GB2179472B - Method of making photolithographic masks - Google Patents

Method of making photolithographic masks

Info

Publication number
GB2179472B
GB2179472B GB8619442A GB8619442A GB2179472B GB 2179472 B GB2179472 B GB 2179472B GB 8619442 A GB8619442 A GB 8619442A GB 8619442 A GB8619442 A GB 8619442A GB 2179472 B GB2179472 B GB 2179472B
Authority
GB
United Kingdom
Prior art keywords
mask
pixel
computer
pixels
providing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB8619442A
Other versions
GB8619442D0 (en
GB2179472A (en
Inventor
Michael Richard Houlton
David Robert Wight
Philip Charles Allen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UK Secretary of State for Defence
Original Assignee
UK Secretary of State for Defence
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UK Secretary of State for Defence filed Critical UK Secretary of State for Defence
Publication of GB8619442D0 publication Critical patent/GB8619442D0/en
Publication of GB2179472A publication Critical patent/GB2179472A/en
Application granted granted Critical
Publication of GB2179472B publication Critical patent/GB2179472B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/02—Sensitometric processes, e.g. determining sensitivity, colour sensitivity, gradation, graininess, density; Making sensitometric wedges

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A photolithographic mask is made by a computer generated two-dimensional array of light and dark pixels being photoreduced to provide the mask in which the pixels remain resolved. In use the mask is imaged on to a workpiece such that individual pixels are not resolved, thus providing a varying grey scale which closely approximates to a true grey scale. Problems with non-linear response of photographic materials to illumination intensity are avoided. The pixel array is divided up into resolution cells or pixel sub-arrays each providing a respective optical transmission coefficient. The computer assigns each cell a respective pixel pattern appropriate to the respective transmission coefficient. Pixel patterns may be prearranged and stored or computed using a random number generator. Transmission coefficients may be input to the computer as data, or alternatively computed from a mathematical function where the required mask transmission profile corresponds to such a function.
GB8619442A 1985-08-08 1986-08-08 Method of making photolithographic masks Expired GB2179472B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB858519910A GB8519910D0 (en) 1985-08-08 1985-08-08 Photolithographic masks

Publications (3)

Publication Number Publication Date
GB8619442D0 GB8619442D0 (en) 1986-09-17
GB2179472A GB2179472A (en) 1987-03-04
GB2179472B true GB2179472B (en) 1989-07-26

Family

ID=10583485

Family Applications (2)

Application Number Title Priority Date Filing Date
GB858519910A Pending GB8519910D0 (en) 1985-08-08 1985-08-08 Photolithographic masks
GB8619442A Expired GB2179472B (en) 1985-08-08 1986-08-08 Method of making photolithographic masks

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB858519910A Pending GB8519910D0 (en) 1985-08-08 1985-08-08 Photolithographic masks

Country Status (1)

Country Link
GB (2) GB8519910D0 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4902899A (en) * 1987-06-01 1990-02-20 International Business Machines Corporation Lithographic process having improved image quality
FR2642861B1 (en) * 1989-02-06 1991-05-24 Laine Philippe PROCESS AND DEVICE FOR THE MANUFACTURE OF SUPPORTS HAVING A DEGRADED APPEARANCE
US5192641A (en) * 1990-12-19 1993-03-09 Hoechst Celanese Corporation Method of thermal wax transfer as a mask for digital color proofing
US5310623A (en) * 1992-11-27 1994-05-10 Lockheed Missiles & Space Company, Inc. Method for fabricating microlenses
KR950008384B1 (en) * 1992-12-10 1995-07-28 삼성전자주식회사 Method of forming pattern
US5781257A (en) * 1995-01-30 1998-07-14 Lockheed Martin Missiles & Space Co Flat panel display
US5600486A (en) * 1995-01-30 1997-02-04 Lockheed Missiles And Space Company, Inc. Color separation microlens
US6107000A (en) * 1996-12-17 2000-08-22 Board Of Regents - University Of California - San Diego Method for producing micro-optic elements with gray scale mask
US5998066A (en) * 1997-05-16 1999-12-07 Aerial Imaging Corporation Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4308326A (en) * 1979-03-28 1981-12-29 Wirth John L Halftone contact screen and photographic method of making the screen

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4308326A (en) * 1979-03-28 1981-12-29 Wirth John L Halftone contact screen and photographic method of making the screen

Also Published As

Publication number Publication date
GB8619442D0 (en) 1986-09-17
GB8519910D0 (en) 1985-09-18
GB2179472A (en) 1987-03-04

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee