GB8803599D0 - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
GB8803599D0
GB8803599D0 GB888803599A GB8803599A GB8803599D0 GB 8803599 D0 GB8803599 D0 GB 8803599D0 GB 888803599 A GB888803599 A GB 888803599A GB 8803599 A GB8803599 A GB 8803599A GB 8803599 D0 GB8803599 D0 GB 8803599D0
Authority
GB
United Kingdom
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB888803599A
Other versions
GB2205843B (en
GB2205843A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Kokusaku Pulp Co Ltd
Original Assignee
Sanyo Kokusaku Pulp Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Kokusaku Pulp Co Ltd filed Critical Sanyo Kokusaku Pulp Co Ltd
Publication of GB8803599D0 publication Critical patent/GB8803599D0/en
Publication of GB2205843A publication Critical patent/GB2205843A/en
Application granted granted Critical
Publication of GB2205843B publication Critical patent/GB2205843B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
GB8803599A 1987-06-15 1988-02-17 Photosensitive composition Expired - Fee Related GB2205843B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14872487A JPH0693118B2 (en) 1987-06-15 1987-06-15 Photosensitive sheet

Publications (3)

Publication Number Publication Date
GB8803599D0 true GB8803599D0 (en) 1988-03-16
GB2205843A GB2205843A (en) 1988-12-21
GB2205843B GB2205843B (en) 1991-12-11

Family

ID=15459189

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8803599A Expired - Fee Related GB2205843B (en) 1987-06-15 1988-02-17 Photosensitive composition

Country Status (4)

Country Link
JP (1) JPH0693118B2 (en)
DE (1) DE3800131C2 (en)
FR (1) FR2616558B1 (en)
GB (1) GB2205843B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01180540A (en) * 1988-01-12 1989-07-18 Sanyo Kokusaku Pulp Co Ltd Image forming method
JPH039362A (en) * 1989-06-07 1991-01-17 Sanyo Kokusaku Pulp Co Ltd Photosensitive film developing machine
JPH03288852A (en) * 1990-04-05 1991-12-19 Sanyo Kokusaku Pulp Co Ltd Photosensitive transfer sheet
JPH04274428A (en) * 1991-03-01 1992-09-30 Nippon Paint Co Ltd Photosensitive composition for offeset printing
JPH04369651A (en) * 1991-06-18 1992-12-22 Sanyo Kokusaku Pulp Co Ltd Multicolor image forming method
GB2269385A (en) * 1992-07-14 1994-02-09 Coates Brothers Plc Coating compositions
EP0908784A1 (en) * 1997-10-08 1999-04-14 Agfa-Gevaert N.V. A method of making positive working printing plates from a light sensitive imaging element
US6165689A (en) * 1997-10-08 2000-12-26 Agfa-Gevaert, N.V. Method for making positive working printing plates from a light sensitive imaging element

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB711702A (en) * 1951-04-16 1954-07-07 Kodak Ltd Improvements in photographic methods of preparing relief matrices and diazo containing light sensitive materials therefor
JPS4910841B1 (en) * 1965-12-18 1974-03-13
BE691485A (en) * 1965-12-20 1967-05-29
BE795477A (en) * 1972-02-16 1973-05-29 Quadrimetal Offset Le IMPROVED PHOTOPOLYMERISABLE COMPOSITIONS
DE2522225C2 (en) * 1975-05-20 1983-12-08 Nippon Paint Co., Ltd., Osaka Aqueous photosensitive mixture and its use for the production of screen printing stencils
GB2108986B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable composition for producing screen printing stencils
GB2109392B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable materials for use in producing screen printing stencils
DE3364925D1 (en) * 1982-06-03 1986-09-04 Hoechst Co American Photosensitive composition developable with water, and photosensitive copying material produced therefrom
JPS60147729A (en) * 1984-01-12 1985-08-03 Toshiba Corp Photoresist composition
GB8405549D0 (en) * 1984-03-02 1984-04-04 Sericol Group Ltd Screen printing compositions
US4540649A (en) * 1984-09-12 1985-09-10 Napp Systems (Usa) Inc. Water developable photopolymerizable composition and printing plate element containing same

Also Published As

Publication number Publication date
GB2205843B (en) 1991-12-11
JPS63311349A (en) 1988-12-20
JPH0693118B2 (en) 1994-11-16
DE3800131A1 (en) 1988-12-29
FR2616558A1 (en) 1988-12-16
GB2205843A (en) 1988-12-21
DE3800131C2 (en) 1994-07-28
FR2616558B1 (en) 1994-05-27

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Legal Events

Date Code Title Description
732E Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19970217