GB8318406D0 - Magnetron - Google Patents

Magnetron

Info

Publication number
GB8318406D0
GB8318406D0 GB838318406A GB8318406A GB8318406D0 GB 8318406 D0 GB8318406 D0 GB 8318406D0 GB 838318406 A GB838318406 A GB 838318406A GB 8318406 A GB8318406 A GB 8318406A GB 8318406 D0 GB8318406 D0 GB 8318406D0
Authority
GB
United Kingdom
Prior art keywords
magnetron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB838318406A
Other versions
GB2125440A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ELPHICK C
Nyaiesh A R
Original Assignee
ELPHICK C
Nyaiesh A R
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB838307580A external-priority patent/GB8307580D0/en
Application filed by ELPHICK C, Nyaiesh A R filed Critical ELPHICK C
Priority to GB08318406A priority Critical patent/GB2125440A/en
Publication of GB8318406D0 publication Critical patent/GB8318406D0/en
Publication of GB2125440A publication Critical patent/GB2125440A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
GB08318406A 1982-07-13 1983-07-07 Tunnel magnetron for cathode sputtering Withdrawn GB2125440A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB08318406A GB2125440A (en) 1982-07-13 1983-07-07 Tunnel magnetron for cathode sputtering

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB8220270 1982-07-13
GB838307580A GB8307580D0 (en) 1982-07-13 1983-03-18 Magnetron magnet
GB08318406A GB2125440A (en) 1982-07-13 1983-07-07 Tunnel magnetron for cathode sputtering

Publications (2)

Publication Number Publication Date
GB8318406D0 true GB8318406D0 (en) 1983-08-10
GB2125440A GB2125440A (en) 1984-03-07

Family

ID=27261659

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08318406A Withdrawn GB2125440A (en) 1982-07-13 1983-07-07 Tunnel magnetron for cathode sputtering

Country Status (1)

Country Link
GB (1) GB2125440A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6260866A (en) * 1985-08-02 1987-03-17 Fujitsu Ltd Magnetron sputtering device
JPS6247478A (en) * 1985-08-26 1987-03-02 バリアン・アソシエイツ・インコ−ポレイテツド Planer magnetron sputtering apparatus wherein circular motion and radial motion of magnetic field are combined
US5171415A (en) * 1990-12-21 1992-12-15 Novellus Systems, Inc. Cooling method and apparatus for magnetron sputtering
US5126029A (en) * 1990-12-27 1992-06-30 Intel Corporation Apparatus and method for achieving via step coverage symmetry
GB9121699D0 (en) * 1991-10-11 1991-11-27 Hacker Dennis J Volume manufacture of low weight/cost fire stop(proof)doors & partitions with 1/2-1-1 1/2-2-3-4 hour capacities
US5746897A (en) * 1995-07-10 1998-05-05 Cvc Products, Inc. High magnetic flux permanent magnet array apparatus and method for high productivity physical vapor deposition
US6039848A (en) * 1995-07-10 2000-03-21 Cvc Products, Inc. Ultra-high vacuum apparatus and method for high productivity physical vapor deposition.
GB2318590B (en) * 1995-07-10 1999-04-14 Cvc Products Inc Magnetron cathode apparatus and method for sputtering
US6221217B1 (en) 1995-07-10 2001-04-24 Cvc, Inc. Physical vapor deposition system having reduced thickness backing plate

Also Published As

Publication number Publication date
GB2125440A (en) 1984-03-07

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)