GB8820926D0 - Light-sensitive material & method for forming images - Google Patents

Light-sensitive material & method for forming images

Info

Publication number
GB8820926D0
GB8820926D0 GB888820926A GB8820926A GB8820926D0 GB 8820926 D0 GB8820926 D0 GB 8820926D0 GB 888820926 A GB888820926 A GB 888820926A GB 8820926 A GB8820926 A GB 8820926A GB 8820926 D0 GB8820926 D0 GB 8820926D0
Authority
GB
United Kingdom
Prior art keywords
light
sensitive material
forming images
images
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB888820926A
Other versions
GB2210172A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of GB8820926D0 publication Critical patent/GB8820926D0/en
Publication of GB2210172A publication Critical patent/GB2210172A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB8820926A 1987-09-18 1988-09-06 Light-sensitive material and method for forming images Withdrawn GB2210172A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23454987A JPS6478249A (en) 1987-09-18 1987-09-18 Photosensitive material and image forming method

Publications (2)

Publication Number Publication Date
GB8820926D0 true GB8820926D0 (en) 1988-10-05
GB2210172A GB2210172A (en) 1989-06-01

Family

ID=16972764

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8820926A Withdrawn GB2210172A (en) 1987-09-18 1988-09-06 Light-sensitive material and method for forming images

Country Status (3)

Country Link
JP (1) JPS6478249A (en)
DE (1) DE3831290A1 (en)
GB (1) GB2210172A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142918A (en) * 1989-10-30 1991-06-18 Matsushita Electron Corp Formation of resist pattern
US5580695A (en) * 1992-02-25 1996-12-03 Japan Synthetic Rubber Co., Ltd. Chemically amplified resist
JP3010607B2 (en) * 1992-02-25 2000-02-21 ジェイエスアール株式会社 Radiation-sensitive resin composition
US6921620B2 (en) 2001-08-21 2005-07-26 Kodak Polychrome Graphics Llc Imageable composition containing colorant having a counter anion derived from a non-volatile acid
US6806020B2 (en) 2001-08-21 2004-10-19 Kodak Polychrome Graphics Llc Negative working imageable composition containing sulfonic acid

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL125781C (en) * 1959-02-04
US3661582A (en) * 1970-03-23 1972-05-09 Western Electric Co Additives to positive photoresists which increase the sensitivity thereof
DE2331377C2 (en) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Photosensitive copying material
JPS5614970B2 (en) * 1974-02-01 1981-04-07
DE2529054C2 (en) * 1975-06-30 1982-04-29 Ibm Deutschland Gmbh, 7000 Stuttgart Process for the production of a resist image which is negative for the original
JPS5559456A (en) * 1978-10-25 1980-05-02 Fuji Photo Film Co Ltd Electron beam recording method
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
JPS5636648A (en) * 1979-09-03 1981-04-09 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
DE3040156A1 (en) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE AND LIGHT SENSITIVE COPY MATERIAL PRODUCED THEREOF
DE3043967A1 (en) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt LIGHT SENSITIVE MIXTURE BASED ON O-NAPHTHOCHINONDIAZIDES AND LIGHT SENSITIVE COPY MATERIAL MADE THEREOF
DE3325022A1 (en) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt METHOD FOR PRODUCING NEGATIVE COPIES BY MEANS OF A MATERIAL BASED ON 1,2-CHINONDIAZIDES
JPS6235350A (en) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Photoresist with longer preservation life useful for image inversion

Also Published As

Publication number Publication date
DE3831290A1 (en) 1989-04-06
GB2210172A (en) 1989-06-01
JPS6478249A (en) 1989-03-23

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)