GR1005438B (el) |
WO (1) | WO2007031803A2 (el) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000305270A (ja) * | 1999-04-20 | 2000-11-02 | Yasuhiko Shirota | 化学増幅型新規低分子系レジスト材料を用いるパターン形成 |
WO2003038523A2 (en) * | 2001-11-01 | 2003-05-08 | Ncsr Demokritos | Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties |
US20030211421A1 (en) * | 2001-03-29 | 2003-11-13 | Makoto Hanabata | Optically active compound and photosensitive resin composition |
-
2005
- 2005-09-16 GR GR20050100472A patent/GR1005438B/el active IP Right Grant
-
2006
- 2006-09-18 WO PCT/GR2006/000050 patent/WO2007031803A2/en active Application Filing
- 2006-09-18 EP EP06779677A patent/EP1941324A2/en not_active Withdrawn
- 2006-09-18 US US12/066,995 patent/US8247158B2/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000305270A (ja) * | 1999-04-20 | 2000-11-02 | Yasuhiko Shirota | 化学増幅型新規低分子系レジスト材料を用いるパターン形成 |
US20030211421A1 (en) * | 2001-03-29 | 2003-11-13 | Makoto Hanabata | Optically active compound and photosensitive resin composition |
WO2003038523A2 (en) * | 2001-11-01 | 2003-05-08 | Ncsr Demokritos | Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties |
Non-Patent Citations (4)
Title |
---|
FOX M ET AL: "Photophysics of 10-Substituted Bis[ 2-(9-anthryl)ethyl] Glutarates", JOURNAL OF PHYSICAL CHEMISTRY, vol. 94, no. 16, 1990, USAMERICAN CHEMICAL SOCIETY, pages 6351 - 6360, XP002385597 * |
GOGOLIDES E ET AL: "Photoresist etch resistance enhancement using novel polycarbocyclic derivatives as additives", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART B., vol. B21, no. 1, January 2003 (2003-01-01) - February 2003 (2003-02-01), USAVS / AIP, MELVILLE, NEW YORK, NY., pages 141 - 147, XP002385596 * |
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 14 5 March 2001 (2001-03-05) * |
TAKAHASHI M ET AL: "Synthesis and characterization of anthracene-clustering dendrimers: observation of fluorescence resonance energy transfer in the multichromophoric system", TETRAHEDRON, ELSEVIER SCIENCE PUBLISHERS, AMSTERDAM, NL, vol. 60, no. 51, 13 December 2004 (2004-12-13), pages 11771 - 11781, XP004638987, ISSN: 0040-4020 * |
Also Published As
Publication number | Publication date |
---|---|
US20090220887A1 (en) | 2009-09-03 |
US8247158B2 (en) | 2012-08-21 |
WO2007031803A3 (en) | 2008-03-13 |
EP1941324A2 (en) | 2008-07-09 |
WO2007031803A2 (en) | 2007-03-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PG | Patent granted |