GB656774A - Improvements in or relating to processes of preparing new organic silicon compounds and the compounds resulting from said process - Google Patents
Improvements in or relating to processes of preparing new organic silicon compounds and the compounds resulting from said processInfo
- Publication number
- GB656774A GB656774A GB19889/47A GB1988947A GB656774A GB 656774 A GB656774 A GB 656774A GB 19889/47 A GB19889/47 A GB 19889/47A GB 1988947 A GB1988947 A GB 1988947A GB 656774 A GB656774 A GB 656774A
- Authority
- GB
- United Kingdom
- Prior art keywords
- tertiary
- butoxy
- groups
- carbinoxy
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000003377 silicon compounds Chemical class 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 4
- 150000001875 compounds Chemical class 0.000 title abstract 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 abstract 15
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 abstract 14
- -1 Organo silicon Chemical compound 0.000 abstract 11
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 abstract 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 5
- 125000003118 aryl group Chemical group 0.000 abstract 5
- 239000011347 resin Substances 0.000 abstract 5
- 229920005989 resin Polymers 0.000 abstract 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical compound C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 abstract 4
- 125000001931 aliphatic group Chemical group 0.000 abstract 4
- 125000005843 halogen group Chemical group 0.000 abstract 4
- 125000000623 heterocyclic group Chemical group 0.000 abstract 4
- 239000003921 oil Substances 0.000 abstract 4
- 229910052710 silicon Inorganic materials 0.000 abstract 4
- 125000001424 substituent group Chemical group 0.000 abstract 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 3
- 125000000217 alkyl group Chemical group 0.000 abstract 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 abstract 3
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 abstract 3
- 229910052736 halogen Inorganic materials 0.000 abstract 3
- 150000002367 halogens Chemical group 0.000 abstract 3
- 230000003301 hydrolyzing effect Effects 0.000 abstract 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 abstract 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 abstract 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 abstract 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 abstract 2
- 239000002253 acid Substances 0.000 abstract 2
- 125000002723 alicyclic group Chemical group 0.000 abstract 2
- 125000003545 alkoxy group Chemical group 0.000 abstract 2
- 229910021529 ammonia Inorganic materials 0.000 abstract 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract 2
- GIMMOGOBHUNKKK-UHFFFAOYSA-N dichloro(pentoxy)silane Chemical group O(CCCCC)[SiH](Cl)Cl GIMMOGOBHUNKKK-UHFFFAOYSA-N 0.000 abstract 2
- DLHSCEYJQODJPQ-UHFFFAOYSA-N dichloro-bis[(2-methylpropan-2-yl)oxy]silane Chemical group CC(C)(C)O[Si](Cl)(Cl)OC(C)(C)C DLHSCEYJQODJPQ-UHFFFAOYSA-N 0.000 abstract 2
- 235000019441 ethanol Nutrition 0.000 abstract 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 abstract 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 abstract 2
- 239000000047 product Substances 0.000 abstract 2
- 229920006395 saturated elastomer Polymers 0.000 abstract 2
- 150000004819 silanols Chemical class 0.000 abstract 2
- 150000004760 silicates Chemical class 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 239000005049 silicon tetrachloride Substances 0.000 abstract 2
- 239000007858 starting material Substances 0.000 abstract 2
- 239000005052 trichlorosilane Substances 0.000 abstract 2
- LDVVTQMJQSCDMK-UHFFFAOYSA-N 1,3-dihydroxypropan-2-yl formate Chemical compound OCC(CO)OC=O LDVVTQMJQSCDMK-UHFFFAOYSA-N 0.000 abstract 1
- PTTMZDSPKDLWHI-UHFFFAOYSA-N 3,3-ditert-butyl-2-methylpentane-2,4-diol Chemical compound C(C)(C)(C)C(C(C)(O)C)(C(C)O)C(C)(C)C PTTMZDSPKDLWHI-UHFFFAOYSA-N 0.000 abstract 1
- KMTFQEDCNAGUPS-UHFFFAOYSA-N 4-ethyl-2,2,6,6-tetramethyl-4-nitroheptane-3,5-diol Chemical compound C(C)(C)(C)C(C(C(O)C(C)(C)C)([N+](=O)[O-])CC)O KMTFQEDCNAGUPS-UHFFFAOYSA-N 0.000 abstract 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 abstract 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical class [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- 235000004431 Linum usitatissimum Nutrition 0.000 abstract 1
- 240000006240 Linum usitatissimum Species 0.000 abstract 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 229910002808 Si–O–Si Inorganic materials 0.000 abstract 1
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 abstract 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 abstract 1
- JDXFWPNOKMPSEM-UHFFFAOYSA-N [Si].ClOCl Chemical compound [Si].ClOCl JDXFWPNOKMPSEM-UHFFFAOYSA-N 0.000 abstract 1
