GB2420712A - Method of cleaning articles such as medical instruments - Google Patents
Method of cleaning articles such as medical instruments Download PDFInfo
- Publication number
- GB2420712A GB2420712A GB0524234A GB0524234A GB2420712A GB 2420712 A GB2420712 A GB 2420712A GB 0524234 A GB0524234 A GB 0524234A GB 0524234 A GB0524234 A GB 0524234A GB 2420712 A GB2420712 A GB 2420712A
- Authority
- GB
- United Kingdom
- Prior art keywords
- plasma
- article
- bias
- cleaning
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 37
- 238000004140 cleaning Methods 0.000 title claims abstract description 18
- 239000007789 gas Substances 0.000 claims abstract description 18
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 12
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000001301 oxygen Substances 0.000 claims abstract description 7
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 7
- 229910052786 argon Inorganic materials 0.000 claims abstract description 6
- 238000009832 plasma treatment Methods 0.000 claims abstract description 4
- 238000011282 treatment Methods 0.000 claims abstract description 4
- 238000004659 sterilization and disinfection Methods 0.000 claims description 6
- 210000002381 plasma Anatomy 0.000 description 36
- 238000001228 spectrum Methods 0.000 description 7
- 241000894007 species Species 0.000 description 6
- 229910001220 stainless steel Inorganic materials 0.000 description 6
- 239000010935 stainless steel Substances 0.000 description 6
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 5
- 108091003079 Bovine Serum Albumin Proteins 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 229940098773 bovine serum albumin Drugs 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000001269 time-of-flight mass spectrometry Methods 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 238000004380 ashing Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 210000004666 bacterial spore Anatomy 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- JJWKPURADFRFRB-UHFFFAOYSA-N carbonyl sulfide Chemical compound O=C=S JJWKPURADFRFRB-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000001524 infective effect Effects 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000000752 ionisation method Methods 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N nitrate group Chemical group [N+](=O)([O-])[O-] NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2/00—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor
- A61L2/02—Methods or apparatus for disinfecting or sterilising materials or objects other than foodstuffs or contact lenses; Accessories therefor using physical phenomena
- A61L2/14—Plasma, i.e. ionised gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/335—Cleaning
Landscapes
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Cleaning In General (AREA)
Abstract
A method of cleaning articles such as medical instruments. The method including the locating the instrument in a mesh holder basket and simultaneously carrying out DC bias and RF plasma treatments on the article, including providing for movement of the article by rotation. The mesh holder may be connected to the DC bias power supply to provide the DC bias treatment. The plasma gas may be substantially only air or include argon or oxygen. The negative DC bias is sufficient to excite the simultaneous DC-RF plasma. The DC voltage may be applied continuously or may be pulsed.
Description
Cleaning Method This invention relates to a method of cleaning articles,
and particularly but not exclusively to a method of cleaning medical articles.
Conventionally sterilisation of medical or surgical instruments is carried out using high temperatures or chemicals. Such chemicals can however leave a residue which can affect the subsequent use of the product.
Chemicals can also produce undesirable waste, and disposal problems. Heat treatment is generally effective, though some infective agents may not be removed. Many instruments are however produced from materials and components which are heat sensitive and cannot be sterilised by conventional autoclaving. Such products include items such as endoscopes and polymer based products including trial orthopaedic implants.
There are several ways to generate plasmas suitable for cleaning or processing samples.
DC Plasma When a moderately high voltage is applied between two electrodes in a gas at low pressure any fortuitous ionisation of an atom in the gas (e.g. from cosmic ray or UV bombardment) liberates an electron which is accelerated towards the positive electrode. If the electron attains sufficient energy to ionise another atom when it collides the process becomes a chain reaction and the whole gas becomes ionised. As each ion de-excites it emits light at optical wavelengths leading to the glow discharge. This mechanism was investigated by Crookes and Lord Kelvin in the late 19th century and exemplified in the Franck-Hertz experiment measuring the ionisation potential of mercury vapour and reported in 1914.
The principle is in operation in neon tubes, sodium street lamps and fluorescent light bulbs. However, for domestic applications the applied voltage is usually AC mains so the electrodes are continually switching polarity at 50Hz. This is a very low frequency compared to the ionisation process, so the glow discharge is effectively a reversing DC plasma excitation.
