GB202209802D0 - Vacuum exhaust system, vacuum pump, and method for cleaning vacuum pump - Google Patents
Vacuum exhaust system, vacuum pump, and method for cleaning vacuum pumpInfo
- Publication number
- GB202209802D0 GB202209802D0 GBGB2209802.4A GB202209802A GB202209802D0 GB 202209802 D0 GB202209802 D0 GB 202209802D0 GB 202209802 A GB202209802 A GB 202209802A GB 202209802 D0 GB202209802 D0 GB 202209802D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- vacuum pump
- vacuum
- exhaust system
- cleaning
- pump
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 238000004140 cleaning Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
- F04B37/16—Means for nullifying unswept space
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
- H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
- H01L21/2015—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate the substrate being of crystalline semiconductor material, e.g. lattice adaptation, heteroepitaxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Non-Positive Displacement Air Blowers (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022050931A JP2023143517A (en) | 2022-03-25 | 2022-03-25 | Evacuation system, vacuum pump, and cleaning method for vacuum pump |
Publications (1)
Publication Number | Publication Date |
---|---|
GB202209802D0 true GB202209802D0 (en) | 2022-08-17 |
Family
ID=82802514
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GBGB2209802.4A Ceased GB202209802D0 (en) | 2022-03-25 | 2022-07-04 | Vacuum exhaust system, vacuum pump, and method for cleaning vacuum pump |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2023143517A (en) |
GB (1) | GB202209802D0 (en) |
TW (1) | TW202403179A (en) |
WO (1) | WO2023182489A1 (en) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3550465B2 (en) * | 1996-08-30 | 2004-08-04 | 株式会社日立製作所 | Turbo vacuum pump and operating method thereof |
JP5190214B2 (en) * | 2007-03-29 | 2013-04-24 | 東京エレクトロン株式会社 | Turbo molecular pump, substrate processing apparatus, and deposit control method for turbo molecular pump |
JP6418838B2 (en) * | 2014-07-31 | 2018-11-07 | エドワーズ株式会社 | Dry pump and exhaust gas treatment method |
JP2017089462A (en) * | 2015-11-06 | 2017-05-25 | エドワーズ株式会社 | Determination system of vacuum pump and vacuum pump |
-
2022
- 2022-03-25 JP JP2022050931A patent/JP2023143517A/en active Pending
- 2022-07-04 GB GBGB2209802.4A patent/GB202209802D0/en not_active Ceased
-
2023
- 2023-03-22 TW TW112110563A patent/TW202403179A/en unknown
- 2023-03-24 WO PCT/JP2023/011783 patent/WO2023182489A1/en unknown
Also Published As
Publication number | Publication date |
---|---|
JP2023143517A (en) | 2023-10-06 |
TW202403179A (en) | 2024-01-16 |
WO2023182489A1 (en) | 2023-09-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
PL3839235T3 (en) | Method and system for controlling dpf regeneration, and engine | |
ZA202001391B (en) | Topology processing method, apparatus, and system | |
EP3815764A4 (en) | System for purifying exhaust gas cleaning liquid and method therefor | |
SG11202009973SA (en) | Exhaust gas cleaning system and method for operating exhaust gas cleaning system | |
EP4169428A4 (en) | Cleaning apparatus including vacuum cleaner and docking station, and control method therefor | |
EP3808906C0 (en) | Robot, system and method for cleaning | |
EP4069954A4 (en) | Reductant delivery system for exhaust gas aftertreatment system | |
GB202209802D0 (en) | Vacuum exhaust system, vacuum pump, and method for cleaning vacuum pump | |
IL288993A (en) | Multiple vacuum chamber exhaust system and method of evacuating multiple vacuum chambers | |
GB202217635D0 (en) | Vacuum exhaust system and cleaning method | |
GB2603897B (en) | Vacuum pump exhaust system | |
FI4123140T3 (en) | Exhaust turbine, supercharger, and method for cleaning exhaust turbine | |
GB202400537D0 (en) | Vacuum exhaust system and vacuum pump | |
GB202212159D0 (en) | Vacuum pump and vacuum exhaust system | |
GB202212161D0 (en) | Vacuum pump and vacuum exhaust system | |
EP4133991A4 (en) | Medical-image processing system, recognition-processing processor, and operation method for medical-image processing system | |
GB202317428D0 (en) | Vacuum pump and operating method for vacuum pump | |
GB202314028D0 (en) | Vacuum pumping system and method | |
EP3858479A4 (en) | Exhaust gas cleaning catalyst, exhaust gas cleaning method, and method for producing exhaust gas cleaning catalyst | |
GB202008675D0 (en) | Vacuum system apparatus and method | |
GB202400677D0 (en) | Abnormality detection device for vacuum pump, vacuum pump system, and abnormality detection method for vacuum pump | |
PL3640444T3 (en) | Exhaust gas cleaning system and method for cleaning exhaust gas | |
GB202210230D0 (en) | Vacuum pump, control device, and control method | |
GB2604863B (en) | Method for operating a vacuum pump and vacuum pump | |
AU2020903518A0 (en) | An Exhaust System, Method and Apparatus |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AT | Applications terminated before publication under section 16(1) |