GB834337A - Photopolymerisable compositions and elements containing the same - Google Patents
Photopolymerisable compositions and elements containing the sameInfo
- Publication number
- GB834337A GB834337A GB25584/57A GB2558457A GB834337A GB 834337 A GB834337 A GB 834337A GB 25584/57 A GB25584/57 A GB 25584/57A GB 2558457 A GB2558457 A GB 2558457A GB 834337 A GB834337 A GB 834337A
- Authority
- GB
- United Kingdom
- Prior art keywords
- weight
- polyvinyl
- benzoin
- propanol
- alpha
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Polymerisation Methods In General (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US834337XA | 1956-08-27 | 1956-08-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB834337A true GB834337A (en) | 1960-05-04 |
Family
ID=22178295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB25584/57A Expired GB834337A (en) | 1956-08-27 | 1957-08-13 | Photopolymerisable compositions and elements containing the same |
Country Status (4)
Country | Link |
---|---|
BE (1) | BE560154A (US07488766-20090210-C00029.png) |
FR (1) | FR1186296A (US07488766-20090210-C00029.png) |
GB (1) | GB834337A (US07488766-20090210-C00029.png) |
NL (2) | NL103565C (US07488766-20090210-C00029.png) |
Cited By (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2645113A1 (de) * | 1975-10-07 | 1977-04-14 | Murakami Screen Kk | Photoempfindliche zusammensetzung fuer drucksiebe |
US4517277A (en) * | 1981-11-12 | 1985-05-14 | Basf Aktiengesellschaft | Photosensitive recording material suitable for the production of printing plates and relief plates, and the production of these plates using this recording material |
US4540743A (en) * | 1983-06-25 | 1985-09-10 | Basf Aktiengesellschaft | Acylation of polyvinyl alcohols, and photopolymerizable and/or photocrosslinkable mixtures containing products thus acylated |
US4554240A (en) * | 1983-06-25 | 1985-11-19 | Basf Aktiengesellschaft | Photosensitive recording material which can be developed with water, for the production of printing plates, relief plates or resist images |
US4585726A (en) * | 1983-07-08 | 1986-04-29 | Basf Aktiengesellschaft | Photopolymerizable water-soluble or water-dispersible mixture containing a salt of nitrous acid |
US4590146A (en) * | 1983-07-08 | 1986-05-20 | Basf Aktiengesellschaft | Stabilization of photopolymerizable mixtures |
EP0211406A2 (de) * | 1985-08-02 | 1987-02-25 | Hoechst Celanese Corporation | Photopolymerisierbares Gemisch mit Polyvinylacetal als Bindemittel und daraus hergestelltes Aufzeichnungsmaterial |
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4670507A (en) * | 1985-08-02 | 1987-06-02 | American Hoechst Corporation | Resin |
US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
US4828963A (en) * | 1981-12-10 | 1989-05-09 | Toray Industries, Inc. | Printing plate having photosensitive polymer composition |
US4849307A (en) * | 1985-11-21 | 1989-07-18 | Basf Aktiengesellschaft | Photosensitive recording materials having a novel graft copolymer binder |
US4895788A (en) * | 1985-08-02 | 1990-01-23 | Hoechst Celanese Corporation | Water developable lithographic composition |
US5134053A (en) * | 1989-07-27 | 1992-07-28 | Hoechst Aktiengesellschaft | Graft polymer with unsaturated lateral chains, photosensitive mixture containing said graft polymer and recording material produced therefrom |
WO1996018133A1 (en) * | 1994-12-06 | 1996-06-13 | Napp Systems, Inc. | High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor |
US5683837A (en) * | 1994-11-18 | 1997-11-04 | Napp Systems, Inc. | Water-soluble compositions for preparation of durable, high-resolution printing plates |
-
0
- BE BE560154D patent/BE560154A/xx unknown
- NL NL220139D patent/NL220139A/xx unknown
- NL NL103565D patent/NL103565C/xx active
-
1957
- 1957-08-13 GB GB25584/57A patent/GB834337A/en not_active Expired
- 1957-08-26 FR FR1186296D patent/FR1186296A/fr not_active Expired
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2645113A1 (de) * | 1975-10-07 | 1977-04-14 | Murakami Screen Kk | Photoempfindliche zusammensetzung fuer drucksiebe |
US4517277A (en) * | 1981-11-12 | 1985-05-14 | Basf Aktiengesellschaft | Photosensitive recording material suitable for the production of printing plates and relief plates, and the production of these plates using this recording material |
US5023165A (en) * | 1981-12-10 | 1991-06-11 | Toray Industries, Inc. | Printing plate having photosensitive polymer composition |
US4828963A (en) * | 1981-12-10 | 1989-05-09 | Toray Industries, Inc. | Printing plate having photosensitive polymer composition |
US4540743A (en) * | 1983-06-25 | 1985-09-10 | Basf Aktiengesellschaft | Acylation of polyvinyl alcohols, and photopolymerizable and/or photocrosslinkable mixtures containing products thus acylated |
US4554240A (en) * | 1983-06-25 | 1985-11-19 | Basf Aktiengesellschaft | Photosensitive recording material which can be developed with water, for the production of printing plates, relief plates or resist images |
US4585726A (en) * | 1983-07-08 | 1986-04-29 | Basf Aktiengesellschaft | Photopolymerizable water-soluble or water-dispersible mixture containing a salt of nitrous acid |
US4590146A (en) * | 1983-07-08 | 1986-05-20 | Basf Aktiengesellschaft | Stabilization of photopolymerizable mixtures |
EP0211406A3 (de) * | 1985-08-02 | 1988-08-17 | Hoechst Celanese Corporation | Photopolymerisierbares Gemisch mit Polyvinylacetal als Bindemittel und daraus hergestelltes Aufzeichnungsmaterial |
US4707437A (en) * | 1985-08-02 | 1987-11-17 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4670507A (en) * | 1985-08-02 | 1987-06-02 | American Hoechst Corporation | Resin |
US4780392A (en) * | 1985-08-02 | 1988-10-25 | Hoechst Celanese Corporation | Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer |
US4822720A (en) * | 1985-08-02 | 1989-04-18 | Hoechst Celanese Corporation | Water developable screen printing composition |
US4652604A (en) * | 1985-08-02 | 1987-03-24 | American Hoechst Corporation | Radiation-polymerizable composition and element containing a photopolymer composition |
US4895788A (en) * | 1985-08-02 | 1990-01-23 | Hoechst Celanese Corporation | Water developable lithographic composition |
EP0211406A2 (de) * | 1985-08-02 | 1987-02-25 | Hoechst Celanese Corporation | Photopolymerisierbares Gemisch mit Polyvinylacetal als Bindemittel und daraus hergestelltes Aufzeichnungsmaterial |
US4849307A (en) * | 1985-11-21 | 1989-07-18 | Basf Aktiengesellschaft | Photosensitive recording materials having a novel graft copolymer binder |
US5134053A (en) * | 1989-07-27 | 1992-07-28 | Hoechst Aktiengesellschaft | Graft polymer with unsaturated lateral chains, photosensitive mixture containing said graft polymer and recording material produced therefrom |
US5683837A (en) * | 1994-11-18 | 1997-11-04 | Napp Systems, Inc. | Water-soluble compositions for preparation of durable, high-resolution printing plates |
WO1996018133A1 (en) * | 1994-12-06 | 1996-06-13 | Napp Systems, Inc. | High-resolution letterpress printing plates and water-soluble photopolymerizable compositions comprising a polyvinylalcohol derivative useful therefor |
Also Published As
Publication number | Publication date |
---|---|
NL220139A (US07488766-20090210-C00029.png) | |
NL103565C (US07488766-20090210-C00029.png) | |
BE560154A (US07488766-20090210-C00029.png) | |
FR1186296A (fr) | 1959-08-19 |
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