The energies attained by the electrons and ions depend on the mean free path length in the gas, which is pressure dependent. At high pressure both Jose energy by frequent collisions. Greater energy is attained but at lower overall intensity at low pressures. However, it is possible for ions to impact the electrode surfaces with sufficient energy (greater than -50eV) to sputter material from the surface.
Since DC plasma discharges are unstable on insulating substrates the applied voltage is often pulsed on/off or reversed so that the sample surfaces are repeatedly neutralised.
DC plasmas are commonly used to etch electrically conducting materials by a process of ion bombardment. Generally a heavy inert gas ion such as argon or krypton would be used, but these are expensive and impractical for high volume, high through put sterilisation of low value components such as general stainless steel surgical instruments.
RF Plasma As for the DC plasma, once a sufficiently intense electric field is set up in a gas at low pressure some ionisation event is rapidly magnified. AC mains works if the electrodes are inside the gas. However the impedance of a capacitor decreases at high frequencies and the use of capacitively coupled RF excitation means that the electrodes can be outside the tube containing the gas at low pressure. In this case the electrons oscillate in the field and their energies only reach -20eV, even though several hundred volts of RF are applied to the electrodes. At these energies gaseous species can be formed in excited but not ionised states. Where oxygen is the gas, the metastable forms of atomic oxygen and ozone can be formed which are chemically very active but physically not energetic. Hence, chemical reactions can be facilitated without sputtering damage. These species are responsible for the conversion of organic compounds to volatile CO2 in a "cool combustion" process used widely for plasma ashing.
RF can couple strongly to highly conducting metals such as copper, silver, gold or aluminium and these may become extremely hot due to eddy current heating effects. Hence, RF plasmas are not advised for cleaning these metals but are good for insulating samples which cannot be treated by DC plasmas.
If the pressure is low then the metastable species can survive to react downstream of the plasma generation region and this mode is also used to avoid sample heating within the plasma. This process is though generally very slow because a low pressure is needed to retain the active species but this inevitably leads to a low concentration of them.
RF plasmas have been considered as a potential way of sterilising articles such as surgical instruments and other medical devices intended for use in vivo. With such plasmas there is practically no significant sputtering, and thus the process is an inherently "cool method" and thus potentially usable with delicate temperatures sensitive instruments, for example those including polymers and natural fibres. However, the time needed to remove and/or deactivate bacterial spores with such plasmas can be many hours.
According to the present invention there is provided a method of cleaning an article, the method including carrying out simultaneous DC bias and RF plasma treatments on the article.
The article may be moved during the sterilisation, and may be rotated.
The article may be contained within a meshed support during cleaning. The meshed support may be connected to a DC bias power supply to provide the DC bias treatment.
The plasma gas may include oxygen and/or argon. The plasma gas may comprise substantially only air.
A negative DC bias above a predetermined level may be applied, and the negative bias is preferably sufficient to excite the simultaneous DC-RF plasma. The DC voltage may be applied continuously, or may be pulsed.
An embodiment of the present invention will now be described by way of example only and with reference to the accompanying figures, in which:Fig. 1 is a spectra detected by X-ray Photoelectron Spectroscopy showing analysis of the film deposited on an article being cleaned by the present invention, in a first condition; Fig. 2 is a spectra detected by X-ray Photoelectron Spectroscopy showing analysis of the film deposited on an article being cleaned by the present invention, in a second condition; Figs. 3 and 4 are scans indicating compounds which can be detected by Time of Flight Mass Spectrometry on an article cleaned by a method according to the present invention in a first condition; and Fig. 5 and 6 are scans indicating compounds which can be detected by Time of Flight Mass Spectrometry on an article cleaned by a method according to the present invention in a second condition. n
Stainless steel coupons were coated with Bovine Serum Albumin (BSA) protein films. A barrel reactor RF plasma rig was modified by the incorporation of a sample holder basket made of a mesh material, and connected to a DC bias power supply. In a first condition a plasma gas of oxygen and argon in a 5:1 ratio was used. Initially the sample was grounded and the plasma was set at 100W power, with the gas mixture at 0. 6mBar pressure.
A negative DC bias of approximately bOy was applied, and this deflected the plasma from the basket and almost extinguished it from the sample treatment locality. Once a greater negative DC voltage was applied, which was greater than 175V, the plasma becomes re-established. The plasma becomes increasingly intense as the DC bias voltage is increased negatively. The DC power added to the RF is a mere 2 to 4W.
The process was repeated using air only as the plasma gas. At 200V and 1 OmA, the removal rate of the BSA protein film, and also some felt tip pen marks on the stainless steel coupons was found to be greater by a factor of at least 10 than would be the position using RF plasma alone. For instance felt tip pen marks required more than 30 minutes to remove using RF plasma alone, but could be removed in under 3 minutes using combined DC and RF plasma in air.
Although substantial heat is generated during the combined DC and RF plasma process, this heat does not contribute directly to the removal of the organic material. It is believed that the main mechanism is the "cool burn" combustion process involving activated oxygen and other gaseous species, combined with the disruption arising from the simultaneous sputtering by ions at energies up to 200eV, but generally much lower energies.
Figs. 1 and 2 show an X-ray Photoelectron Spectroscopy (XPS) scan of a BSA film on stainless steel which has been removed by the above n described DC and RF plasma for 10 minutes. Fig. 1 used an oxygen and argon plasma, while Fig. 2 used an air plasma.
The spectra show that after 10 minutes no organo-nitrogen species can be detected by XPS. Carbon levels are reduced to that typical of airtransferred stainless steel samples. Some nitrate moieties are present on the sample treated using air plasma, and traces of fluorine on both spectra are a result of degradation of rotary pump oil, and this could be eliminated by use of a dry vacuum pump.
Figs. 3 and 4 show spectra by Time of Flight Mass Spectrometry, (T0FSIMS) after 10 minutes cleaning using the process described above with an oxygen/argon atmosphere. Figs. 5 and 6 are similar to Figs. 3 and 4 except that the spectra here show cleaning with an air only atmosphere.
These spectra show that only traces of nitrogenous compounds can be detected, and that there is no evidence for residues of amino-acid species which would be indicative of proteinaceous material. These analyses show that no significant foreign matter is deposited during the combined DC-RF plasma cleaning process.
There is thus described a plasma cleaning process suitable for cleaning for instance surgical instruments, which provides rapid efficient cleaning, and can operate well with air as the plasma gas. This means that the method could be commercially viable for high volume, high through put sterilisation of relatively low value components such as general stainless steel surgical instruments.
Various modifications may be made without departing from the scope of the invention. For example, different conditions could be applied in the plasma treatment. Whilst in the above example the DC voltage is applied continuously, in an alternative arrangement the DC bias may be pulsed to reduce the heating effect. n
Whilst endeavouring in the foregoing specification to draw attention to those features of the invention believed to be of particular importance it should be understood that the Applicant claims protection in respect of any patentable feature or combination of features hereinbefore referred to and/or shown in the drawings whether or not particular emphasis has been placed thereon.
Claims (14)
1. A method of cleaning an article, the method including carrying out simultaneous DC bias and RF plasma treatments on the article.
2. A method according to claim 1, wherein the article is moved during the sterilisation.
3. A method according to claim 2, wherein the article is rotated during the sterilisation.
4. A method according to any of the preceding claims, wherein the article is contained within a mesh support during cleaning.
5. A method according to claim 4, wherein the mesh support is connected to a DC bias power supply to provide the DC bias treatment.
6. A method according to any of the preceding claims, wherein the plasma gas comprises substantially only air.
7. A method according to any of claims 1 to 5, wherein the plasma gas includes argon.
8. A method according to any of the preceding claims, wherein the plasma gas includes oxygen.
9. A method according to any of the preceding claims, wherein a negative DC bias above a predetermined level is applied.
10. A method according to claim 9, wherein the negative bias is sufficient to excite the simultaneous DC-RF plasma. n
11. A method according to any of the preceding claims, wherein the DC voltage is applied continuously.
12. A method according to any of claims ito 10, wherein the DC voltage is pulsed.
13. A method of cleaning an article, the method being substantially as hereinbefore described and with reference to the accompanying drawings.
