GB998239A - A method of manufacturing thin metal films - Google Patents

A method of manufacturing thin metal films

Info

Publication number
GB998239A
GB998239A GB814564A GB814564A GB998239A GB 998239 A GB998239 A GB 998239A GB 814564 A GB814564 A GB 814564A GB 814564 A GB814564 A GB 814564A GB 998239 A GB998239 A GB 998239A
Authority
GB
United Kingdom
Prior art keywords
film
oxygen
resistance
substrate
agglomeration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB814564A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of GB998239A publication Critical patent/GB998239A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02Pretreatment of the material to be coated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

<PICT:0998239/C6-C7/1> A metal film of, e.g., Sb, In, Pb, Zn or Cd, is vapour deposited on to a substrate which is cooled during the deposition, after which the film is heated and reacted with a gas, e.g. oxygen, water vapour or hydrogen. A substrate 6, on to which lands 16 have been deposited, is supported in a housing 2 and cooled by a source 14 of liquid oxygen. With a low pressure in the housing maintained by a pump 11, a metal 10 in a crucible 80 is heated and evaporated on to the substrate through a mask (not shown) to form a film 12 in contact with the lands 16 from which probes 18, 20 extend to a suitable meter 22 to monitor the electrical resistance of the film. When evaporation is completed, cooling is stopped and the substrate heats to room temperature causing agglomeration of the film which increases its resistance. At a given resistance, oxygen from a reservoir 24 is introduced into the housing to react with the film and stop further agglomeration. The oxygen supply is stopped when a constant resistance reading indicates that agglomeration has ceased. If oxygen is introduced sooner, agglomeration is prevented and a film free of voids is obtained. The film resistance may be monitored optically by a photocell sensing light passing through the film. The metal film may then be covered with an insulating material, e.g. silicon monoxide.
GB814564A 1963-03-26 1964-02-27 A method of manufacturing thin metal films Expired GB998239A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26313663A 1963-03-26 1963-03-26

Publications (1)

Publication Number Publication Date
GB998239A true GB998239A (en) 1965-07-14

Family

ID=23000522

Family Applications (1)

Application Number Title Priority Date Filing Date
GB814564A Expired GB998239A (en) 1963-03-26 1964-02-27 A method of manufacturing thin metal films

Country Status (1)

Country Link
GB (1) GB998239A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008134467A1 (en) * 2007-04-26 2008-11-06 Air Products And Chemicals, Inc. Apparatuses and methods for cryogenic cooling in thermal surface treatment processes
US8293035B2 (en) 2006-10-12 2012-10-23 Air Products And Chemicals, Inc. Treatment method, system and product
US8715772B2 (en) 2005-04-12 2014-05-06 Air Products And Chemicals, Inc. Thermal deposition coating method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8715772B2 (en) 2005-04-12 2014-05-06 Air Products And Chemicals, Inc. Thermal deposition coating method
US8293035B2 (en) 2006-10-12 2012-10-23 Air Products And Chemicals, Inc. Treatment method, system and product
WO2008134467A1 (en) * 2007-04-26 2008-11-06 Air Products And Chemicals, Inc. Apparatuses and methods for cryogenic cooling in thermal surface treatment processes

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