GB9930603D0 - Plasma process and apparatus - Google Patents
Plasma process and apparatusInfo
- Publication number
- GB9930603D0 GB9930603D0 GBGB9930603.7A GB9930603A GB9930603D0 GB 9930603 D0 GB9930603 D0 GB 9930603D0 GB 9930603 A GB9930603 A GB 9930603A GB 9930603 D0 GB9930603 D0 GB 9930603D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- plasma process
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9930603.7A GB9930603D0 (en) | 1999-12-24 | 1999-12-24 | Plasma process and apparatus |
PCT/GB2000/004927 WO2001048789A1 (en) | 1999-12-24 | 2000-12-22 | Plasma processing methods |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB9930603.7A GB9930603D0 (en) | 1999-12-24 | 1999-12-24 | Plasma process and apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
GB9930603D0 true GB9930603D0 (en) | 2000-02-16 |
Family
ID=10867012
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB9930603.7A Ceased GB9930603D0 (en) | 1999-12-24 | 1999-12-24 | Plasma process and apparatus |
Country Status (2)
Country | Link |
---|---|
GB (1) | GB9930603D0 (en) |
WO (1) | WO2001048789A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1444727A4 (en) * | 2001-10-22 | 2007-07-18 | Unaxis Usa Inc | Process and apparatus for etching of thin, damage sensitive layers using high frequency pulsed plasma |
US7517801B1 (en) | 2003-12-23 | 2009-04-14 | Lam Research Corporation | Method for selectivity control in a plasma processing system |
US8222155B2 (en) | 2004-06-29 | 2012-07-17 | Lam Research Corporation | Selectivity control in a plasma processing system |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8629634D0 (en) * | 1986-12-11 | 1987-01-21 | Dobson C D | Reactive ion & sputter etching |
FR2646557B1 (en) * | 1989-04-28 | 1997-07-18 | Canon Kk | PROCESS FOR FORMING A POLYCRYSTALLINE SEMICONDUCTOR FILM ON AN INSULATING SUBSTRATE |
US5240554A (en) * | 1991-01-22 | 1993-08-31 | Kabushiki Kaisha Toshiba | Method of manufacturing semiconductor device |
US5312717A (en) * | 1992-09-24 | 1994-05-17 | International Business Machines Corporation | Residue free vertical pattern transfer with top surface imaging resists |
-
1999
- 1999-12-24 GB GBGB9930603.7A patent/GB9930603D0/en not_active Ceased
-
2000
- 2000-12-22 WO PCT/GB2000/004927 patent/WO2001048789A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2001048789A1 (en) | 2001-07-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |