GB2406639B - Improvement in process control for etch processes - Google Patents
Improvement in process control for etch processesInfo
- Publication number
- GB2406639B GB2406639B GB0423267A GB0423267A GB2406639B GB 2406639 B GB2406639 B GB 2406639B GB 0423267 A GB0423267 A GB 0423267A GB 0423267 A GB0423267 A GB 0423267A GB 2406639 B GB2406639 B GB 2406639B
- Authority
- GB
- United Kingdom
- Prior art keywords
- improvement
- process control
- etch processes
- etch
- processes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012369 In process control Methods 0.000 title 1
- 238000010965 in-process control Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/55—Specular reflectivity
- G01N21/552—Attenuated total reflection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0209338A GB0209338D0 (en) | 2002-04-23 | 2002-04-23 | Use of test structures to optimise interferometric endpoint techniques beyond the diffraction limit |
GB0214709A GB0214709D0 (en) | 2002-06-26 | 2002-06-26 | Improvement in process control for etch processes |
PCT/US2003/012462 WO2003092049A1 (en) | 2002-04-23 | 2003-04-23 | Improvement in process control for etch processes |
Publications (4)
Publication Number | Publication Date |
---|---|
GB0423267D0 GB0423267D0 (en) | 2004-11-24 |
GB2406639A GB2406639A (en) | 2005-04-06 |
GB2406639B true GB2406639B (en) | 2006-04-05 |
GB2406639A8 GB2406639A8 (en) | 2006-07-03 |
Family
ID=29271996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB0423267A Expired - Fee Related GB2406639B (en) | 2002-04-23 | 2003-04-23 | Improvement in process control for etch processes |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2003228646A1 (en) |
GB (1) | GB2406639B (en) |
WO (1) | WO2003092049A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7078344B2 (en) * | 2003-03-14 | 2006-07-18 | Lam Research Corporation | Stress free etch processing in combination with a dynamic liquid meniscus |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4927785A (en) * | 1987-06-04 | 1990-05-22 | U.S. Philips Corporation | Method of manufacturing semiconductor devices |
US5658418A (en) * | 1995-03-31 | 1997-08-19 | International Business Machines Corporation | Apparatus for monitoring the dry etching of a dielectric film to a given thickness in an integrated circuit |
-
2003
- 2003-04-23 GB GB0423267A patent/GB2406639B/en not_active Expired - Fee Related
- 2003-04-23 AU AU2003228646A patent/AU2003228646A1/en not_active Abandoned
- 2003-04-23 WO PCT/US2003/012462 patent/WO2003092049A1/en not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4927785A (en) * | 1987-06-04 | 1990-05-22 | U.S. Philips Corporation | Method of manufacturing semiconductor devices |
US5658418A (en) * | 1995-03-31 | 1997-08-19 | International Business Machines Corporation | Apparatus for monitoring the dry etching of a dielectric film to a given thickness in an integrated circuit |
Also Published As
Publication number | Publication date |
---|---|
WO2003092049A1 (en) | 2003-11-06 |
GB2406639A8 (en) | 2006-07-03 |
GB2406639A (en) | 2005-04-06 |
AU2003228646A1 (en) | 2003-11-10 |
GB0423267D0 (en) | 2004-11-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
711B | Application made for correction of error (sect. 117/77) | ||
711G | Correction allowed (sect. 117/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 20070423 |