GB937121A - Improvements in or relating to light-sensitive reproduction coatings for printing plates - Google Patents

Improvements in or relating to light-sensitive reproduction coatings for printing plates

Info

Publication number
GB937121A
GB937121A GB606/60A GB60660A GB937121A GB 937121 A GB937121 A GB 937121A GB 606/60 A GB606/60 A GB 606/60A GB 60660 A GB60660 A GB 60660A GB 937121 A GB937121 A GB 937121A
Authority
GB
United Kingdom
Prior art keywords
mol
relating
light
printing plates
mols
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB606/60A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of GB937121A publication Critical patent/GB937121A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
GB606/60A 1959-01-14 1960-01-07 Improvements in or relating to light-sensitive reproduction coatings for printing plates Expired GB937121A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK36720A DE1124817B (de) 1959-01-14 1959-01-14 Kopierschichten fuer Druckformen aus Naphthochinon-(1, 2)-diazidsulfonsaeureestern

Publications (1)

Publication Number Publication Date
GB937121A true GB937121A (en) 1963-09-18

Family

ID=7220776

Family Applications (1)

Application Number Title Priority Date Filing Date
GB606/60A Expired GB937121A (en) 1959-01-14 1960-01-07 Improvements in or relating to light-sensitive reproduction coatings for printing plates

Country Status (7)

Country Link
US (1) US3061430A (US07943777-20110517-C00090.png)
BE (1) BE586559A (US07943777-20110517-C00090.png)
CH (1) CH388777A (US07943777-20110517-C00090.png)
DE (1) DE1124817B (US07943777-20110517-C00090.png)
FR (1) FR1245266A (US07943777-20110517-C00090.png)
GB (1) GB937121A (US07943777-20110517-C00090.png)
NL (2) NL247299A (US07943777-20110517-C00090.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929534A (en) * 1987-08-31 1990-05-29 Hoechst Aktiengesellschaft Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL255348A (US07943777-20110517-C00090.png) * 1959-08-29
NL130926C (US07943777-20110517-C00090.png) * 1959-09-04
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
NL132291C (US07943777-20110517-C00090.png) * 1961-01-25
BE620660A (US07943777-20110517-C00090.png) * 1961-07-28
DE2331377C2 (de) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Kopiermaterial
US4189320A (en) * 1975-04-29 1980-02-19 American Hoechst Corporation Light-sensitive o-quinone diazide compositions and photographic reproduction processes and structures
US4174222A (en) * 1975-05-24 1979-11-13 Tokyo Ohka Kogyo Kabushiki Kaisha Positive-type O-quinone diazide containing photoresist compositions
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni
DE3635303A1 (de) 1986-10-17 1988-04-28 Hoechst Ag Verfahren zur abtragenden modifizierung von mehrstufig aufgerauhten traegermaterialien aus aluminium oder dessen legierungen und deren verwendung bei der herstellung von offsetdruckplatten
DE3718416A1 (de) * 1987-06-02 1988-12-15 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
US4853315A (en) * 1988-01-15 1989-08-01 International Business Machines Corporation O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
US5273856A (en) * 1990-10-31 1993-12-28 International Business Machines Corporation Positive working photoresist composition containing mid or near UV radiation sensitive quinone diazide and sulfonic acid ester of imide or oxime which does not absorb mid or near UV radiation
GB9326150D0 (en) * 1993-12-22 1994-02-23 Alcan Int Ltd Electrochemical roughening method
JPH0876380A (ja) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd ポジ型印刷版組成物
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
IL122318A (en) 1996-04-23 2001-01-28 Horsell Graphic Ind Ltd Lithographic printing forms
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
ATE204388T1 (de) 1997-07-05 2001-09-15 Kodak Polychrome Graphics Llc Bilderzeugungsverfahren
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78797C (US07943777-20110517-C00090.png) * 1949-07-23
NL185407B (nl) * 1953-03-11 Mitsui Petrochemical Ind Werkwijze voor het polymeriseren of copolymeriseren van 1-alkenen alsmede katalysatorsamenstelling voor toepassing van deze werkwijze.
DE938233C (de) * 1953-03-11 1956-01-26 Kalle & Co Ag Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929534A (en) * 1987-08-31 1990-05-29 Hoechst Aktiengesellschaft Positive-working photosensitive mixture and photolithographic copying material produced therefrom with o-quinone dialide sulfonyl ester and azo coupler

Also Published As

Publication number Publication date
NL247299A (US07943777-20110517-C00090.png)
FR1245266A (fr) 1960-11-04
US3061430A (en) 1962-10-30
DE1124817B (de) 1962-03-01
CH388777A (de) 1965-02-28
NL129161C (US07943777-20110517-C00090.png)
BE586559A (fr) 1960-07-14

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