GB2401934A - Measurement technique and system based on sub-nano-scale reference patterns - Google Patents

Measurement technique and system based on sub-nano-scale reference patterns Download PDF

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Publication number
GB2401934A
GB2401934A GB0303697A GB0303697A GB2401934A GB 2401934 A GB2401934 A GB 2401934A GB 0303697 A GB0303697 A GB 0303697A GB 0303697 A GB0303697 A GB 0303697A GB 2401934 A GB2401934 A GB 2401934A
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United Kingdom
Prior art keywords
nano
sub
reference pattern
manipulation
spm
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0303697A
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GB0303697D0 (en
Inventor
Duc Truong Pham
Zuobin Wang
Shizhong Su
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University College Cardiff Consultants Ltd
Cardiff University
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University College Cardiff Consultants Ltd
Cardiff University
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Priority to GB0303697A priority Critical patent/GB2401934A/en
Publication of GB0303697D0 publication Critical patent/GB0303697D0/en
Publication of GB2401934A publication Critical patent/GB2401934A/en
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q40/00—Calibration, e.g. of probes
    • G01Q40/02—Calibration standards and methods of fabrication thereof

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

This invention relates to a measurement technique and system for accurate nanoimaging and manipulation within an SPM (scanning probe microscope) based on the use of a sub-nano-scale reference pattern manipulation. The reference pattern can be regular or irregular, and can be natural or man-made. The SPM includes the STM (scanning tunnelling microscope) and the AFM (atomic force microscope). The technique may also be applied to other types of nano-imaging instruments.

Description

1 2401 934
MEASUREMENT TECHNIQUE AND SYSTEM BASED ON SUB-NAND-SCALE
REFERENCE PATTERNS
Description
This invention relates to a measurement technique and system for accurate nano- imaging and manipulation within an SPM (scanning probe microscope) based on the use of a sub-nano-scale reference pattern manipulation. The reference pattern can be regular or irregular, and can be natural or manmade. The SPM includes the STM (scanning tunnelling microscope) and the AFM (atomic force microscope). The technique may also be applied to other types of nano-imaging instruments.
In many applications, an SPM functions both as an imaging device and as a manipulator. An SPM can move in x, y and z directions. The vertical displacement can be controlled accurately by a feedback loop involving tunnelling current or force.
However, nano-scale x, y motion is primarily open loop. Accurate horizontal motion relies on calibration of the piezoelectric actuators, which are known to suffer from a variety of problems such as creep and hysteresis. In addition, thermal drift of the instrument is very significant. At room temperature a drift of one atomic diameter per second is common. Thermal drift is negligible if the SPM is operated at very low temperatures, of the order of 4K. However, this involves complex technology, which is undesirable. Therefore, for room temperature operation, drift, creep and hysteresis must be taken into account.
An objective of this invention is to provide a sub-nano scale reference pattern with a particular atomic structure for nano-imaging and manipulation that allows accurate positioning of an SPM tip.
Accordingly, this invention provides techniques for position calculation in nano- imaging and nano-manipulation based on sub-nano scale reference patterns.
Preferably, the reference pattern has a regular atomic structure of natural or man- made material. However, it may instead have an irregular atomic structure. For irregular reference patterns, pattern recognition is needed to determine the position of an SPM tip or of an object.
A preferred embodiment of the invention will now be described with reference to the accompanying drawings. Figure 1 is a diagram of an SPM system with a sub-nano scale reference pattern. When the proposed system performs a nano-imaging or nano- manipulation task, the images of the reference pattern are used to calibrate the imaging or manipulation process in real time. In the system, atom counting method is used for regular reference patterns, and pattern recognition for irregular reference patterns. Interpolation method can be used to achieve sub-atom resolution in positioning an SPM tip or an object. e e
e. e e e e e e Ie e e e e e e e ce. e À cce e e e e a ee. see e e Figure 2 shows a sub-nano scale reference pattern with a regular atomic structure of natural material such as mica and HOPG. Since the distance between atoms is about 0.10.4 nm, the accuracy of the imaging and manipulation system will be determined by the atomic structure used as a reference pattern, in particular the distance between atoms.
Figure 3 shows a nano-particle on a sub-nano scale reference pattern with a regular atomic structure. The position of the nano-particle can be easily determined by counting the number of atoms along the two axes.
In a nano-imaging and manipulation process, a sub-nano scale reference pattern with a particular atomic structure is used to determine the position of an SPM tip or an object. The atomic structure plays the role of a two dimensional ruler in this application. This invention can also be used in multi-tip SPM systems in which at least one reference pattern is employed. For irregular patterns, pattern recognition can be used to achieve the information regarding the position of an SPM tip or an object.
In many applications, the resolution achieved using interpolation technique can be better than that of the reference pattern. The interpolation is based on the three dimensional data obtained from an SPM: two-dimensional data from the reference pattern and one-dimensional data (height/gray level information) from the tip deflection according to the height variation of the imaging surface. À

