GB914260A - Improvements in or relating to the production of semi-conductor devices - Google Patents
Improvements in or relating to the production of semi-conductor devicesInfo
- Publication number
- GB914260A GB914260A GB28189/59A GB2818959A GB914260A GB 914260 A GB914260 A GB 914260A GB 28189/59 A GB28189/59 A GB 28189/59A GB 2818959 A GB2818959 A GB 2818959A GB 914260 A GB914260 A GB 914260A
- Authority
- GB
- United Kingdom
- Prior art keywords
- plate
- electrode
- alloying
- gold
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000010931 gold Substances 0.000 abstract 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract 4
- 238000005275 alloying Methods 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 3
- 238000000576 coating method Methods 0.000 abstract 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 2
- 229910052737 gold Inorganic materials 0.000 abstract 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 238000001816 cooling Methods 0.000 abstract 1
- 239000011888 foil Substances 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 239000011733 molybdenum Substances 0.000 abstract 1
- 229910017604 nitric acid Inorganic materials 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H01L2224/8319—Arrangement of the layer connectors prior to mounting
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- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/83801—Soldering or alloying
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- H01L2924/01005—Boron [B]
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- H01L2924/01042—Molybdenum [Mo]
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- H01L2924/0132—Binary Alloys
- H01L2924/01322—Eutectic Alloys, i.e. obtained by a liquid transforming into two solid phases
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1203—Rectifying Diode
- H01L2924/12036—PN diode
Abstract
914,260. Semi-conductor devices. SIEMENSSCHUCKERTWERKE A.G. Aug. 18, 1959 [Sept. 30, 1958], No. 28189/59. Class 37. A process for the manufacture of a semiconductor device comprises alloying a gold foil to a silicon body to form an electrode, providing at least one face of a molybdenum carrier plate with a gold coating the thickness of which is not more than <SP>1</SP>/ 30 th of the thickness of the gold foil, and alloying the gold-coated face of the Mo plate to the electrode at a temperature between 400‹ and 450‹ C. The Au coating on the Mo plate may be bonded to the plate by flashing at 900‹ C. in an inert atmosphere; it may be applied in several layers, each being independently flashed. Alternatively, as in the transistor shown, the Mo plate 14 is coated with successive layers of Ni 15, Ag 16, and Au 17, each layer being electrolytically deposited and flashed at 800‹ C. Completely coating the Mo plate enables it to be soft soldered to a metallic supporting or cooling body, and protects it when the device is etched in, e.g. a 1 : 1 mixture of hydrofluoric acid and nitric acid. The disc-shaped body 10 of P-type Si has an alloyed annular base electrode 21 of B-doped Au, and emitter and collector electrodes 18, 13, made by alloying Sb-doped Au foils to the body. Finally, the collector electrode 13 is alloyed with the Au layer 17 on the Mo plate by heating to between 400‹ and 450‹ C.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DES60096A DE1110321B (en) | 1958-09-30 | 1958-09-30 | Alloy process for the production of a semiconductor device with a silicon body |
Publications (1)
Publication Number | Publication Date |
---|---|
GB914260A true GB914260A (en) | 1963-01-02 |
Family
ID=7493849
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB28189/59A Expired GB914260A (en) | 1958-09-30 | 1959-08-18 | Improvements in or relating to the production of semi-conductor devices |
Country Status (6)
Country | Link |
---|---|
BE (1) | BE583120A (en) |
CH (1) | CH372385A (en) |
DE (1) | DE1110321B (en) |
FR (1) | FR1233332A (en) |
GB (1) | GB914260A (en) |
NL (1) | NL242265A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE620118A (en) * | 1961-07-14 | |||
DE1295697B (en) * | 1962-05-23 | 1969-05-22 | Walter Brandt Gmbh | Semiconductor component and method for its manufacture |
US3200490A (en) * | 1962-12-07 | 1965-08-17 | Philco Corp | Method of forming ohmic bonds to a germanium-coated silicon body with eutectic alloyforming materials |
GB1025453A (en) * | 1964-01-29 | 1966-04-06 | Standard Telephones Cables Ltd | Improvements in or relating to semiconductor devices |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE540780A (en) * | 1954-08-26 | 1900-01-01 | ||
NL208617A (en) * | 1955-05-10 | 1900-01-01 |
-
0
- NL NL242265D patent/NL242265A/xx unknown
-
1958
- 1958-09-30 DE DES60096A patent/DE1110321B/en active Pending
-
1959
- 1959-08-17 FR FR802976A patent/FR1233332A/en not_active Expired
- 1959-08-18 GB GB28189/59A patent/GB914260A/en not_active Expired
- 1959-09-22 CH CH7851659A patent/CH372385A/en unknown
- 1959-09-29 BE BE583120A patent/BE583120A/en unknown
Also Published As
Publication number | Publication date |
---|---|
DE1110321B (en) | 1961-07-06 |
BE583120A (en) | 1960-03-29 |
NL242265A (en) | 1900-01-01 |
FR1233332A (en) | 1960-10-12 |
CH372385A (en) | 1963-10-15 |
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