GB9624313D0 - Apparatus and method for detecting particles in process chamber of ion implanter - Google Patents

Apparatus and method for detecting particles in process chamber of ion implanter

Info

Publication number
GB9624313D0
GB9624313D0 GBGB9624313.4A GB9624313A GB9624313D0 GB 9624313 D0 GB9624313 D0 GB 9624313D0 GB 9624313 A GB9624313 A GB 9624313A GB 9624313 D0 GB9624313 D0 GB 9624313D0
Authority
GB
United Kingdom
Prior art keywords
process chamber
ion implanter
detecting particles
particles
detecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB9624313.4A
Other versions
GB2307779A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Priority to GB9800176A priority Critical patent/GB2317988A/en
Publication of GB9624313D0 publication Critical patent/GB9624313D0/en
Publication of GB2307779A publication Critical patent/GB2307779A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/022—Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
    • H01J2237/0225—Detecting or monitoring foreign particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
GB9624313A 1995-12-02 1996-11-22 Detecting contaminant particles during ion implantation Withdrawn GB2307779A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB9800176A GB2317988A (en) 1995-12-02 1996-11-22 Detecting contaminant particles during ion implantation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950046228A KR970053215A (en) 1995-12-02 1995-12-02 Pollution Measurement System and Pollution Measurement Method of Ion Implanter

Publications (2)

Publication Number Publication Date
GB9624313D0 true GB9624313D0 (en) 1997-01-08
GB2307779A GB2307779A (en) 1997-06-04

Family

ID=19437468

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9624313A Withdrawn GB2307779A (en) 1995-12-02 1996-11-22 Detecting contaminant particles during ion implantation

Country Status (5)

Country Link
JP (1) JPH09180668A (en)
KR (1) KR970053215A (en)
DE (1) DE19649640A1 (en)
GB (1) GB2307779A (en)
TW (1) TW316292B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7235795B2 (en) * 2004-08-12 2007-06-26 Applied Materials, Inc. Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process
KR100903915B1 (en) * 2009-04-27 2009-06-19 민용준 Feed through of ion injection apparatus

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3674576D1 (en) * 1985-12-10 1990-10-31 High Yield Technology PARTICLE DETECTOR FOR WAFER PROCESSING DEVICE AND METHOD FOR DETECTING A PARTICLE.
US4804853A (en) * 1987-04-23 1989-02-14 High Yield Technology Compact particle flux monitor
US4885473A (en) * 1988-04-29 1989-12-05 Shofner Engineering Associates, Inc. Method and apparatus for detecting particles in a fluid using a scanning beam
US5047648A (en) * 1990-04-20 1991-09-10 Applied Materials, Inc. Method and apparatus for detecting particles in ion implantation machines
JP3344129B2 (en) * 1994-12-06 2002-11-11 日新電機株式会社 Laser measurement device for suspended particles

Also Published As

Publication number Publication date
TW316292B (en) 1997-09-21
JPH09180668A (en) 1997-07-11
KR970053215A (en) 1997-07-29
GB2307779A (en) 1997-06-04
DE19649640A1 (en) 1997-06-05

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)