Claims (5)

  1. e. e À Ie c À Claims: 1. A measurement technique and system using a
    sub-nano scale reference pattern with a particular atomic structure so that the position of an SPM tip or an object can be accurately determined based on the reference pattern.
  2. 2. A reference pattern with a particular atomic structure, as claimed in Claim 1, can be regular or irregular, and it can be natural or man-made.
  3. 3. A measurement technique using sub-nano-scale reference patterns in the applications of SPMs, as claimed in Claim 1 or Claim 2, performs the role of a two-dimensional ruler, which is generally achieved using atom counting for regular reference patterns, and pattern recognition for irregular reference patterns.
  4. 4. A measurement system, as claimed in Claim 1, may include more than one SPM tip and more than one reference pattern in applications such as nanoimaging, nano-manipulation, nano-assembly and nano-manufacturing.
  5. 5. Interpolation can be used to achieve a sub-atom resolution or a resolution better than that of a reference pattern in applications of the system such as nano- imaging, nano-manipulation, nano-assembly and nano-manufacturing.
GB0303697A 2003-02-18 2003-02-18 Measurement technique and system based on sub-nano-scale reference patterns Withdrawn GB2401934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB0303697A GB2401934A (en) 2003-02-18 2003-02-18 Measurement technique and system based on sub-nano-scale reference patterns

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0303697A GB2401934A (en) 2003-02-18 2003-02-18 Measurement technique and system based on sub-nano-scale reference patterns

Publications (2)

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GB0303697D0 GB0303697D0 (en) 2003-03-19
GB2401934A true GB2401934A (en) 2004-11-24

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GB0303697A Withdrawn GB2401934A (en) 2003-02-18 2003-02-18 Measurement technique and system based on sub-nano-scale reference patterns

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7800761B2 (en) 2006-04-12 2010-09-21 Massachusetts Institute Of Technology Infrared interferometric-spatial-phase imaging using backside wafer marks
CN102889866A (en) * 2012-09-28 2013-01-23 西安交通大学 Length measuring and tracing method using graphene bond length as measuring reference

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0403766A2 (en) * 1989-04-27 1990-12-27 Canon Kabushiki Kaisha Scanning tunnelling microscope displacement detector
US5689494A (en) * 1991-01-11 1997-11-18 Hitachi, Ltd. Surface atom fabrication method and apparatus
WO2002056354A1 (en) * 2001-01-10 2002-07-18 Ki-Bum Kim Method for forming a pattern and a semiconductor device
WO2003083876A2 (en) * 2002-03-27 2003-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0403766A2 (en) * 1989-04-27 1990-12-27 Canon Kabushiki Kaisha Scanning tunnelling microscope displacement detector
US5689494A (en) * 1991-01-11 1997-11-18 Hitachi, Ltd. Surface atom fabrication method and apparatus
WO2002056354A1 (en) * 2001-01-10 2002-07-18 Ki-Bum Kim Method for forming a pattern and a semiconductor device
WO2003083876A2 (en) * 2002-03-27 2003-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7800761B2 (en) 2006-04-12 2010-09-21 Massachusetts Institute Of Technology Infrared interferometric-spatial-phase imaging using backside wafer marks
CN102889866A (en) * 2012-09-28 2013-01-23 西安交通大学 Length measuring and tracing method using graphene bond length as measuring reference
CN102889866B (en) * 2012-09-28 2015-10-28 西安交通大学 Length metering source tracing method using Graphene bond distance as mete-wand

Also Published As

Publication number Publication date
GB0303697D0 (en) 2003-03-19

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