GB927587A - Method and apparatus for depositing metal film under vacuum - Google Patents

Method and apparatus for depositing metal film under vacuum

Info

Publication number
GB927587A
GB927587A GB34718/61A GB3471861A GB927587A GB 927587 A GB927587 A GB 927587A GB 34718/61 A GB34718/61 A GB 34718/61A GB 3471861 A GB3471861 A GB 3471861A GB 927587 A GB927587 A GB 927587A
Authority
GB
United Kingdom
Prior art keywords
wire
conductor
block
spring
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB34718/61A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unisys Corp
Original Assignee
Sperry Rand Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sperry Rand Corp filed Critical Sperry Rand Corp
Publication of GB927587A publication Critical patent/GB927587A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/20Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
GB34718/61A 1961-01-03 1961-09-27 Method and apparatus for depositing metal film under vacuum Expired GB927587A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US80301A US3142587A (en) 1961-01-03 1961-01-03 Apparatus for producing electrical conductor films by explosive evaporation

Publications (1)

Publication Number Publication Date
GB927587A true GB927587A (en) 1963-05-29

Family

ID=22156511

Family Applications (1)

Application Number Title Priority Date Filing Date
GB34718/61A Expired GB927587A (en) 1961-01-03 1961-09-27 Method and apparatus for depositing metal film under vacuum

Country Status (3)

Country Link
US (1) US3142587A (enrdf_load_stackoverflow)
GB (1) GB927587A (enrdf_load_stackoverflow)
NL (1) NL270313A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2545839A1 (fr) * 1983-05-13 1984-11-16 Wedtech Corp Procede et appareillage pour le revetement d'un substrat avec une matiere transformee electriquement en phase gazeuse
DE3435320A1 (de) * 1984-09-26 1986-04-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zum belegen der innenwand eines rohres aus isolatormaterial mit einer elektrischen schicht
DE3524799A1 (de) * 1985-07-11 1987-01-22 Siemens Ag Verfahren zur herstellung einer vergueteten oberflaechenschicht und nach diesem verfahren hergestellte molekularsiebmembrane

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3213826A (en) * 1962-03-05 1965-10-26 Sperry Rand Corp Electrostatic direction of exploded vapors
US3598957A (en) * 1968-09-13 1971-08-10 Tokyo Shibaura Electric Co Vacuum deposition apparatus
US4386578A (en) * 1981-05-26 1983-06-07 The Boeing Company High velocity metallic mass increment vacuum deposit gun

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE702937C (de) * 1938-07-12 1941-02-24 Dr Kurt Richter Verfahren zur Herstellung von Niederschlaegen von Metallen, Legierungen, Metalloiden und Verbindungen im Vakuum
US2976174A (en) * 1955-03-22 1961-03-21 Burroughs Corp Oriented magnetic cores

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2545839A1 (fr) * 1983-05-13 1984-11-16 Wedtech Corp Procede et appareillage pour le revetement d'un substrat avec une matiere transformee electriquement en phase gazeuse
DE3435320A1 (de) * 1984-09-26 1986-04-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zum belegen der innenwand eines rohres aus isolatormaterial mit einer elektrischen schicht
DE3524799A1 (de) * 1985-07-11 1987-01-22 Siemens Ag Verfahren zur herstellung einer vergueteten oberflaechenschicht und nach diesem verfahren hergestellte molekularsiebmembrane

Also Published As

Publication number Publication date
NL270313A (enrdf_load_stackoverflow)
US3142587A (en) 1964-07-28

Similar Documents

Publication Publication Date Title
GB992464A (en) Improvements in or relating to thin film impedance devices
GB776996A (en) Electrostatic recording and reproducing systems or apparatus
GB927587A (en) Method and apparatus for depositing metal film under vacuum
US4065370A (en) Method of ion plating a thin metallic strip for flashlamp starting
Weiss et al. Isotropic stress measurements in Permalloy films
US3058842A (en) Evaporation method
GB1023481A (en) Thermally responsive devices
GB974667A (en) Improvements in and relating to the manufacture of multi-layer thin film electrical devices
GB1002359A (en) Circuit fabrication
US2922730A (en) Method of forming thin films of barium titanate
US3213826A (en) Electrostatic direction of exploded vapors
US3405440A (en) Ferroelectric material and method of making it
US3359466A (en) Method of improving the electrical characteristics of thin film metalinsulator-metalstructures
US2857532A (en) Ferroelectric crystal unit
JPS5644198A (en) Semiconductor memory device
US3483447A (en) Thin film ferroelectric device
US4037310A (en) Method of manufacturing a homopolar electret from a foil
US3538305A (en) Alloy deterring shunt for conical tungsten evaporation sources
US2468527A (en) Blocking-layer cell
GB942549A (en) Improvements in or relating to information storage devices
US2756305A (en) Time delay switch
US3428773A (en) In-line,high temperature,high vacuum closure
SU72435A1 (ru) Способ изготовлени плавких предохранителей
US3436256A (en) Method of forming a superconducting metallic film
GB932146A (en) Improvements in or relating to insulating layers