GB866199A - Improvements in or relating to processes and apparatus for the production of semi-conductor crystals - Google Patents

Improvements in or relating to processes and apparatus for the production of semi-conductor crystals

Info

Publication number
GB866199A
GB866199A GB25391/57A GB2539157A GB866199A GB 866199 A GB866199 A GB 866199A GB 25391/57 A GB25391/57 A GB 25391/57A GB 2539157 A GB2539157 A GB 2539157A GB 866199 A GB866199 A GB 866199A
Authority
GB
United Kingdom
Prior art keywords
crystal
substance
gas
carrier gas
semi
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB25391/57A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens and Halske AG
Siemens AG
Original Assignee
Siemens and Halske AG
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens and Halske AG, Siemens AG filed Critical Siemens and Halske AG
Publication of GB866199A publication Critical patent/GB866199A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/08Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
    • C30B13/10Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials
    • C30B13/12Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials in the gaseous or vapour state

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

866,199. Semi-conductors. STE1VIENS & HALSKE A.G. Aug. 12, 1957 [Aug. 10, 1956], No. 25391/57. Class 37. A process for incorporating a doping substance into a semi-conductor melt comprises passing the substance in gaseous form from a storage vessel in which the substance is under pressure through a capillary nozzle into a stream of carrier gas consisting of hydrogen or of other gas inert to the doping substance and to the semi-conductor melt and wherein said substance is conducted together with said carrier gas to a treatment vessel in which the melt is located. The crystal 3 is heated in a reaction chamber to melt it. The doping substance may be BCl a and is contained in a storage vessel 6. The crystal may be of Si or Ge or of a compound of two or more different metals, the hydrogen can be replaced by a rare gas and any other boron halide such as the bromide BBr 3 can be used. The incorporation of the impurity or " doping " is to give the crystal a particular resistivity to increase the life of the charge carriers or to produce a crystal of a particular conductivity type, and the doping substance is generally distributed uniformly over the surface. In the particular process described the silicon crystal 3 is zone-melted, that is, successive zones of a vertically moving crystal are melted by a high-frequency coil 4. The proportions of carrier gas and "impurity gas" can be adjusted by the pressure in 6, by adjusting the size of the capillary nozzle, e.g. by a needle valve, and by adjusting the rate of flow of the hydrogen or other carrier gas. The final " doped " crystals have accurately-reproducible resistivities over a wide range, e.g. between 1 and 50 ohms/em. In a modification, crystal 3 can be melted in a crucible. In an example a silicon crystal with 10 atoms per cent of boron gives a resistivity of 10 ohms/cm. Prior art methods comprising the steps of conducting hydrogen or a rare gas over a heated liquid halide or mixing the carrier gas with halide gas and then reducing the proportion of the halide by freezing, are referred to.
GB25391/57A 1956-08-10 1957-08-12 Improvements in or relating to processes and apparatus for the production of semi-conductor crystals Expired GB866199A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE866199X 1956-08-10

Publications (1)

Publication Number Publication Date
GB866199A true GB866199A (en) 1961-04-26

Family

ID=6801976

Family Applications (1)

Application Number Title Priority Date Filing Date
GB25391/57A Expired GB866199A (en) 1956-08-10 1957-08-12 Improvements in or relating to processes and apparatus for the production of semi-conductor crystals

Country Status (1)

Country Link
GB (1) GB866199A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK86569C (en) * 1956-09-14 1958-11-24 Odelberg & Olson Ab Folding shovel.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK86569C (en) * 1956-09-14 1958-11-24 Odelberg & Olson Ab Folding shovel.

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