GB2046461B - Method for producing photosensitive printing plate precursor - Google Patents
Method for producing photosensitive printing plate precursorInfo
- Publication number
- GB2046461B GB2046461B GB8008918A GB8008918A GB2046461B GB 2046461 B GB2046461 B GB 2046461B GB 8008918 A GB8008918 A GB 8008918A GB 8008918 A GB8008918 A GB 8008918A GB 2046461 B GB2046461 B GB 2046461B
- Authority
- GB
- United Kingdom
- Prior art keywords
- printing plate
- plate precursor
- photosensitive printing
- producing photosensitive
- producing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3060679A JPS55124147A (en) | 1979-03-16 | 1979-03-16 | Manufacture of photosensitive printing plate |
JP7616279A JPS561056A (en) | 1979-06-15 | 1979-06-15 | Preparation of photosensitive printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2046461A GB2046461A (en) | 1980-11-12 |
GB2046461B true GB2046461B (en) | 1983-04-20 |
Family
ID=26368994
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8008918A Expired GB2046461B (en) | 1979-03-16 | 1980-03-17 | Method for producing photosensitive printing plate precursor |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE3009928A1 (en) |
GB (1) | GB2046461B (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2926235A1 (en) * | 1979-06-29 | 1981-01-08 | Hoechst Ag | PHOTOPOLYMERIZABLE COPY MATERIAL AND METHOD FOR PRODUCING RELIEF IMAGES |
JPS56156831A (en) * | 1980-05-09 | 1981-12-03 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
US4550073A (en) * | 1982-04-22 | 1985-10-29 | E. I. Du Pont De Nemours And Company | Overcoated photohardenable element having surface protuberances |
DE3377539D1 (en) * | 1982-04-22 | 1988-09-01 | Du Pont | Overcoated photohardenable element having surface protuberances |
US4668604A (en) * | 1982-04-22 | 1987-05-26 | E.I. Du Pont De Nemours And Company | Positive-working photosensitive elements containing crosslinked beads and process of use |
DE3374450D1 (en) * | 1982-04-22 | 1987-12-17 | Du Pont | Photosensitive coatings containing crosslinked beads |
US4551415A (en) * | 1982-04-22 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
US4599299A (en) * | 1982-04-22 | 1986-07-08 | E. I. Du Pont De Nemours And Company | Process for preparing overcoated photohardenable element having surface protuberances |
DE4126836A1 (en) * | 1991-08-14 | 1993-02-18 | Hoechst Ag | RADIATION-SENSITIVE RECORDING MATERIAL FROM LAYER SUPPORT AND POSITIVELY WORKING, RADIATION-SENSITIVE LAYER WITH ROUGH SURFACE |
DE4335425A1 (en) * | 1993-10-18 | 1995-04-20 | Hoechst Ag | Matted, radiation-sensitive recording material |
DE4439184A1 (en) | 1994-11-03 | 1996-05-09 | Hoechst Ag | Photosensitive recording material |
US9698014B2 (en) * | 2014-07-30 | 2017-07-04 | Taiwan Semiconductor Manufacturing Co., Ltd | Photoresist composition to reduce photoresist pattern collapse |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2701245A (en) * | 1951-05-01 | 1955-02-01 | Eastman Kodak Co | Bead polymerization of methyl methacrylate |
JPS50125805A (en) * | 1974-03-19 | 1975-10-03 |
-
1980
- 1980-03-14 DE DE19803009928 patent/DE3009928A1/en active Granted
- 1980-03-17 GB GB8008918A patent/GB2046461B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2046461A (en) | 1980-11-12 |
DE3009928C2 (en) | 1987-03-12 |
DE3009928A1 (en) | 1980-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PE20 | Patent expired after termination of 20 years |
Effective date: 20000316 |
|
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) |