GB201222645D0 - Vacuum processing system - Google Patents

Vacuum processing system

Info

Publication number
GB201222645D0
GB201222645D0 GB201222645A GB201222645A GB201222645D0 GB 201222645 D0 GB201222645 D0 GB 201222645D0 GB 201222645 A GB201222645 A GB 201222645A GB 201222645 A GB201222645 A GB 201222645A GB 201222645 D0 GB201222645 D0 GB 201222645D0
Authority
GB
United Kingdom
Prior art keywords
processing system
vacuum processing
vacuum
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB201222645A
Other versions
GB2508912A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mantis Deposition Ltd
Original Assignee
Mantis Deposition Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mantis Deposition Ltd filed Critical Mantis Deposition Ltd
Priority to GB201222645A priority Critical patent/GB2508912A/en
Publication of GB201222645D0 publication Critical patent/GB201222645D0/en
Publication of GB2508912A publication Critical patent/GB2508912A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
GB201222645A 2012-12-14 2012-12-14 Vacuum chamber for processing semiconductor wafers Withdrawn GB2508912A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB201222645A GB2508912A (en) 2012-12-14 2012-12-14 Vacuum chamber for processing semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB201222645A GB2508912A (en) 2012-12-14 2012-12-14 Vacuum chamber for processing semiconductor wafers

Publications (2)

Publication Number Publication Date
GB201222645D0 true GB201222645D0 (en) 2013-01-30
GB2508912A GB2508912A (en) 2014-06-18

Family

ID=47630795

Family Applications (1)

Application Number Title Priority Date Filing Date
GB201222645A Withdrawn GB2508912A (en) 2012-12-14 2012-12-14 Vacuum chamber for processing semiconductor wafers

Country Status (1)

Country Link
GB (1) GB2508912A (en)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH074516B2 (en) * 1985-09-21 1995-01-25 日電アネルバ株式会社 Vacuum container with skeletal structure
EP0705642A1 (en) * 1994-10-05 1996-04-10 GRETAG Aktiengesellschaft Vacuum chamber system
DE19857979A1 (en) * 1998-12-16 2000-06-21 Aurion Anlagentechnik Gmbh Vacuum chamber for drying, melting, surface treatment, PVD and CVD coating, etching and other plasma processes comprises functional units flange-connected to frame structure of interlocked profiles
JP2004286165A (en) * 2003-03-24 2004-10-14 Hitachi Kokusai Electric Inc Manufacturing method of chamber, board processing unit and semiconductor unit using this
JP2008082391A (en) * 2006-09-26 2008-04-10 Toshiba Corp Vacuum chamber
JP4843572B2 (en) * 2007-07-06 2011-12-21 株式会社アルバック Multi-chamber type vacuum processing equipment
DE102007057644A1 (en) * 2007-11-28 2009-06-04 Oerlikon Trading Ag, Trübbach Vacuum chamber on a frame basis for coating systems
DE102009007897A1 (en) * 2009-02-08 2010-08-12 Oerlikon Trading Ag, Trübbach Vacuum chamber for coating plants and method for producing a vacuum chamber for coating plants

Also Published As

Publication number Publication date
GB2508912A (en) 2014-06-18

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)