GB2498100A - High purity synthetic silica and items such as semiconductor jigs manufactured therefrom - Google Patents
High purity synthetic silica and items such as semiconductor jigs manufactured therefrom Download PDFInfo
- Publication number
- GB2498100A GB2498100A GB1223456.3A GB201223456A GB2498100A GB 2498100 A GB2498100 A GB 2498100A GB 201223456 A GB201223456 A GB 201223456A GB 2498100 A GB2498100 A GB 2498100A
- Authority
- GB
- United Kingdom
- Prior art keywords
- silicon carbide
- ingots
- items
- high purity
- synthetic silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 3
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000377 silicon dioxide Substances 0.000 title 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 abstract 3
- 229910010271 silicon carbide Inorganic materials 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- 229910002804 graphite Inorganic materials 0.000 abstract 2
- 239000010439 graphite Substances 0.000 abstract 2
- 239000004071 soot Substances 0.000 abstract 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 abstract 1
- 239000000460 chlorine Substances 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 239000005350 fused silica glass Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000001307 helium Substances 0.000 abstract 1
- 229910052734 helium Inorganic materials 0.000 abstract 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
Hollow ingots of transparent synthetic vitreous silica glass of external diameter greater than 400 mm and internal diameter greater than 300 mm are disclosed. The ingots are substantially free from bubbles or inclusions greater than 100 μιη in diameter, have no more than 100 ppB of any individual metallic impurity, and have chlorine concentration less than 5 ppM. Also disclosed are methods for producing such ingots, in which a porous soot body of density greater than 0.4 g/ cm3 is deposited on an oxidation resistant mandrel. The soot body is dehydrated on a mandrel comprising graphite, carbon fibre reinforced carbon, silicon carbide, silicon impregnated silicon carbide, silicon carbide-coated graphite or vitreous silica, either under vacuum or in the presence of a reducing gas, and then sintered to transparent pore-free glass under vacuum or in an atmosphere of helium.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2011/061683 WO2012004398A1 (en) | 2010-07-09 | 2011-07-08 | High purity synthetic silica and items such as semiconductor jigs manufactured therefrom |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB201223456D0 GB201223456D0 (en) | 2013-02-13 |
| GB2498100A true GB2498100A (en) | 2013-07-03 |
Family
ID=47720149
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1223456.3A Withdrawn GB2498100A (en) | 2011-07-08 | 2011-07-08 | High purity synthetic silica and items such as semiconductor jigs manufactured therefrom |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB2498100A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0163752A1 (en) * | 1984-06-05 | 1985-12-11 | Shin-Etsu Chemical Co., Ltd. | A method for the preparation of a synthetic quartz glass tube |
| US6376401B1 (en) * | 1998-09-07 | 2002-04-23 | Tosoh Corporation | Ultraviolet ray-transparent optical glass material and method of producing same |
| US20080066497A1 (en) * | 2005-04-15 | 2008-03-20 | Heraeus Quarzglas Gmbh & Co., Kg | Holder Made From Quartz Glass for the Processing of Semiconductor Wafers and Method for Production of the Holder |
| EP2070883A1 (en) * | 2006-09-11 | 2009-06-17 | Tosoh Corporation | Fused quartz glass and process for producing the same |
| EP2088129A2 (en) * | 2008-02-07 | 2009-08-12 | Corning Inc. | Halide free fused silica glasses having low OH, OD concentrations and their manufacturing method |
-
2011
- 2011-07-08 GB GB1223456.3A patent/GB2498100A/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0163752A1 (en) * | 1984-06-05 | 1985-12-11 | Shin-Etsu Chemical Co., Ltd. | A method for the preparation of a synthetic quartz glass tube |
| US6376401B1 (en) * | 1998-09-07 | 2002-04-23 | Tosoh Corporation | Ultraviolet ray-transparent optical glass material and method of producing same |
| US20080066497A1 (en) * | 2005-04-15 | 2008-03-20 | Heraeus Quarzglas Gmbh & Co., Kg | Holder Made From Quartz Glass for the Processing of Semiconductor Wafers and Method for Production of the Holder |
| EP2070883A1 (en) * | 2006-09-11 | 2009-06-17 | Tosoh Corporation | Fused quartz glass and process for producing the same |
| EP2088129A2 (en) * | 2008-02-07 | 2009-08-12 | Corning Inc. | Halide free fused silica glasses having low OH, OD concentrations and their manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| GB201223456D0 (en) | 2013-02-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |