GB2198735B - Photopolymerisable material - Google Patents

Photopolymerisable material

Info

Publication number
GB2198735B
GB2198735B GB8630356A GB8630356A GB2198735B GB 2198735 B GB2198735 B GB 2198735B GB 8630356 A GB8630356 A GB 8630356A GB 8630356 A GB8630356 A GB 8630356A GB 2198735 B GB2198735 B GB 2198735B
Authority
GB
United Kingdom
Prior art keywords
photopolymerisable material
photopolymerisable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB8630356A
Other versions
GB2198735A (en
GB8630356D0 (en
Inventor
Norbert Kraus
Dr Uwe Muller
Prof Dr Manfred Ratzsch
Klaus-Peter Kronfeld
Prof Dr Hans-Joachim Timpe
Birgit Papendieck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Filmfabrik Wolfen VEB
Original Assignee
Filmfabrik Wolfen VEB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to DE19863641053 priority Critical patent/DE3641053A1/en
Priority to CH482686A priority patent/CH671294A5/de
Application filed by Filmfabrik Wolfen VEB filed Critical Filmfabrik Wolfen VEB
Priority to GB8630356A priority patent/GB2198735B/en
Priority to FR8618175A priority patent/FR2609185A1/en
Publication of GB8630356D0 publication Critical patent/GB8630356D0/en
Publication of GB2198735A publication Critical patent/GB2198735A/en
Application granted granted Critical
Publication of GB2198735B publication Critical patent/GB2198735B/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
GB8630356A 1986-12-19 1986-12-19 Photopolymerisable material Expired - Fee Related GB2198735B (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE19863641053 DE3641053A1 (en) 1986-12-19 1986-12-01 PHOTOPOLYMERIZABLE MATERIAL
CH482686A CH671294A5 (en) 1986-12-19 1986-12-03
GB8630356A GB2198735B (en) 1986-12-19 1986-12-19 Photopolymerisable material
FR8618175A FR2609185A1 (en) 1986-12-19 1986-12-24 HIGHLY PHOTOSENSITIVE PHOTOPOLYMERIZABLE MATERIAL

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8630356A GB2198735B (en) 1986-12-19 1986-12-19 Photopolymerisable material

Publications (3)

Publication Number Publication Date
GB8630356D0 GB8630356D0 (en) 1987-01-28
GB2198735A GB2198735A (en) 1988-06-22
GB2198735B true GB2198735B (en) 1990-04-04

Family

ID=10609271

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8630356A Expired - Fee Related GB2198735B (en) 1986-12-19 1986-12-19 Photopolymerisable material

Country Status (4)

Country Link
CH (1) CH671294A5 (en)
DE (1) DE3641053A1 (en)
FR (1) FR2609185A1 (en)
GB (1) GB2198735B (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1415883A (en) * 1971-11-18 1975-12-03 Sun Chemical Corp Radiation curable compounds obtainable by reaction of a resin or polybenzophenone carboxylic acid or ester forming derivative thereof and compositions containing the same
EP0010897B1 (en) * 1978-10-27 1984-01-25 Imperial Chemical Industries Plc Polymerisable compositions, derived coatings and other polymerised products
EP0011918B1 (en) * 1978-10-27 1984-03-07 Imperial Chemical Industries Plc Polymerisable compositions, derived coatings and other polymerised products
DD208245A1 (en) * 1981-11-04 1984-03-28 Wolfen Filmfab Veb PHOTOPOLYMERIZABLE COMPOSITION
US4507497A (en) * 1983-03-03 1985-03-26 Minnesota Mining And Manufacturing Company Water soluble michlers ketone analogs

Also Published As

Publication number Publication date
CH671294A5 (en) 1989-08-15
DE3641053A1 (en) 1988-06-16
FR2609185A1 (en) 1988-07-01
GB2198735A (en) 1988-06-22
GB8630356D0 (en) 1987-01-28

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee