GB201800816D0 - A method for fabricating a lead-free thin film element and uses thereof - Google Patents

A method for fabricating a lead-free thin film element and uses thereof

Info

Publication number
GB201800816D0
GB201800816D0 GBGB1800816.9A GB201800816A GB201800816D0 GB 201800816 D0 GB201800816 D0 GB 201800816D0 GB 201800816 A GB201800816 A GB 201800816A GB 201800816 D0 GB201800816 D0 GB 201800816D0
Authority
GB
United Kingdom
Prior art keywords
fabricating
lead
thin film
film element
free thin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB1800816.9A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xaar Technology Ltd
Original Assignee
Xaar Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xaar Technology Ltd filed Critical Xaar Technology Ltd
Priority to GBGB1800816.9A priority Critical patent/GB201800816D0/en
Publication of GB201800816D0 publication Critical patent/GB201800816D0/en
Priority to PCT/GB2018/053699 priority patent/WO2019141961A1/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/125—Process of deposition of the inorganic material
    • C23C18/1295—Process of deposition of the inorganic material with after-treatment of the deposited inorganic material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
    • H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
    • H10N30/078—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition by sol-gel deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Thermal Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
GBGB1800816.9A 2018-01-18 2018-01-18 A method for fabricating a lead-free thin film element and uses thereof Ceased GB201800816D0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GBGB1800816.9A GB201800816D0 (en) 2018-01-18 2018-01-18 A method for fabricating a lead-free thin film element and uses thereof
PCT/GB2018/053699 WO2019141961A1 (en) 2018-01-18 2018-12-19 A method for fabricating a lead-free thin film element and uses thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB1800816.9A GB201800816D0 (en) 2018-01-18 2018-01-18 A method for fabricating a lead-free thin film element and uses thereof

Publications (1)

Publication Number Publication Date
GB201800816D0 true GB201800816D0 (en) 2018-03-07

Family

ID=61283630

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB1800816.9A Ceased GB201800816D0 (en) 2018-01-18 2018-01-18 A method for fabricating a lead-free thin film element and uses thereof

Country Status (2)

Country Link
GB (1) GB201800816D0 (en)
WO (1) WO2019141961A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115084393A (en) * 2021-03-11 2022-09-20 吉林大学 Perovskite thin film and preparation method thereof, solar cell and light-emitting device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6072207A (en) * 1991-02-25 2000-06-06 Symetrix Corporation Process for fabricating layered superlattice materials and making electronic devices including same
US6133092A (en) * 1998-07-24 2000-10-17 Symetrix Corporation Low temperature process for fabricating layered superlattice materials and making electronic devices including same

Also Published As

Publication number Publication date
WO2019141961A1 (en) 2019-07-25

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)