GB2491152B - Methods and apparatuses for depositing a layer of coating material on a component - Google Patents

Methods and apparatuses for depositing a layer of coating material on a component

Info

Publication number
GB2491152B
GB2491152B GB1108756.6A GB201108756A GB2491152B GB 2491152 B GB2491152 B GB 2491152B GB 201108756 A GB201108756 A GB 201108756A GB 2491152 B GB2491152 B GB 2491152B
Authority
GB
United Kingdom
Prior art keywords
apparatuses
depositing
methods
component
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB1108756.6A
Other versions
GB2491152A (en
GB201108756D0 (en
Inventor
Jones Paul
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Qioptiq Ltd
Original Assignee
Qioptiq Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qioptiq Ltd filed Critical Qioptiq Ltd
Priority to GB1108756.6A priority Critical patent/GB2491152B/en
Publication of GB201108756D0 publication Critical patent/GB201108756D0/en
Priority to PCT/GB2012/000413 priority patent/WO2012160322A1/en
Publication of GB2491152A publication Critical patent/GB2491152A/en
Application granted granted Critical
Publication of GB2491152B publication Critical patent/GB2491152B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
GB1108756.6A 2011-05-24 2011-05-24 Methods and apparatuses for depositing a layer of coating material on a component Active GB2491152B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1108756.6A GB2491152B (en) 2011-05-24 2011-05-24 Methods and apparatuses for depositing a layer of coating material on a component
PCT/GB2012/000413 WO2012160322A1 (en) 2011-05-24 2012-05-04 Method and apparatus for coating on the concave surface of a component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1108756.6A GB2491152B (en) 2011-05-24 2011-05-24 Methods and apparatuses for depositing a layer of coating material on a component

Publications (3)

Publication Number Publication Date
GB201108756D0 GB201108756D0 (en) 2011-07-06
GB2491152A GB2491152A (en) 2012-11-28
GB2491152B true GB2491152B (en) 2017-11-01

Family

ID=44279569

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1108756.6A Active GB2491152B (en) 2011-05-24 2011-05-24 Methods and apparatuses for depositing a layer of coating material on a component

Country Status (2)

Country Link
GB (1) GB2491152B (en)
WO (1) WO2012160322A1 (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63149369A (en) * 1986-12-10 1988-06-22 Sumitomo Electric Ind Ltd Vapor deposition method
US5738729A (en) * 1995-11-13 1998-04-14 Balzers Aktiengesellschaft Coating chamber, accompanying substrate carrier, vacuum evaporation and coating method
JPH10287973A (en) * 1997-04-15 1998-10-27 Olympus Optical Co Ltd Sputtering device
US6142097A (en) * 1998-01-20 2000-11-07 Nikon Corporation Optical membrane forming apparatus and optical device produced by the same
WO2001040538A1 (en) * 1999-12-03 2001-06-07 The Regents Of The University Of California Method and system relating to thickness control of film vapor deposition
US6425988B1 (en) * 1999-12-03 2002-07-30 Claude Montcalm Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy
JP2004010915A (en) * 2002-06-04 2004-01-15 Ushio Inc Magnetron sputtering device
CN101210312A (en) * 2006-12-28 2008-07-02 鸿海精密工业股份有限公司 Film preparation system and method for balancing film stress

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT264746B (en) * 1966-08-10 1968-09-10 Eumig Arrangement for vapor deposition of interference layers
JP2007182617A (en) * 2006-01-10 2007-07-19 Ulvac Japan Ltd Method and apparatus for forming film by sputtering

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63149369A (en) * 1986-12-10 1988-06-22 Sumitomo Electric Ind Ltd Vapor deposition method
US5738729A (en) * 1995-11-13 1998-04-14 Balzers Aktiengesellschaft Coating chamber, accompanying substrate carrier, vacuum evaporation and coating method
JPH10287973A (en) * 1997-04-15 1998-10-27 Olympus Optical Co Ltd Sputtering device
US6142097A (en) * 1998-01-20 2000-11-07 Nikon Corporation Optical membrane forming apparatus and optical device produced by the same
WO2001040538A1 (en) * 1999-12-03 2001-06-07 The Regents Of The University Of California Method and system relating to thickness control of film vapor deposition
US6425988B1 (en) * 1999-12-03 2002-07-30 Claude Montcalm Method and system using power modulation for maskless vapor deposition of spatially graded thin film and multilayer coatings with atomic-level precision and accuracy
JP2004010915A (en) * 2002-06-04 2004-01-15 Ushio Inc Magnetron sputtering device
CN101210312A (en) * 2006-12-28 2008-07-02 鸿海精密工业股份有限公司 Film preparation system and method for balancing film stress

Also Published As

Publication number Publication date
GB2491152A (en) 2012-11-28
GB201108756D0 (en) 2011-07-06
WO2012160322A1 (en) 2012-11-29

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