GB2108756B - Forming a pattern of a thin film lustre - Google Patents
Forming a pattern of a thin film lustreInfo
- Publication number
- GB2108756B GB2108756B GB08226102A GB8226102A GB2108756B GB 2108756 B GB2108756 B GB 2108756B GB 08226102 A GB08226102 A GB 08226102A GB 8226102 A GB8226102 A GB 8226102A GB 2108756 B GB2108756 B GB 2108756B
- Authority
- GB
- United Kingdom
- Prior art keywords
- lustre
- pattern
- forming
- thin film
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14380881A JPS5846635A (en) | 1981-09-14 | 1981-09-14 | Formation of semiconductor element pattern |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2108756A GB2108756A (en) | 1983-05-18 |
GB2108756B true GB2108756B (en) | 1985-04-24 |
Family
ID=15347448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08226102A Expired GB2108756B (en) | 1981-09-14 | 1982-09-14 | Forming a pattern of a thin film lustre |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5846635A (en) |
DE (1) | DE3234066A1 (en) |
GB (1) | GB2108756B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS596540A (en) * | 1982-07-05 | 1984-01-13 | Toshiba Corp | Manufacture of semiconductor device |
JPH0736402B2 (en) * | 1985-05-20 | 1995-04-19 | ヤマハ株式会社 | Metal pattern forming method |
JPH01241125A (en) * | 1988-03-23 | 1989-09-26 | Sony Corp | Manufacture of semiconductor device |
EP0379604B1 (en) * | 1989-01-23 | 1995-05-31 | Siemens Aktiengesellschaft | Process for fabrication of a silicon nitride layer as an anti-reflection layer in photolithography processes during the manufacture of high density semiconductor circuits |
DE3901864A1 (en) * | 1989-01-23 | 1990-07-26 | Siemens Ag | Process for reducing variations in structure size caused by interference during the structuring of a photoresist film by monochromatic exposure |
JP2791525B2 (en) * | 1992-04-16 | 1998-08-27 | 三菱電機株式会社 | Method of selecting antireflection film and antireflection film selected by the method |
US5378659A (en) * | 1993-07-06 | 1995-01-03 | Motorola Inc. | Method and structure for forming an integrated circuit pattern on a semiconductor substrate |
SG89410A1 (en) * | 2000-07-31 | 2002-06-18 | Hitachi Ulsi Sys Co Ltd | Manufacturing method of semiconductor integrated circuit device |
DE10138909A1 (en) * | 2001-08-08 | 2003-02-27 | Infineon Technologies Ag | Silicon-containing layer manufacture using photomask, forms silicon-containing layer on substrate by chemical vapour deposition and uses excess silicon to reduce light used for exposing photomask |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3884698A (en) * | 1972-08-23 | 1975-05-20 | Hewlett Packard Co | Method for achieving uniform exposure in a photosensitive material on a semiconductor wafer |
JPS5593225A (en) * | 1979-01-10 | 1980-07-15 | Hitachi Ltd | Forming method of minute pattern |
JPS5680130A (en) * | 1979-12-05 | 1981-07-01 | Toshiba Corp | Manufacture of semiconductor device |
-
1981
- 1981-09-14 JP JP14380881A patent/JPS5846635A/en active Pending
-
1982
- 1982-09-14 GB GB08226102A patent/GB2108756B/en not_active Expired
- 1982-09-14 DE DE19823234066 patent/DE3234066A1/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
DE3234066A1 (en) | 1983-03-31 |
JPS5846635A (en) | 1983-03-18 |
GB2108756A (en) | 1983-05-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19980914 |