GB8701340D0 - Development of x-ray exposed photoresists - Google Patents

Development of x-ray exposed photoresists

Info

Publication number
GB8701340D0
GB8701340D0 GB878701340A GB8701340A GB8701340D0 GB 8701340 D0 GB8701340 D0 GB 8701340D0 GB 878701340 A GB878701340 A GB 878701340A GB 8701340 A GB8701340 A GB 8701340A GB 8701340 D0 GB8701340 D0 GB 8701340D0
Authority
GB
United Kingdom
Prior art keywords
development
ray exposed
exposed photoresists
photoresists
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
GB878701340A
Other versions
GB2200219A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EXCITECH GB
Original Assignee
EXCITECH GB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EXCITECH GB filed Critical EXCITECH GB
Priority to GB08701340A priority Critical patent/GB2200219A/en
Publication of GB8701340D0 publication Critical patent/GB8701340D0/en
Publication of GB2200219A publication Critical patent/GB2200219A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
GB08701340A 1987-01-22 1987-01-22 Ultra-violet photo-ablative development of X-ray exposed photoresists Pending GB2200219A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08701340A GB2200219A (en) 1987-01-22 1987-01-22 Ultra-violet photo-ablative development of X-ray exposed photoresists

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08701340A GB2200219A (en) 1987-01-22 1987-01-22 Ultra-violet photo-ablative development of X-ray exposed photoresists

Publications (2)

Publication Number Publication Date
GB8701340D0 true GB8701340D0 (en) 1987-02-25
GB2200219A GB2200219A (en) 1988-07-27

Family

ID=10611023

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08701340A Pending GB2200219A (en) 1987-01-22 1987-01-22 Ultra-violet photo-ablative development of X-ray exposed photoresists

Country Status (1)

Country Link
GB (1) GB2200219A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000294523A (en) * 1999-04-01 2000-10-20 Sony Corp Semiconductor manufacturing apparatus and manufacture for semiconductor device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61234035A (en) * 1985-03-29 1986-10-18 Fujitsu Ltd Far ultraviolet ray emitting dry developing method

Also Published As

Publication number Publication date
GB2200219A (en) 1988-07-27

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