- OPARTXXEFXPWJL-UHFFFAOYSA-N [acetyloxy-bis[(2-methylpropan-2-yl)oxy]silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)(C)C)OC(C)(C)C OPARTXXEFXPWJL-UHFFFAOYSA-N 0.000 abstract 1
- 125000003277 amino group Chemical group 0.000 abstract 1
- 229910052796 boron Inorganic materials 0.000 abstract 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 abstract 1
- NCCPPOZTBYQIPS-UHFFFAOYSA-N butoxy(hydroxy)silane Chemical group CCCCO[SiH2]O NCCPPOZTBYQIPS-UHFFFAOYSA-N 0.000 abstract 1
- JNBDRIIVRFZPIH-UHFFFAOYSA-N butoxy-dichloro-[(2-methylpropan-2-yl)oxy]silane Chemical compound C(CCC)O[Si](Cl)(Cl)OC(C)(C)C JNBDRIIVRFZPIH-UHFFFAOYSA-N 0.000 abstract 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract 1
- 239000007795 chemical reaction product Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 150000001805 chlorine compounds Chemical class 0.000 abstract 1
- FIRQYUPQXNPTKO-UHFFFAOYSA-N ctk0i2755 Chemical class N[SiH2]N FIRQYUPQXNPTKO-UHFFFAOYSA-N 0.000 abstract 1
- VILAVOFMIJHSJA-UHFFFAOYSA-N dicarbon monoxide Chemical group [C]=C=O VILAVOFMIJHSJA-UHFFFAOYSA-N 0.000 abstract 1
- NDJABBUJISGJPH-UHFFFAOYSA-N dichloro-[(2-methylpropan-2-yl)oxy]-phenoxysilane Chemical compound O(C1=CC=CC=C1)[Si](Cl)(Cl)OC(C)(C)C NDJABBUJISGJPH-UHFFFAOYSA-N 0.000 abstract 1
- UFRXMUNZXSCISG-UHFFFAOYSA-N dichloro-ethyl-[(2-methylpropan-2-yl)oxy]silane Chemical compound C(C)[Si](Cl)(Cl)OC(C)(C)C UFRXMUNZXSCISG-UHFFFAOYSA-N 0.000 abstract 1
- WLIGPBOVYTVHKD-UHFFFAOYSA-N dihydroxy-bis[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](O)(O)OC(C)(C)C WLIGPBOVYTVHKD-UHFFFAOYSA-N 0.000 abstract 1
- 235000004426 flaxseed Nutrition 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 abstract 1
- 238000007689 inspection Methods 0.000 abstract 1
- 239000000203 mixture Chemical group 0.000 abstract 1
- 150000007524 organic acids Chemical class 0.000 abstract 1
- 235000005985 organic acids Nutrition 0.000 abstract 1
- 150000003961 organosilicon compounds Chemical class 0.000 abstract 1
- 239000003208 petroleum Substances 0.000 abstract 1
- 150000003018 phosphorus compounds Chemical class 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 150000003141 primary amines Chemical class 0.000 abstract 1
- 238000010992 reflux Methods 0.000 abstract 1
- 150000003335 secondary amines Chemical class 0.000 abstract 1
- 229910000077 silane Inorganic materials 0.000 abstract 1
- 150000004756 silanes Chemical class 0.000 abstract 1
- 229910000029 sodium carbonate Inorganic materials 0.000 abstract 1
- 150000003509 tertiary alcohols Chemical class 0.000 abstract 1
- 150000003512 tertiary amines Chemical class 0.000 abstract 1
- KCTGOQZIKPDZNK-UHFFFAOYSA-N tetrapentyl silicate Chemical group CCCCCO[Si](OCCCCC)(OCCCCC)OCCCCC KCTGOQZIKPDZNK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 239000010936 titanium Substances 0.000 abstract 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 abstract 1
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 abstract 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
Abstract
Organo silicon resins are obtained by hydrolysing a di-tertiary carbinoxy dihalogeno silane or a tertiary carbinoxy trichlorosilane in the presence of an acid acceptor, e.g. pyridine, ammonia or sodium carbonate, and then heating the product. The tertiary carbinoxy groups may be the same or different and may be any of the following: the tertiary-butoxy, tertiaryamoxy, dichloro-tertiary butoxy, 1-ethylcyclohexoxy, terpineoxy, dihydroterpineoxy, linalooxy and 4-acetoxy-2-methyl-2-pentoxy groups. Each of the three carbon atoms joined to the carbonyl atom of the tertiary-carbinoxy group may be included in a chlorinated alkyl or an aliphatic, aromatic, alicyclic or heterocyclic group; the aliphatic groups may be saturated or unsaturated, while any of the groups may contain substituents which are inert to the reaction, e.g. the halogen, nitro, alkoxy or acetoxy groups. The aromatic groups may, in addition to the substituents mentioned above, have an alkyl substituent. Heterocyclic groups mentioned are the furan and thiophene groups. A resin is obtained, for example, by hydrolysing di-tertiary amoxy dichloro silane, separating the resulting oil and water layers, extracting the water layer with benzene and adding the extract to the oil, and the benzene is then distilled from the oil and the oil heated. In a similar way, di-tertiary carbinoxy diamino silanes yield a resin, but they may be hydrolysed with water alone. The resins are soluble in benzene, ethyl alcohol or petroleum ether. Alkdy type resins are obtained by reacting linseed monoglyceride and di-tertiary amoxy dichloro silane or di-tertiary butoxy dichloro silane or a mixture of di-tertiary butoxy dichloro silane and tertiary-butoxy trichloro silane in the presence of pyridine, refluxing after adding benzene and then distilling off the benzene.ALSO:Organo silicon