14. Any novel subject matter or combination including novel subject matter disclosed herein, whether or not within the scope of or relating to the same invention as any of the preceding claims.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0426346.3A GB0426346D0 (en) | 2004-12-01 | 2004-12-01 | Cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB0524234D0 GB0524234D0 (en) | 2006-01-04 |
| GB2420712A true GB2420712A (en) | 2006-06-07 |
Family
ID=34043855
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GBGB0426346.3A Ceased GB0426346D0 (en) | 2004-12-01 | 2004-12-01 | Cleaning method |
| GB0524234A Withdrawn GB2420712A (en) | 2004-12-01 | 2005-11-29 | Method of cleaning articles such as medical instruments |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GBGB0426346.3A Ceased GB0426346D0 (en) | 2004-12-01 | 2004-12-01 | Cleaning method |
Country Status (1)
| Country | Link |
|---|---|
| GB (2) | GB0426346D0 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8252388B2 (en) * | 2008-05-15 | 2012-08-28 | Southwest Research Institute | Method and apparatus for high rate, uniform plasma processing of three-dimensional objects |
| WO2013037008A1 (en) * | 2011-09-15 | 2013-03-21 | University Of South Australia | Cleaning and sterilising method for biomedical surfaces |
| US20180243803A1 (en) * | 2017-02-27 | 2018-08-30 | Nanovation Partners LLC | Shelf-life-improved nanostructured implant systems and methods |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4801427A (en) * | 1987-02-25 | 1989-01-31 | Adir Jacob | Process and apparatus for dry sterilization of medical devices and materials |
| US5310452A (en) * | 1989-04-27 | 1994-05-10 | Fujitsu Limited | Plasma process apparatus and plasma processing method |
| EP0798397A2 (en) * | 1996-03-27 | 1997-10-01 | Ethicon, Inc. | Process for cleaning surgical needles |
| US20020187066A1 (en) * | 2001-06-07 | 2002-12-12 | Skion Corporation | Apparatus and method using capillary discharge plasma shower for sterilizing and disinfecting articles |
| US20040050682A1 (en) * | 2000-12-27 | 2004-03-18 | George Paskalov | Activated water apparatus and methods and products |
-
2004
- 2004-12-01 GB GBGB0426346.3A patent/GB0426346D0/en not_active Ceased
-
2005
- 2005-11-29 GB GB0524234A patent/GB2420712A/en not_active Withdrawn
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4801427A (en) * | 1987-02-25 | 1989-01-31 | Adir Jacob | Process and apparatus for dry sterilization of medical devices and materials |
| US5310452A (en) * | 1989-04-27 | 1994-05-10 | Fujitsu Limited | Plasma process apparatus and plasma processing method |
| EP0798397A2 (en) * | 1996-03-27 | 1997-10-01 | Ethicon, Inc. | Process for cleaning surgical needles |
| US20040050682A1 (en) * | 2000-12-27 | 2004-03-18 | George Paskalov | Activated water apparatus and methods and products |
| US20020187066A1 (en) * | 2001-06-07 | 2002-12-12 | Skion Corporation | Apparatus and method using capillary discharge plasma shower for sterilizing and disinfecting articles |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8252388B2 (en) * | 2008-05-15 | 2012-08-28 | Southwest Research Institute | Method and apparatus for high rate, uniform plasma processing of three-dimensional objects |
| WO2013037008A1 (en) * | 2011-09-15 | 2013-03-21 | University Of South Australia | Cleaning and sterilising method for biomedical surfaces |
| US20180243803A1 (en) * | 2017-02-27 | 2018-08-30 | Nanovation Partners LLC | Shelf-life-improved nanostructured implant systems and methods |
| US10857575B2 (en) * | 2017-02-27 | 2020-12-08 | Nanovation Partners LLC | Shelf-life-improved nanostructured implant systems and methods |
Also Published As
| Publication number | Publication date |
|---|---|
| GB0426346D0 (en) | 2005-01-05 |
| GB0524234D0 (en) | 2006-01-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WAP | Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1) |