GB8515695D0 - Controlling focussing condition of electron beam - Google Patents

Controlling focussing condition of electron beam

Info

Publication number
GB8515695D0
GB8515695D0 GB858515695A GB8515695A GB8515695D0 GB 8515695 D0 GB8515695 D0 GB 8515695D0 GB 858515695 A GB858515695 A GB 858515695A GB 8515695 A GB8515695 A GB 8515695A GB 8515695 D0 GB8515695 D0 GB 8515695D0
Authority
GB
United Kingdom
Prior art keywords
electron beam
controlling
focussing condition
condition
controlling focussing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
GB858515695A
Other versions
GB2164174B (en
GB2164174A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus GmbH filed Critical Leybold Heraeus GmbH
Publication of GB8515695D0 publication Critical patent/GB8515695D0/en
Publication of GB2164174A publication Critical patent/GB2164174A/en
Application granted granted Critical
Publication of GB2164174B publication Critical patent/GB2164174B/en
Expired legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K15/00Electron-beam welding or cutting
    • B23K15/0013Positioning or observing workpieces, e.g. with respect to the impact; Aligning, aiming or focusing electronbeams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002Details
    • H01J37/3007Electron or ion-optical systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
GB08515695A 1984-08-04 1985-06-20 Method and apparatus for controlling the focussing condition of a deflected electron beam Expired GB2164174B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19843428802 DE3428802A1 (en) 1984-08-04 1984-08-04 METHOD AND DEVICE FOR CONTROLLING THE FOCUSING STATE OF A DEFLECTED ELECTRON BEAM

Publications (3)

Publication Number Publication Date
GB8515695D0 true GB8515695D0 (en) 1985-07-24
GB2164174A GB2164174A (en) 1986-03-12
GB2164174B GB2164174B (en) 1988-10-05

Family

ID=6242366

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08515695A Expired GB2164174B (en) 1984-08-04 1985-06-20 Method and apparatus for controlling the focussing condition of a deflected electron beam

Country Status (4)

Country Link
JP (1) JPS6142845A (en)
DE (1) DE3428802A1 (en)
FR (1) FR2568720A1 (en)
GB (1) GB2164174B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE108283T1 (en) * 1988-11-10 1994-07-15 Balzers Hochvakuum METHOD OF CONTROLLING THE EVAPORATION RATE DISTRIBUTION OF AN ELECTRON BEAM.
GB2241594B (en) * 1990-03-02 1993-09-01 Rolls Royce Plc Improvements in or relating to laser drilling of components
DE4028842C2 (en) * 1990-09-11 1995-10-26 Balzers Hochvakuum Method and arrangement for controlling the vaporization current density and / or its distribution
DE4113364C1 (en) * 1991-04-24 1992-04-02 Forschungsgesellschaft Fuer Elektronenstrahl- Und Plasmatechnik Mbh, O-8051 Dresden, De
DE10004389C5 (en) * 2000-02-02 2010-09-09 Pro-Beam Ag & Co. Kgaa Method for welding by electron beam
CN106425076B (en) * 2016-11-29 2017-10-20 桂林狮达机电技术工程有限公司 Electron-beam welder weld seam teaching autonomous tracing in intelligent vehicle and system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3582529A (en) * 1969-09-24 1971-06-01 Air Reduction Electron beam heating apparatus and control system therein
DE2519537C2 (en) * 1975-05-02 1982-11-04 Leybold-Heraeus GmbH, 5000 Köln Electron beam device for heating, melting and evaporation purposes with deflection systems
GB2011765A (en) * 1977-12-29 1979-07-11 Plessey Co Ltd Improvements in or relating to display arrangements
DE2812285C2 (en) * 1978-03-21 1986-05-15 Leybold-Heraeus GmbH, 5000 Köln Process for the evaporation of alloy melts from metals with differing vapor pressures
JPS5577144A (en) * 1978-12-07 1980-06-10 Jeol Ltd Electron beam exposure method
JPS5628433A (en) * 1979-08-15 1981-03-20 Erionikusu:Kk Display distortion corrector for electron beam device
JPS5693318A (en) * 1979-12-10 1981-07-28 Fujitsu Ltd Electron beam exposure device
JPS5750756A (en) * 1980-09-12 1982-03-25 Jeol Ltd Objective lens current control method for scan type electron microscope
JPS5957431A (en) * 1982-09-27 1984-04-03 Fujitsu Ltd Electron beam exposure device

Also Published As

Publication number Publication date
GB2164174B (en) 1988-10-05
FR2568720A1 (en) 1986-02-07
DE3428802C2 (en) 1992-11-19
DE3428802A1 (en) 1986-02-13
GB2164174A (en) 1986-03-12
JPS6142845A (en) 1986-03-01

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940620