GB2449327B - Semiconductor growth control method and apparatus - Google Patents

Semiconductor growth control method and apparatus

Info

Publication number
GB2449327B
GB2449327B GB0803189A GB0803189A GB2449327B GB 2449327 B GB2449327 B GB 2449327B GB 0803189 A GB0803189 A GB 0803189A GB 0803189 A GB0803189 A GB 0803189A GB 2449327 B GB2449327 B GB 2449327B
Authority
GB
United Kingdom
Prior art keywords
control method
growth control
semiconductor growth
semiconductor
growth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB0803189A
Other versions
GB0803189D0 (en
GB2449327A (en
Inventor
Stuart Irvine
Carl Griffiths
Andrew Stafford
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optical Reference Systems Ltd
Original Assignee
Optical Reference Systems Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Optical Reference Systems Ltd filed Critical Optical Reference Systems Ltd
Publication of GB0803189D0 publication Critical patent/GB0803189D0/en
Publication of GB2449327A publication Critical patent/GB2449327A/en
Application granted granted Critical
Publication of GB2449327B publication Critical patent/GB2449327B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • H01L22/26—Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0683—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating measurement during deposition or removal of the layer
GB0803189A 2007-02-21 2008-02-21 Semiconductor growth control method and apparatus Expired - Fee Related GB2449327B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0703300A GB0703300D0 (en) 2007-02-21 2007-02-21 Semiconductor Growth Control Method and Apparatus

Publications (3)

Publication Number Publication Date
GB0803189D0 GB0803189D0 (en) 2008-04-02
GB2449327A GB2449327A (en) 2008-11-19
GB2449327B true GB2449327B (en) 2009-12-09

Family

ID=37908968

Family Applications (2)

Application Number Title Priority Date Filing Date
GB0703300A Ceased GB0703300D0 (en) 2007-02-21 2007-02-21 Semiconductor Growth Control Method and Apparatus
GB0803189A Expired - Fee Related GB2449327B (en) 2007-02-21 2008-02-21 Semiconductor growth control method and apparatus

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB0703300A Ceased GB0703300D0 (en) 2007-02-21 2007-02-21 Semiconductor Growth Control Method and Apparatus

Country Status (2)

Country Link
GB (2) GB0703300D0 (en)
WO (1) WO2008102179A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103026191B (en) 2010-07-21 2015-08-19 第一太阳能有限公司 Temperature-adjustedspectrometer spectrometer
EP2916103A1 (en) * 2014-03-04 2015-09-09 LayTec AG Method and appararus for real-time analysis of complex thin-film multi-layer growth processes

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4707611A (en) * 1986-12-08 1987-11-17 Rockwell International Corporation Incremental monitoring of thin films
US5354575A (en) * 1993-04-16 1994-10-11 University Of Maryland Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers
WO1998033077A2 (en) * 1997-01-27 1998-07-30 Haaland Peter D Coatings, methods and apparatus for reducing reflection from optical substrates

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06349925A (en) * 1993-06-07 1994-12-22 Mitsubishi Electric Corp Epitaxial growth layer evaluation method and process evaluation test pattern structure
US7238912B2 (en) * 2003-10-07 2007-07-03 Midwest Research Institute Wafer characteristics via reflectometry and wafer processing apparatus and method
GB0516477D0 (en) * 2005-08-11 2005-09-14 Optical Reference Systems Ltd Apparatus for measuring semiconductor physical characteristics

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4707611A (en) * 1986-12-08 1987-11-17 Rockwell International Corporation Incremental monitoring of thin films
US5354575A (en) * 1993-04-16 1994-10-11 University Of Maryland Ellipsometric approach to anti-reflection coatings of semiconductor laser amplifiers
WO1998033077A2 (en) * 1997-01-27 1998-07-30 Haaland Peter D Coatings, methods and apparatus for reducing reflection from optical substrates

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Applied Surface Science, Elsevier, Vol. 150, 1999, B.P. Singh, "In-situ thin film growth /etch measurement and control by laser light reflectance analysis", pp 95-100. *

Also Published As

Publication number Publication date
GB0803189D0 (en) 2008-04-02
GB2449327A (en) 2008-11-19
WO2008102179A1 (en) 2008-08-28
GB0703300D0 (en) 2007-03-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20120221