GB8510558D0 - Transducer devices - Google Patents

Transducer devices

Info

Publication number
GB8510558D0
GB8510558D0 GB858510558A GB8510558A GB8510558D0 GB 8510558 D0 GB8510558 D0 GB 8510558D0 GB 858510558 A GB858510558 A GB 858510558A GB 8510558 A GB8510558 A GB 8510558A GB 8510558 D0 GB8510558 D0 GB 8510558D0
Authority
GB
United Kingdom
Prior art keywords
transducer devices
transducer
devices
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB858510558A
Other versions
GB2174241A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IMO Industries Inc
Original Assignee
Transamerica DeLaval Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Transamerica DeLaval Inc filed Critical Transamerica DeLaval Inc
Priority to GB08510558A priority Critical patent/GB2174241A/en
Publication of GB8510558D0 publication Critical patent/GB8510558D0/en
Publication of GB2174241A publication Critical patent/GB2174241A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
    • H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
    • G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
    • G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
    • G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
    • G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
    • G01L9/0055—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements bonded on a diaphragm
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
    • G01L9/006—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of metallic strain gauges fixed to an element other than the pressure transmitting diaphragm
GB08510558A 1985-04-25 1985-04-25 Transducer devices Withdrawn GB2174241A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08510558A GB2174241A (en) 1985-04-25 1985-04-25 Transducer devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08510558A GB2174241A (en) 1985-04-25 1985-04-25 Transducer devices

Publications (2)

Publication Number Publication Date
GB8510558D0 true GB8510558D0 (en) 1985-05-30
GB2174241A GB2174241A (en) 1986-10-29

Family

ID=10578191

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08510558A Withdrawn GB2174241A (en) 1985-04-25 1985-04-25 Transducer devices

Country Status (1)

Country Link
GB (1) GB2174241A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5049232A (en) * 1990-08-31 1991-09-17 General Electric Company Method of making diaphragm-type pressure transducers
JPH06186096A (en) * 1992-12-15 1994-07-08 Ishida Co Ltd Distortion gauge and manufacture thereof
KR100432068B1 (en) * 1996-04-13 2004-09-08 로베르트 보쉬 게엠베하 Pressure sensor
US6189205B1 (en) 1996-08-27 2001-02-20 Robert Bosch Gmbh Process for producing pressure sensors
DE10157592A1 (en) * 2001-11-23 2003-06-12 Hydac Electronic Gmbh Method of manufacturing a variety of pressure sensors
WO2006016136A2 (en) 2004-08-10 2006-02-16 Dage Precision Industries Ltd. Shear test device
US7905152B2 (en) 2006-02-17 2011-03-15 Nordson Corporation Shear test apparatus and method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4400869A (en) * 1981-02-12 1983-08-30 Becton Dickinson And Company Process for producing high temperature pressure transducers and semiconductors

Also Published As

Publication number Publication date
GB2174241A (en) 1986-10-29

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)