GB2230137B - Improvements in or relating to electronic devices - Google Patents
Improvements in or relating to electronic devicesInfo
- Publication number
- GB2230137B GB2230137B GB9006305A GB9006305A GB2230137B GB 2230137 B GB2230137 B GB 2230137B GB 9006305 A GB9006305 A GB 9006305A GB 9006305 A GB9006305 A GB 9006305A GB 2230137 B GB2230137 B GB 2230137B
- Authority
- GB
- United Kingdom
- Prior art keywords
- relating
- electronic devices
- electronic
- devices
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/26506—Bombardment with radiation with high-energy radiation producing ion implantation in group IV semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2658—Bombardment with radiation with high-energy radiation producing ion implantation of a molecular ion, e.g. decaborane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/3003—Hydrogenation or deuterisation, e.g. using atomic hydrogen from a plasma
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB898907323A GB8907323D0 (en) | 1989-03-31 | 1989-03-31 | Improvements in or relating to electronic devices |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9006305D0 GB9006305D0 (en) | 1990-05-16 |
GB2230137A GB2230137A (en) | 1990-10-10 |
GB2230137B true GB2230137B (en) | 1993-03-31 |
Family
ID=10654280
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB898907323A Pending GB8907323D0 (en) | 1989-03-31 | 1989-03-31 | Improvements in or relating to electronic devices |
GB9006305A Expired - Fee Related GB2230137B (en) | 1989-03-31 | 1990-03-21 | Improvements in or relating to electronic devices |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB898907323A Pending GB8907323D0 (en) | 1989-03-31 | 1989-03-31 | Improvements in or relating to electronic devices |
Country Status (1)
Country | Link |
---|---|
GB (2) | GB8907323D0 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5615207B2 (en) * | 2011-03-03 | 2014-10-29 | 株式会社東芝 | Manufacturing method of semiconductor device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4359367A (en) * | 1980-06-25 | 1982-11-16 | Governing Council Of The University Of Toronto | Silicon-based semiconductor devices |
-
1989
- 1989-03-31 GB GB898907323A patent/GB8907323D0/en active Pending
-
1990
- 1990-03-21 GB GB9006305A patent/GB2230137B/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4359367A (en) * | 1980-06-25 | 1982-11-16 | Governing Council Of The University Of Toronto | Silicon-based semiconductor devices |
Also Published As
Publication number | Publication date |
---|---|
GB2230137A (en) | 1990-10-10 |
GB9006305D0 (en) | 1990-05-16 |
GB8907323D0 (en) | 1989-05-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19990321 |