GB953034A - Improvements in or relating to semiconductor devices - Google Patents
Improvements in or relating to semiconductor devicesInfo
- Publication number
- GB953034A GB953034A GB2382762A GB2382762A GB953034A GB 953034 A GB953034 A GB 953034A GB 2382762 A GB2382762 A GB 2382762A GB 2382762 A GB2382762 A GB 2382762A GB 953034 A GB953034 A GB 953034A
- Authority
- GB
- United Kingdom
- Prior art keywords
- semi
- region
- atomic radius
- conductor
- impurities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 239000012535 impurity Substances 0.000 abstract 5
- 238000000034 method Methods 0.000 abstract 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052787 antimony Inorganic materials 0.000 abstract 1
- 229910052785 arsenic Inorganic materials 0.000 abstract 1
- 229910052797 bismuth Inorganic materials 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 239000004020 conductor Substances 0.000 abstract 1
- 238000009792 diffusion process Methods 0.000 abstract 1
- 229910052733 gallium Inorganic materials 0.000 abstract 1
- 229910052738 indium Inorganic materials 0.000 abstract 1
- 229910052698 phosphorus Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/36—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the concentration or distribution of impurities in the bulk material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/167—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table further characterised by the doping material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
953,034. Semi-conductor devices. CLEVITE CORPORATION. June 20, 1962 [July 13, 1961], No. 23827/62. Drawings to Specification. Heading H1K. A method of producing a semi-conductor device which contains two regions of differing impurity concentrations comprises forming one of said regions so that it includes atoms of at least two different impurity types and causing the relative proportion of these impurity atoms to be such that the average atomic radius of the impurities and the semi-conductor material in said one region is equal to the average atomic radius of the impurities (if any) and the semi. conductor material in the other region. The method may utilize a diffusion technique for making a transistor (Fig. 5, not shown) or an epitaxial growth technique for a solar cell (Fig. 4, not shown). In an example the atomic radius of boron is stated to be 0.19 Angstrom units (A.U.) less than that of silicon while the radius for aluminium is 0.16 A.U. larger so that an N-type region may be formed in a silicon wafer by diffusing in 19 parts of Al to 16 parts of B. The proportions necessary for the elements P, Sb, Ga, In, As and Bi are also stated in the Specification.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12377861A | 1961-07-13 | 1961-07-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB953034A true GB953034A (en) | 1964-03-25 |
Family
ID=22410827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2382762A Expired GB953034A (en) | 1961-07-13 | 1962-06-20 | Improvements in or relating to semiconductor devices |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE1208009B (en) |
GB (1) | GB953034A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1288029A (en) * | 1970-02-07 | 1972-09-06 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2824269A (en) * | 1956-01-17 | 1958-02-18 | Bell Telephone Labor Inc | Silicon translating devices and silicon alloys therefor |
FR74285E (en) * | 1956-05-15 | 1960-11-07 | Siemens Ag | Silicon-based semiconductor device |
NL107648C (en) * | 1956-05-15 | |||
DE1037015B (en) * | 1956-05-21 | 1958-08-21 | Ibm Deutschland | N-type interference semiconductors for transistors or the like. |
-
1962
- 1962-06-20 GB GB2382762A patent/GB953034A/en not_active Expired
- 1962-07-06 DE DEC27398A patent/DE1208009B/en active Pending
Also Published As
Publication number | Publication date |
---|---|
DE1208009B (en) | 1965-12-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB945742A (en) | ||
GB1277501A (en) | Variable capacitance diode fabrication | |
GB1116209A (en) | Improvements in semiconductor structures | |
GB966257A (en) | Improvements in or relating to methods of producing p-n junctions | |
GB1012124A (en) | Improvements in or relating to semiconductor devices | |
GB1176263A (en) | Complementary Mis-Type Transistors and Method of making same | |
GB1046152A (en) | Diode structure in semiconductor integrated circuit and method of making same | |
GB1199399A (en) | Improvements in or relating to the Manufacture of Semiconductors. | |
GB1018400A (en) | Semiconductor devices | |
GB1024359A (en) | Semiconductor structures poviding both unipolar transistor and bipolar transistor functions and method of making same | |
GB916889A (en) | Multiple junction semiconductor devices | |
GB1080306A (en) | Semiconductor device fabrication | |
GB1096777A (en) | Improvements in rectifying semi-conductor bodies | |
GB953034A (en) | Improvements in or relating to semiconductor devices | |
GB1186945A (en) | Improvements relating to Semiconductor Devices | |
GB1152156A (en) | Semiconductor Devices | |
US3793093A (en) | Method for producing a semiconductor device having a very small deviation in lattice constant | |
US3211589A (en) | P-n junction formation in iii-v semiconductor compounds | |
US2979429A (en) | Diffused transistor and method of making | |
GB1127161A (en) | Improvements in or relating to diffused base transistors | |
GB954989A (en) | Method of forming junction semiconductive devices having thin layers | |
GB1079309A (en) | Semiconductor rectifiers | |
GB1003023A (en) | Process for the production of doped semiconductor materials | |
GB861196A (en) | Electrically asymmetrically conductive systems with at least one p-n junction and methods of producing such systems | |
GB1288029A (en) |