compounds having at least one tertiary carbinoxy group and at least one halogen atom directly attached to a silicon atom are prepared by reacting a tertiary alcohol with a silicon compound having at least two halogen atoms each directly attached to a silicon atom in the presence of pyridine or a tertiary amine. The halogen may be chlorine. Tertiary carbinoxy groups mentioned are the tertiary-butoxy, tertiary amoxy, dichloro-tertiary butoxy, 1-ethylcyclohexoxy, terpineoxy, dihydroterpineoxy, linalooxy, and 4-acetoxy-2-methyl-2-pentoxy groups. Silicon compounds which may be used for the process are silicon tetrachloride (may be employed in the form of a reaction product of pyridine and silicon tetrachloride), silicon oxychloride, tertiary alkoxy trichlorosilane and di-tertiary-alkoxy dichlorosilane. Bromine compounds are mentioned as alternatives to the chlorine compounds. Each of the three carbon atoms joined to the carbonyl carbon atom may be included in a chlorinated alkyl or an aliphatic, aromatic, alicyclic or heterocyclic group; the aliphatic groups may be saturated or unsaturated, while any of the groups may contain substituents which are inert to the reaction, e.g. the halogen, nitro, alkoxy or acetoxy groups. The aromatic groups may, in addition to the substituents mentioned above, have an alkyl substituent. Heterocyclic groups mentioned are the furan and thiophene groups. In the case of the desired silicon compounds containing more than one tertiary carbinoxy group, the groups may be the same or different. The tertiary carbinoxy halogeno organo silicon compounds may be reacted with ammonia or primary or secondary amines to replace at least one of the halogen atoms with an amino group, e.g. di-tertiary butoxy diamino and dianilino silanes may be prepared. Silicates are obtained by reacting the tertiary carbinoxy halogeno organo silicon compounds with pyridine and an alcohol or glycol, and the following silicates are mentioned di-n-propyl di-tertiary amyl silicate di-tertiary-butyl di-allyl silicate, di-tertiary-butyl (diethylene glycol) silicate, di-tertiary butyl (2-ethyl-2-nitro-1,3-propanediol) silicate, and di-tertiary butyl (2-methyl-2,4-pentanediol) silicate. The tertiary carbinoxy halogeno organo silicon compounds may also be reacted with organic acids in the presence of pyridine to yield compounds such as di-tertiary butoxy diacetoxy silane. Silanols are obtained by hydrolysing under alkaline conditions the tertiary-carbinoxy halogeno silicon compounds, e.g. with aqueous ammonia or aqueous pyridine; specific silanols mentioned are di-tertiary-butoxy dihydroxy silane, tritertiary butoxy hydroxy silane and a compound of the formula [(CH3)3CO]2(OH)-Si-O-Si(OH)[OC(CH3) 3]2. The Specification as open to inspection under Sect. 91 refers to the use of any acid acceptor for the preparation of the tertiary carbinoxy halogeno organo silicon compounds, and to the use of any silicon compound containing a plurality of hydrolysable halogen atoms attached to silicon as a starting material. Additional starting materials mentioned are hexachlorodisilane and alkyl or aryl polychlorosilane. An additional product which may be made by the process is ethyl tertiary-butoxy dichlorosilane, i.e. from tertiary butyl alcohol and ethyltrichlorosilane. Phenoxy tertiary-butoxy dichlorosilane, n-butoxy tertiary-butoxy dichlorosilane and tertiary-butoxy octadecoxy dichlorosilane are prepared by reacting phenol, n-butylalcohol and octadecanol with tertiary-butoxy trichlorosilane. The Specification also states that boron, titanium or phosphorus compounds analogous to the silicon compounds may be prepared. This subject-matter does not appear in the Specification as accepted.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US656774XA | 1942-12-31 | 1942-12-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB656774A true GB656774A (en) | 1951-09-05 |
Family
ID=22064373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB19889/47A Expired GB656774A (en) | 1942-12-31 | 1947-07-24 | Improvements in or relating to processes of preparing new organic silicon compounds and the compounds resulting from said process |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB656774A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117534697A (en) * | 2024-01-09 | 2024-02-09 | 全椒亚格泰电子新材料科技有限公司 | Preparation process and preparation system of tri-tert-butoxy silanol |
-
1947
- 1947-07-24 GB GB19889/47A patent/GB656774A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117534697A (en) * | 2024-01-09 | 2024-02-09 | 全椒亚格泰电子新材料科技有限公司 | Preparation process and preparation system of tri-tert-butoxy silanol |
CN117534697B (en) * | 2024-01-09 | 2024-04-05 | 全椒亚格泰电子新材料科技有限公司 | Preparation process and preparation system of tri-tert-butoxy silanol |
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