GB9015264D0 - Strain gauge encapsulation process - Google Patents

Strain gauge encapsulation process

Info

Publication number
GB9015264D0
GB9015264D0 GB909015264A GB9015264A GB9015264D0 GB 9015264 D0 GB9015264 D0 GB 9015264D0 GB 909015264 A GB909015264 A GB 909015264A GB 9015264 A GB9015264 A GB 9015264A GB 9015264 D0 GB9015264 D0 GB 9015264D0
Authority
GB
United Kingdom
Prior art keywords
strain gauge
encapsulation process
gauge encapsulation
strain
gauge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB909015264A
Other versions
GB2234365A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GEC Avery Technology Ltd
Original Assignee
GEC Avery Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GEC Avery Technology Ltd filed Critical GEC Avery Technology Ltd
Publication of GB9015264D0 publication Critical patent/GB9015264D0/en
Publication of GB2234365A publication Critical patent/GB2234365A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01G—WEIGHING
    • G01G3/00—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances
    • G01G3/12—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing
    • G01G3/14—Weighing apparatus characterised by the use of elastically-deformable members, e.g. spring balances wherein the weighing element is in the form of a solid body stressed by pressure or tension during weighing measuring variations of electrical resistance
    • G01G3/1402—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C10/00—Adjustable resistors
    • H01C10/10—Adjustable resistors adjustable by mechanical pressure or force

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
GB9015264A 1989-07-27 1990-07-11 Strain gauge encapsulation process Withdrawn GB2234365A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB898917191A GB8917191D0 (en) 1989-07-27 1989-07-27 Strain gauge encapsulation process

Publications (2)

Publication Number Publication Date
GB9015264D0 true GB9015264D0 (en) 1990-08-29
GB2234365A GB2234365A (en) 1991-01-30

Family

ID=10660722

Family Applications (2)

Application Number Title Priority Date Filing Date
GB898917191A Pending GB8917191D0 (en) 1989-07-27 1989-07-27 Strain gauge encapsulation process
GB9015264A Withdrawn GB2234365A (en) 1989-07-27 1990-07-11 Strain gauge encapsulation process

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB898917191A Pending GB8917191D0 (en) 1989-07-27 1989-07-27 Strain gauge encapsulation process

Country Status (1)

Country Link
GB (2) GB8917191D0 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5049232A (en) * 1990-08-31 1991-09-17 General Electric Company Method of making diaphragm-type pressure transducers
DE4203781C1 (en) * 1992-02-10 1993-09-09 Du Pont De Nemours (Deutschland) Gmbh, 61352 Bad Homburg, De
GB2265021B (en) * 1992-03-10 1996-02-14 Nippon Steel Chemical Co Photosensitive materials and their use in forming protective layers for printed circuit and process for preparation of printed circuit
FI93680C (en) * 1992-05-07 1995-05-10 Outokumpu Instr Oy Support construction for thin film and process for making it

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4092442A (en) * 1976-12-30 1978-05-30 International Business Machines Corporation Method of depositing thin films utilizing a polyimide mask
GB2049210B (en) * 1979-02-26 1983-09-01 Shipley Co Photographic formation of visible images
GB8418938D0 (en) * 1984-07-25 1984-08-30 Davies Bros Ltd Image on substrate
US4741988A (en) * 1985-05-08 1988-05-03 U.S. Philips Corp. Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell
US4782009A (en) * 1987-04-03 1988-11-01 General Electric Company Method of coating and imaging photopatternable silicone polyamic acid

Also Published As

Publication number Publication date
GB8917191D0 (en) 1989-09-13
GB2234365A (en) 1991-01-30

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)