GB8719794D0 - Depositing surface layers on substrates - Google Patents

Depositing surface layers on substrates

Info

Publication number
GB8719794D0
GB8719794D0 GB878719794A GB8719794A GB8719794D0 GB 8719794 D0 GB8719794 D0 GB 8719794D0 GB 878719794 A GB878719794 A GB 878719794A GB 8719794 A GB8719794 A GB 8719794A GB 8719794 D0 GB8719794 D0 GB 8719794D0
Authority
GB
United Kingdom
Prior art keywords
substrates
surface layers
depositing surface
depositing
layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GB878719794A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SCIENT COATINGS UK Ltd
Original Assignee
SCIENT COATINGS UK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SCIENT COATINGS UK Ltd filed Critical SCIENT COATINGS UK Ltd
Priority to GB878719794A priority Critical patent/GB8719794D0/en
Publication of GB8719794D0 publication Critical patent/GB8719794D0/en
Priority to GB8819752A priority patent/GB2208875A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0548—Processes for depositing or forming copper oxide superconductor layers by deposition and subsequent treatment, e.g. oxidation of pre-deposited material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB878719794A 1987-08-21 1987-08-21 Depositing surface layers on substrates Pending GB8719794D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB878719794A GB8719794D0 (en) 1987-08-21 1987-08-21 Depositing surface layers on substrates
GB8819752A GB2208875A (en) 1987-08-21 1988-08-19 Depositing surface layers using ion beans

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB878719794A GB8719794D0 (en) 1987-08-21 1987-08-21 Depositing surface layers on substrates

Publications (1)

Publication Number Publication Date
GB8719794D0 true GB8719794D0 (en) 1987-09-30

Family

ID=10622612

Family Applications (2)

Application Number Title Priority Date Filing Date
GB878719794A Pending GB8719794D0 (en) 1987-08-21 1987-08-21 Depositing surface layers on substrates
GB8819752A Withdrawn GB2208875A (en) 1987-08-21 1988-08-19 Depositing surface layers using ion beans

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB8819752A Withdrawn GB2208875A (en) 1987-08-21 1988-08-19 Depositing surface layers using ion beans

Country Status (1)

Country Link
GB (2) GB8719794D0 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115572950A (en) * 2022-10-14 2023-01-06 苏州岚创科技有限公司 Multi-ion source synchronous sputtering coating device

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03111578A (en) * 1989-06-29 1991-05-13 Toshiba Corp Method for forming thin film and device for forming thin film
DE69430230T2 (en) * 1993-10-14 2002-10-31 Mega Chips Corp., Osaka Method and device for producing a single-crystal thin film
US5797987A (en) * 1995-12-14 1998-08-25 Ppg Industries, Inc. Zinc phosphate conversion coating compositions and process
US7229675B1 (en) 2000-02-17 2007-06-12 Anatoly Nikolaevich Paderov Protective coating method for pieces made of heat resistant alloys
WO2001061067A1 (en) * 2000-02-17 2001-08-23 Anatoly Nikolaevich Paderov Combined protective coating of parts made of heat resisting alloys

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1515318A1 (en) * 1964-12-28 1969-07-31 Hermsdorf Keramik Veb Device for the production of thin layers on a carrier by means of ion beam atomization
US4346301A (en) * 1979-07-30 1982-08-24 Hughes Aircraft Company Ion implantation system
EP0061906B1 (en) * 1981-03-26 1987-06-10 Inoue-Japax Research Incorporated A method of, and an apparatus for, processing a workpiece with energetic particles and a product processed thereby
US4468415A (en) * 1981-03-30 1984-08-28 Asahi Kasei Kogyo Kabushiki Kaisha Indium-antimony complex crystal semiconductor and process for production thereof
US4520039A (en) * 1982-09-23 1985-05-28 Sovonics Solar Systems Compositionally varied materials and method for synthesizing the materials
FR2550008B1 (en) * 1983-07-27 1987-04-24 American Telephone & Telegraph EPITAXIAL GROWTH METHOD WITH SPATIAL SELECTIVITY USING ION BEAMS
JPS63502542A (en) * 1985-08-07 1988-09-22 オ−ストラリア国 Controlling the uniformity of growing alloy thin films
JPS6261315A (en) * 1985-09-11 1987-03-18 Sharp Corp Molecular beam epitaxy device
JPS63501223A (en) * 1985-10-31 1988-05-12 エヌ・シ−・ア−ル・コ−ポレ−シヨン Method of forming an abrasion-resistant coating on a transparent substrate
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115572950A (en) * 2022-10-14 2023-01-06 苏州岚创科技有限公司 Multi-ion source synchronous sputtering coating device

Also Published As

Publication number Publication date
GB2208875A (en) 1989-04-19
GB8819752D0 (en) 1988-09-21

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