GB2449327B - Semiconductor growth control method and apparatus - Google Patents
Semiconductor growth control method and apparatusInfo
- Publication number
- GB2449327B GB2449327B GB0803189A GB0803189A GB2449327B GB 2449327 B GB2449327 B GB 2449327B GB 0803189 A GB0803189 A GB 0803189A GB 0803189 A GB0803189 A GB 0803189A GB 2449327 B GB2449327 B GB 2449327B
- Authority
- GB
- United Kingdom
- Prior art keywords
- control method
- growth control
- semiconductor growth
- semiconductor
- growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0703300.4A GB0703300D0 (en) | 2007-02-21 | 2007-02-21 | Semiconductor Growth Control Method and Apparatus |
Publications (3)
Publication Number | Publication Date |
---|---|
GB0803189D0 GB0803189D0 (en) | 2008-04-02 |
GB2449327A GB2449327A (en) | 2008-11-19 |
GB2449327B true GB2449327B (en) | 2009-12-09 |
Family
ID=37908968
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB0703300.4A Ceased GB0703300D0 (en) | 2007-02-21 | 2007-02-21 | Semiconductor Growth Control Method and Apparatus |
GB0803189A Expired - Fee Related GB2449327B (en) | 2007-02-21 | 2008-02-21 | Semiconductor growth control method and apparatus |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB0703300.4A Ceased GB0703300D0 (en) | 2007-02-21 | 2007-02-21 | Semiconductor Growth Control Method and Apparatus |
Country Status (2)
Country | Link |
---|---|
GB (2) | GB0703300D0 (en) |
WO (1) | WO2008102179A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103026191B (en) | 2010-07-21 | 2015-08-19 | 第一太阳能有限公司 | Temperature-adjustedspectrometer spectrometer |
EP2916103A1 (en) * | 2014-03-04 | 2015-09-09 | LayTec AG | Method and appararus for real-time analysis of complex thin-film multi-layer growth processes |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4707611A (en) * | 1986-12-08 | 1987-11-17 | Rockwell International Corporation | Incremental monitoring of thin films |
US5354575A (en) * | 1993-04-16 | 1994-10-11 | University Of Maryland | Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers |
WO1998033077A2 (en) * | 1997-01-27 | 1998-07-30 | Haaland Peter D | Coatings, methods and apparatus for reducing reflection from optical substrates |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06349925A (en) * | 1993-06-07 | 1994-12-22 | Mitsubishi Electric Corp | Epitaxial growth layer evaluation method and process evaluation test pattern structure |
US7238912B2 (en) * | 2003-10-07 | 2007-07-03 | Midwest Research Institute | Wafer characteristics via reflectometry and wafer processing apparatus and method |
GB0516477D0 (en) * | 2005-08-11 | 2005-09-14 | Optical Reference Systems Ltd | Apparatus for measuring semiconductor physical characteristics |
-
2007
- 2007-02-21 GB GBGB0703300.4A patent/GB0703300D0/en not_active Ceased
-
2008
- 2008-02-21 WO PCT/GB2008/050119 patent/WO2008102179A1/en active Application Filing
- 2008-02-21 GB GB0803189A patent/GB2449327B/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4707611A (en) * | 1986-12-08 | 1987-11-17 | Rockwell International Corporation | Incremental monitoring of thin films |
US5354575A (en) * | 1993-04-16 | 1994-10-11 | University Of Maryland | Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers |
WO1998033077A2 (en) * | 1997-01-27 | 1998-07-30 | Haaland Peter D | Coatings, methods and apparatus for reducing reflection from optical substrates |
Non-Patent Citations (1)
Title |
---|
Applied Surface Science, Elsevier, Vol. 150, 1999, B.P. Singh, "In-situ thin film growth /etch measurement and control by laser light reflectance analysis", pp 95-100. * |
Also Published As
Publication number | Publication date |
---|---|
WO2008102179A1 (en) | 2008-08-28 |
GB2449327A (en) | 2008-11-19 |
GB0803189D0 (en) | 2008-04-02 |
GB0703300D0 (en) | 2007-03-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20120221 |