GB202213602D0 - Method of coating a component for use in a CVD-reactor and component produced by the method - Google Patents
Method of coating a component for use in a CVD-reactor and component produced by the methodInfo
- Publication number
- GB202213602D0 GB202213602D0 GBGB2213602.2A GB202213602A GB202213602D0 GB 202213602 D0 GB202213602 D0 GB 202213602D0 GB 202213602 A GB202213602 A GB 202213602A GB 202213602 D0 GB202213602 D0 GB 202213602D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- component
- cvd
- reactor
- coating
- produced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/029—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102021123986.9A DE102021123986A1 (en) | 2021-09-16 | 2021-09-16 | Process for coating a component in a CVD reactor and component produced by the process |
Publications (2)
Publication Number | Publication Date |
---|---|
GB202213602D0 true GB202213602D0 (en) | 2022-11-02 |
GB2612892A GB2612892A (en) | 2023-05-17 |
Family
ID=84817804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2213602.2A Pending GB2612892A (en) | 2021-09-16 | 2022-09-16 | Method of coating a component for use in a CVD-reactor and component produced by the method |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102021123986A1 (en) |
GB (1) | GB2612892A (en) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2559042C (en) * | 2005-02-14 | 2011-03-08 | Toyo Tanso Co., Ltd. | Tantalum carbide-coated carbon material and production method thereof |
DE102018128558A1 (en) | 2018-11-14 | 2020-05-14 | Aixtron Se | Gas outlet device of a CVD reactor |
CN112501584A (en) * | 2020-11-13 | 2021-03-16 | 南昌大学 | Composite coating based on graphite substrate and preparation method thereof |
CN112374891B (en) * | 2020-11-16 | 2021-11-23 | 南京工业大学 | Graphite base plate surface gradient TaC coating |
CN112680720B (en) | 2020-12-07 | 2022-11-01 | 湖南德智新材料有限公司 | Base plate with composite coating structure for MOCVD equipment and preparation method thereof |
-
2021
- 2021-09-16 DE DE102021123986.9A patent/DE102021123986A1/en active Pending
-
2022
- 2022-09-16 GB GB2213602.2A patent/GB2612892A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
DE102021123986A1 (en) | 2023-03-16 |
GB2612892A (en) | 2023-05-17 |
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