GB9306377D0 - Bubblers - Google Patents

Bubblers

Info

Publication number
GB9306377D0
GB9306377D0 GB939306377A GB9306377A GB9306377D0 GB 9306377 D0 GB9306377 D0 GB 9306377D0 GB 939306377 A GB939306377 A GB 939306377A GB 9306377 A GB9306377 A GB 9306377A GB 9306377 D0 GB9306377 D0 GB 9306377D0
Authority
GB
United Kingdom
Prior art keywords
bubblers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB939306377A
Other versions
GB2265390A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Epichem Ltd
Original Assignee
Epichem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Epichem Ltd filed Critical Epichem Ltd
Publication of GB9306377D0 publication Critical patent/GB9306377D0/en
Publication of GB2265390A publication Critical patent/GB2265390A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4487—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by using a condenser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/008—Feed or outlet control devices
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
GB9306377A 1992-03-26 1993-03-26 Bubblers for use in vapour phase deposition Withdrawn GB2265390A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB929206552A GB9206552D0 (en) 1992-03-26 1992-03-26 Bubblers

Publications (2)

Publication Number Publication Date
GB9306377D0 true GB9306377D0 (en) 1993-05-19
GB2265390A GB2265390A (en) 1993-09-29

Family

ID=10712854

Family Applications (2)

Application Number Title Priority Date Filing Date
GB929206552A Pending GB9206552D0 (en) 1992-03-26 1992-03-26 Bubblers
GB9306377A Withdrawn GB2265390A (en) 1992-03-26 1993-03-26 Bubblers for use in vapour phase deposition

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB929206552A Pending GB9206552D0 (en) 1992-03-26 1992-03-26 Bubblers

Country Status (3)

Country Link
AU (1) AU3765393A (en)
GB (2) GB9206552D0 (en)
WO (1) WO1993019223A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8170404B2 (en) 2004-05-20 2012-05-01 Akzo Nobel N.V. Bubbler for constant vapor delivery of a solid chemical

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4506815A (en) * 1982-12-09 1985-03-26 Thiokol Corporation Bubbler cylinder and dip tube device
US4632710A (en) * 1983-05-10 1986-12-30 Raytheon Company Vapor phase epitaxial growth of carbon doped layers of Group III-V materials
JPS60122735A (en) * 1983-12-02 1985-07-01 Sumitomo Electric Ind Ltd Device for supplying gaseous starting material
US4582480A (en) * 1984-08-02 1986-04-15 At&T Technologies, Inc. Methods of and apparatus for vapor delivery control in optical preform manufacture
US4583372A (en) * 1985-01-30 1986-04-22 At&T Technologies, Inc. Methods of and apparatus for storing and delivering a fluid
EP0201696B1 (en) * 1985-03-20 1991-03-13 Sharp Kabushiki Kaisha Production of carbon films
US4689094A (en) * 1985-12-24 1987-08-25 Raytheon Company Compensation doping of group III-V materials
GB2223509B (en) * 1988-10-04 1992-08-05 Stc Plc Vapour phase processing
JP2614338B2 (en) * 1990-01-11 1997-05-28 株式会社東芝 Liquid source container

Also Published As

Publication number Publication date
AU3765393A (en) 1993-10-21
GB9206552D0 (en) 1992-05-06
WO1993019223A1 (en) 1993-09-30
GB2265390A (en) 1993-09-29

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)