GB202212161D0 - Vacuum pump and vacuum exhaust system - Google Patents
Vacuum pump and vacuum exhaust systemInfo
- Publication number
- GB202212161D0 GB202212161D0 GBGB2212161.0A GB202212161A GB202212161D0 GB 202212161 D0 GB202212161 D0 GB 202212161D0 GB 202212161 A GB202212161 A GB 202212161A GB 202212161 D0 GB202212161 D0 GB 202212161D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- vacuum
- exhaust system
- vacuum pump
- pump
- vacuum exhaust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Non-Positive Displacement Air Blowers (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022093929A JP2023180545A (en) | 2022-06-09 | 2022-06-09 | Vacuum pump, and evacuation system |
Publications (1)
Publication Number | Publication Date |
---|---|
GB202212161D0 true GB202212161D0 (en) | 2022-10-05 |
Family
ID=83902249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB2212161.0A Ceased GB202212161D0 (en) | 2022-06-09 | 2022-08-22 | Vacuum pump and vacuum exhaust system |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2023180545A (en) |
GB (1) | GB202212161D0 (en) |
TW (1) | TW202405313A (en) |
WO (1) | WO2023238804A1 (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3553310B2 (en) * | 1997-03-11 | 2004-08-11 | 株式会社荏原製作所 | Evacuation system |
JP2006342791A (en) * | 2005-05-13 | 2006-12-21 | Boc Edwards Kk | Vacuum pump |
JP2019012812A (en) * | 2017-06-29 | 2019-01-24 | 株式会社荏原製作所 | Exhaust facility system |
FR3093544B1 (en) * | 2019-03-05 | 2021-03-12 | Pfeiffer Vacuum | Turbomolecular vacuum pump and purge process |
-
2022
- 2022-06-09 JP JP2022093929A patent/JP2023180545A/en active Pending
- 2022-08-22 GB GBGB2212161.0A patent/GB202212161D0/en not_active Ceased
-
2023
- 2023-05-18 TW TW112118454A patent/TW202405313A/en unknown
- 2023-06-02 WO PCT/JP2023/020703 patent/WO2023238804A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
TW202405313A (en) | 2024-02-01 |
WO2023238804A1 (en) | 2023-12-14 |
JP2023180545A (en) | 2023-12-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |