GB2033660B - Manufacturing transistors having different characteristics - Google Patents

Manufacturing transistors having different characteristics

Info

Publication number
GB2033660B
GB2033660B GB7935995A GB7935995A GB2033660B GB 2033660 B GB2033660 B GB 2033660B GB 7935995 A GB7935995 A GB 7935995A GB 7935995 A GB7935995 A GB 7935995A GB 2033660 B GB2033660 B GB 2033660B
Authority
GB
United Kingdom
Prior art keywords
different characteristics
manufacturing transistors
transistors
manufacturing
different
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB7935995A
Other versions
GB2033660A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Publication of GB2033660A publication Critical patent/GB2033660A/en
Application granted granted Critical
Publication of GB2033660B publication Critical patent/GB2033660B/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
    • H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
    • H01L27/0825—Combination of vertical direct transistors of the same conductivity type having different characteristics,(e.g. Darlington transistors)
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/914—Doping
    • Y10S438/92—Controlling diffusion profile by oxidation

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
GB7935995A 1978-10-19 1979-10-17 Manufacturing transistors having different characteristics Expired GB2033660B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12783478A JPS5555559A (en) 1978-10-19 1978-10-19 Method of fabricating semiconductor device

Publications (2)

Publication Number Publication Date
GB2033660A GB2033660A (en) 1980-05-21
GB2033660B true GB2033660B (en) 1983-01-19

Family

ID=14969805

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7935995A Expired GB2033660B (en) 1978-10-19 1979-10-17 Manufacturing transistors having different characteristics

Country Status (4)

Country Link
US (1) US4261765A (en)
JP (1) JPS5555559A (en)
DE (1) DE2942236C2 (en)
GB (1) GB2033660B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5933860A (en) * 1982-08-19 1984-02-23 Toshiba Corp Semiconductor device and manufacture thereof
US4499653A (en) * 1983-11-03 1985-02-19 Westinghouse Electric Corp. Small dimension field effect transistor using phosphorous doped silicon glass reflow process
JPS60117765A (en) * 1983-11-30 1985-06-25 Fujitsu Ltd Manufacture of semiconductor device
US4939104A (en) * 1984-10-31 1990-07-03 Texas Instruments, Incorporated Method for forming a buried lateral contact
EP0768714B1 (en) * 1995-10-09 2003-09-17 Consorzio per la Ricerca sulla Microelettronica nel Mezzogiorno - CoRiMMe Construction method for power devices with deep edge ring
EP0772241B1 (en) 1995-10-30 2004-06-09 STMicroelectronics S.r.l. High density MOS technology power device
DE69534919T2 (en) 1995-10-30 2007-01-25 Stmicroelectronics S.R.L., Agrate Brianza Power device in MOS technology with a single critical size
EP0961325B1 (en) 1998-05-26 2008-05-07 STMicroelectronics S.r.l. High integration density MOS technology power device
US6437421B1 (en) * 1999-12-03 2002-08-20 Legerity, Inc. Self-aligned dual-base semiconductor process and structure incorporating multiple bipolar device types
US6372595B1 (en) 1999-12-03 2002-04-16 Legerity, Inc. Lateral bipolar junction transistor with reduced parasitic current loss
FR3100434B1 (en) * 2019-09-11 2023-10-27 Oreal Applicator for making up human keratin fibers, particularly eyebrows

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3566218A (en) * 1968-10-02 1971-02-23 Nat Semiconductor Corp The Multiple base width integrated circuit
JPS502477A (en) * 1973-05-07 1975-01-11
US3992232A (en) * 1973-08-06 1976-11-16 Hitachi, Ltd. Method of manufacturing semiconductor device having oxide isolation structure and guard ring
JPS5214594B2 (en) * 1973-10-17 1977-04-22
US3883889A (en) * 1974-04-15 1975-05-13 Micro Power Systems Inc Silicon-oxygen-nitrogen layers for semiconductor devices
US4030952A (en) * 1974-04-18 1977-06-21 Fairchild Camera And Instrument Corporation Method of MOS circuit fabrication
DE2453134C3 (en) * 1974-11-08 1983-02-10 Deutsche Itt Industries Gmbh, 7800 Freiburg Planar diffusion process
JPS5216186A (en) * 1975-07-30 1977-02-07 Hitachi Ltd Producing method of semiconductor device
JPS5922380B2 (en) * 1975-12-03 1984-05-26 株式会社東芝 Handout Taisoshino Seizouhouhou
JPS5269587A (en) * 1975-12-08 1977-06-09 Hitachi Ltd Device and manufacture for high voltage resisting semiconductor
NL7604986A (en) * 1976-05-11 1977-11-15 Philips Nv PROCEDURE FOR MANUFACTURING A SEMICONDUCTOR DEVICE, AND DEVICE MANUFACTURED BY APPLICATION OF THE PROCEDURE.
US4110125A (en) * 1977-03-03 1978-08-29 International Business Machines Corporation Method for fabricating semiconductor devices

Also Published As

Publication number Publication date
DE2942236A1 (en) 1980-04-24
US4261765A (en) 1981-04-14
DE2942236C2 (en) 1984-10-18
GB2033660A (en) 1980-05-21
JPS6157712B2 (en) 1986-12-08
JPS5555559A (en) 1980-04-23

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Legal Events

Date Code Title Description
746 Register noted 'licences of right' (sect. 46/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19951017