GB2203888B - Unit for dry-processing thin film - Google Patents

Unit for dry-processing thin film

Info

Publication number
GB2203888B
GB2203888B GB8801392A GB8801392A GB2203888B GB 2203888 B GB2203888 B GB 2203888B GB 8801392 A GB8801392 A GB 8801392A GB 8801392 A GB8801392 A GB 8801392A GB 2203888 B GB2203888 B GB 2203888B
Authority
GB
United Kingdom
Prior art keywords
dry
unit
thin film
processing thin
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
GB8801392A
Other versions
GB8801392D0 (en
GB2203888A (en
Inventor
Yasuaki Nagao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Publication of GB8801392D0 publication Critical patent/GB8801392D0/en
Publication of GB2203888A publication Critical patent/GB2203888A/en
Application granted granted Critical
Publication of GB2203888B publication Critical patent/GB2203888B/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
GB8801392A 1987-01-30 1988-01-22 Unit for dry-processing thin film Expired - Lifetime GB2203888B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006987 1987-01-30
JP12345487A JPH0620048B2 (en) 1987-01-30 1987-05-20 Dry thin film processing equipment

Publications (3)

Publication Number Publication Date
GB8801392D0 GB8801392D0 (en) 1988-02-24
GB2203888A GB2203888A (en) 1988-10-26
GB2203888B true GB2203888B (en) 1990-10-24

Family

ID=26356957

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8801392A Expired - Lifetime GB2203888B (en) 1987-01-30 1988-01-22 Unit for dry-processing thin film

Country Status (2)

Country Link
JP (1) JPH0620048B2 (en)
GB (1) GB2203888B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02207529A (en) * 1989-02-07 1990-08-17 Fuji Electric Co Ltd Dry thin film processing equipment
JP2546405B2 (en) * 1990-03-12 1996-10-23 富士電機株式会社 Plasma processing apparatus and operating method thereof
KR930004713B1 (en) * 1990-06-18 1993-06-03 삼성전자 주식회사 Plasma exciting apparatus using modulation step and its method
FR2664294B1 (en) * 1990-07-06 1992-10-23 Plasmametal METHOD FOR METALLIZING A SURFACE.
CN104942487B (en) * 2015-07-02 2017-09-15 哈尔滨工业大学（威海） The welder and method of a kind of titanium alloy of local dry cavity under water

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2076587A (en) * 1980-05-02 1981-12-02 Telephone Public Corp Plasma deposition apparatus
EP0171949A2 (en) * 1984-07-23 1986-02-19 Fujitsu Limited Microwave plasma etching apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2076587A (en) * 1980-05-02 1981-12-02 Telephone Public Corp Plasma deposition apparatus
EP0171949A2 (en) * 1984-07-23 1986-02-19 Fujitsu Limited Microwave plasma etching apparatus

Also Published As

Publication number Publication date
GB8801392D0 (en) 1988-02-24
JPH0620048B2 (en) 1994-03-16
GB2203888A (en) 1988-10-26
JPS63301517A (en) 1988-12-08

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 20000122