GB2247892B - Scratch-free finish buffing - Google Patents

Scratch-free finish buffing

Info

Publication number
GB2247892B
GB2247892B GB9117132A GB9117132A GB2247892B GB 2247892 B GB2247892 B GB 2247892B GB 9117132 A GB9117132 A GB 9117132A GB 9117132 A GB9117132 A GB 9117132A GB 2247892 B GB2247892 B GB 2247892B
Authority
GB
United Kingdom
Prior art keywords
scratch
free finish
finish buffing
buffing
free
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB9117132A
Other versions
GB9117132D0 (en
GB2247892A (en
Inventor
Hiroshi Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
C Uyemura and Co Ltd
Original Assignee
C Uyemura and Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by C Uyemura and Co Ltd filed Critical C Uyemura and Co Ltd
Publication of GB9117132D0 publication Critical patent/GB9117132D0/en
Publication of GB2247892A publication Critical patent/GB2247892A/en
Application granted granted Critical
Publication of GB2247892B publication Critical patent/GB2247892B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
GB9117132A 1990-08-08 1991-08-08 Scratch-free finish buffing Expired - Fee Related GB2247892B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2209599A JP2689706B2 (en) 1990-08-08 1990-08-08 Polishing method

Publications (3)

Publication Number Publication Date
GB9117132D0 GB9117132D0 (en) 1991-09-25
GB2247892A GB2247892A (en) 1992-03-18
GB2247892B true GB2247892B (en) 1994-08-17

Family

ID=16575489

Family Applications (1)

Application Number Title Priority Date Filing Date
GB9117132A Expired - Fee Related GB2247892B (en) 1990-08-08 1991-08-08 Scratch-free finish buffing

Country Status (3)

Country Link
JP (1) JP2689706B2 (en)
KR (1) KR100219356B1 (en)
GB (1) GB2247892B (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2738291B2 (en) * 1994-02-14 1998-04-08 日本電気株式会社 Mechanical / chemical polishing method and polishing apparatus
DE4445333A1 (en) * 1994-12-19 1996-06-20 Moeller Feinmechanik Gmbh & Co Smoothing process
JP3230986B2 (en) * 1995-11-13 2001-11-19 株式会社東芝 Polishing method, semiconductor device manufacturing method, and semiconductor manufacturing apparatus.
JP3514908B2 (en) * 1995-11-13 2004-04-05 株式会社東芝 Abrasive
US5968239A (en) * 1996-11-12 1999-10-19 Kabushiki Kaisha Toshiba Polishing slurry
WO1998023697A1 (en) * 1996-11-26 1998-06-04 Cabot Corporation Composition and method for polishing rigid disks
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
US6068787A (en) * 1996-11-26 2000-05-30 Cabot Corporation Composition and slurry useful for metal CMP
CA2323328A1 (en) * 1996-11-27 1998-05-27 Bbf Yamate Corporation Barrel polishing apparatus
US6881674B2 (en) 1999-12-28 2005-04-19 Intel Corporation Abrasives for chemical mechanical polishing
US6383065B1 (en) 2001-01-22 2002-05-07 Cabot Microelectronics Corporation Catalytic reactive pad for metal CMP
KR100458756B1 (en) * 2001-06-27 2004-12-03 제일모직주식회사 CMP Slurry for Polishing Metal Wirings of Semiconductor Devices
KR100557600B1 (en) * 2001-06-29 2006-03-10 주식회사 하이닉스반도체 CMP Slurry for Nitride
KR100522623B1 (en) * 2002-09-30 2005-11-09 송순옥 Method for Reclaimating Tablewares and Tablewares Reclaimated Using Such a Method
US20080283502A1 (en) * 2006-05-26 2008-11-20 Kevin Moeggenborg Compositions, methods and systems for polishing aluminum oxide and aluminum oxynitride substrates
CN104903052A (en) * 2013-01-04 2015-09-09 福吉米株式会社 Method for polishing alloy material and method for manufacturing alloy material

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4383857A (en) * 1980-05-28 1983-05-17 The United States Of America As Represented By The United States Department Of Energy Attack polish for nickel-base alloys and stainless steels
US4915710A (en) * 1988-09-20 1990-04-10 Showa Denko Kabushiki Kaisha Abrasive composition and process for polishing
US4929257A (en) * 1988-04-08 1990-05-29 Showa Denko Kabushiki Kaisha Abrasive composition and process for polishing
JPH06225187A (en) * 1993-01-25 1994-08-12 Sony Corp Image pickup device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62236669A (en) * 1986-04-07 1987-10-16 Kobe Steel Ltd Abrasive

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4383857A (en) * 1980-05-28 1983-05-17 The United States Of America As Represented By The United States Department Of Energy Attack polish for nickel-base alloys and stainless steels
US4929257A (en) * 1988-04-08 1990-05-29 Showa Denko Kabushiki Kaisha Abrasive composition and process for polishing
US4915710A (en) * 1988-09-20 1990-04-10 Showa Denko Kabushiki Kaisha Abrasive composition and process for polishing
JPH06225187A (en) * 1993-01-25 1994-08-12 Sony Corp Image pickup device

Also Published As

Publication number Publication date
GB9117132D0 (en) 1991-09-25
JPH0493168A (en) 1992-03-25
JP2689706B2 (en) 1997-12-10
GB2247892A (en) 1992-03-18
KR920004087A (en) 1992-03-27
KR100219356B1 (en) 1999-09-01

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20030808