GB2049281B - - Google Patents

Info

Publication number
GB2049281B
GB2049281B GB8025968A GB8025968A GB2049281B GB 2049281 B GB2049281 B GB 2049281B GB 8025968 A GB8025968 A GB 8025968A GB 8025968 A GB8025968 A GB 8025968A GB 2049281 B GB2049281 B GB 2049281B
Authority
GB
United Kingdom
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
GB8025968A
Other languages
English (en)
Other versions
GB2049281A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication of GB2049281B publication Critical patent/GB2049281B/en
Application filed filed Critical
Publication of GB2049281A publication Critical patent/GB2049281A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/60Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
    • H10D84/67Complementary BJTs
    • H10D84/673Vertical complementary BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01Manufacture or treatment
    • H10W10/011Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/019Manufacture or treatment of isolation regions comprising dielectric materials using epitaxial passivated integrated circuit [EPIC] processes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10Isolation regions comprising dielectric materials
GB8025968A 1978-12-20 1979-12-06 Dielectrically-isolated integrated circuit complementary transistors for high voltage use Withdrawn GB2049281A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/971,632 US4232328A (en) 1978-12-20 1978-12-20 Dielectrically-isolated integrated circuit complementary transistors for high voltage use

Publications (2)

Publication Number Publication Date
GB2049281B true GB2049281B (https=)
GB2049281A GB2049281A (en) 1980-12-17

Family

ID=25518630

Family Applications (1)

Application Number Title Priority Date Filing Date
GB8025968A Withdrawn GB2049281A (en) 1978-12-20 1979-12-06 Dielectrically-isolated integrated circuit complementary transistors for high voltage use

Country Status (12)

Country Link
US (1) US4232328A (https=)
JP (1) JPH0413863B2 (https=)
BE (1) BE880726A (https=)
CA (1) CA1126875A (https=)
DE (1) DE2953394T1 (https=)
ES (1) ES487064A1 (https=)
FR (1) FR2445027A1 (https=)
GB (1) GB2049281A (https=)
IT (1) IT1126601B (https=)
NL (1) NL7920182A (https=)
SE (1) SE424028B (https=)
WO (1) WO1980001335A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1177148A (en) * 1981-10-06 1984-10-30 Robert J. Mcintyre Avalanche photodiode array
US4631570A (en) * 1984-07-03 1986-12-23 Motorola, Inc. Integrated circuit having buried oxide isolation and low resistivity substrate for power supply interconnection
US5448100A (en) * 1985-02-19 1995-09-05 Harris Corporation Breakdown diode structure
JPH01123417A (ja) * 1987-11-07 1989-05-16 Mitsubishi Electric Corp 半導体装置の製造方法
US5416354A (en) * 1989-01-06 1995-05-16 Unitrode Corporation Inverted epitaxial process semiconductor devices
JPH04506588A (ja) * 1990-01-08 1992-11-12 ハリス コーポレーシヨン 薄い、絶縁分離したアイランドに納められた、低いコレクタ抵抗を持つ、トランジスタ構造
US6375741B2 (en) 1991-03-06 2002-04-23 Timothy J. Reardon Semiconductor processing spray coating apparatus
JP2654268B2 (ja) * 1991-05-13 1997-09-17 株式会社東芝 半導体装置の使用方法
US5744851A (en) * 1992-01-27 1998-04-28 Harris Corporation Biasing of island-surrounding material to suppress reduction of breakdown voltage due to field plate acting on buried layer/island junction between high and low impurity concentration regions
GB2344689A (en) * 1998-12-07 2000-06-14 Ericsson Telefon Ab L M Analogue switch
US20020115198A1 (en) * 2000-09-20 2002-08-22 Nerenberg Michael I. Microfabricated ultrasound array for use as resonant sensors

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE524899A (https=) * 1952-12-16
US3850707A (en) * 1964-09-09 1974-11-26 Honeywell Inc Semiconductors
US3412295A (en) * 1965-10-19 1968-11-19 Sprague Electric Co Monolithic structure with three-region complementary transistors
DE1816081A1 (de) * 1968-12-20 1970-06-25 Siemens Ag Integrierte Halbleiterschaltungsanordnung
GB1258382A (https=) * 1969-01-16 1971-12-30
US3628064A (en) * 1969-03-13 1971-12-14 Signetics Corp Voltage to frequency converter with constant current sources
US3953255A (en) * 1971-12-06 1976-04-27 Harris Corporation Fabrication of matched complementary transistors in integrated circuits
US3865649A (en) * 1972-10-16 1975-02-11 Harris Intertype Corp Fabrication of MOS devices and complementary bipolar transistor devices in a monolithic substrate
US3944447A (en) * 1973-03-12 1976-03-16 Ibm Corporation Method for fabrication of integrated circuit structure with full dielectric isolation utilizing selective oxidation
US3895392A (en) * 1973-04-05 1975-07-15 Signetics Corp Bipolar transistor structure having ion implanted region and method
US4042949A (en) * 1974-05-08 1977-08-16 Motorola, Inc. Semiconductor devices
NL7408110A (nl) * 1974-06-18 1975-12-22 Philips Nv Halfgeleiderinrichting met complementaire tran- sistorstrukturen en werkwijze ter vervaardiging daarvan.
US4146905A (en) * 1974-06-18 1979-03-27 U.S. Philips Corporation Semiconductor device having complementary transistor structures and method of manufacturing same
US4086610A (en) * 1974-06-28 1978-04-25 Motorola, Inc. High reliability epi-base radiation hardened power transistor
US3990102A (en) * 1974-06-28 1976-11-02 Hitachi, Ltd. Semiconductor integrated circuits and method of manufacturing the same

Also Published As

Publication number Publication date
GB2049281A (en) 1980-12-17
US4232328A (en) 1980-11-04
SE424028B (sv) 1982-06-21
JPH0413863B2 (https=) 1992-03-11
SE8005704L (sv) 1980-08-13
IT1126601B (it) 1986-05-21
BE880726A (fr) 1980-04-16
JPS55501040A (https=) 1980-11-27
DE2953394C2 (https=) 1993-01-07
ES487064A1 (es) 1980-09-16
FR2445027B1 (https=) 1984-03-09
NL7920182A (nl) 1980-10-31
DE2953394T1 (de) 1981-01-08
IT7928204A0 (it) 1979-12-19
CA1126875A (en) 1982-06-29
WO1980001335A1 (en) 1980-06-26
FR2445027A1 (fr) 1980-07-18

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19941206