GB2104232B - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
GB2104232B
GB2104232B GB08123076A GB8123076A GB2104232B GB 2104232 B GB2104232 B GB 2104232B GB 08123076 A GB08123076 A GB 08123076A GB 8123076 A GB8123076 A GB 8123076A GB 2104232 B GB2104232 B GB 2104232B
Authority
GB
United Kingdom
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08123076A
Other languages
English (en)
Other versions
GB2104232A (en
Inventor
Kuniomi Etoh
Shinichi Tanaka
Masaru Nampei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to GB08123076A priority Critical patent/GB2104232B/en
Priority to DE19813129529 priority patent/DE3129529A1/de
Publication of GB2104232A publication Critical patent/GB2104232A/en
Application granted granted Critical
Publication of GB2104232B publication Critical patent/GB2104232B/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB08123076A 1981-07-27 1981-07-27 Photosensitive resin composition Expired GB2104232B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB08123076A GB2104232B (en) 1981-07-27 1981-07-27 Photosensitive resin composition
DE19813129529 DE3129529A1 (de) 1981-07-27 1981-07-27 Lichtempfindliche harzmasse

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB08123076A GB2104232B (en) 1981-07-27 1981-07-27 Photosensitive resin composition
DE19813129529 DE3129529A1 (de) 1981-07-27 1981-07-27 Lichtempfindliche harzmasse

Publications (2)

Publication Number Publication Date
GB2104232A GB2104232A (en) 1983-03-02
GB2104232B true GB2104232B (en) 1985-02-27

Family

ID=25794852

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08123076A Expired GB2104232B (en) 1981-07-27 1981-07-27 Photosensitive resin composition

Country Status (2)

Country Link
DE (1) DE3129529A1 (enrdf_load_stackoverflow)
GB (1) GB2104232B (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07117749B2 (ja) * 1987-07-28 1995-12-18 富士写真フイルム株式会社 非光重合性の画像形成層

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5236042B2 (enrdf_load_stackoverflow) * 1973-11-19 1977-09-13

Also Published As

Publication number Publication date
GB2104232A (en) 1983-03-02
DE3129529C2 (enrdf_load_stackoverflow) 1991-03-14
DE3129529A1 (de) 1983-04-07

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee