GB2007158B - Forming a resist pattern ao a substrate - Google Patents
Forming a resist pattern ao a substrateInfo
- Publication number
- GB2007158B GB2007158B GB7841204A GB7841204A GB2007158B GB 2007158 B GB2007158 B GB 2007158B GB 7841204 A GB7841204 A GB 7841204A GB 7841204 A GB7841204 A GB 7841204A GB 2007158 B GB2007158 B GB 2007158B
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- forming
- resist pattern
- resist
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0277—Electrolithographic processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US84552777A | 1977-10-26 | 1977-10-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2007158A GB2007158A (en) | 1979-05-16 |
GB2007158B true GB2007158B (en) | 1982-02-10 |
Family
ID=25295430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB7841204A Expired GB2007158B (en) | 1977-10-26 | 1978-10-19 | Forming a resist pattern ao a substrate |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5496372A (en) |
DE (1) | DE2840553A1 (en) |
FR (1) | FR2407499A1 (en) |
GB (1) | GB2007158B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ATE14259T1 (en) * | 1981-08-07 | 1985-07-15 | Fraunhofer Ges Forschung | PROCESSES FOR THE MANUFACTURE OF MICROSTRUCTURES ON SOLID BODIES. |
DE3235064A1 (en) * | 1982-09-22 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | TUNNEL CATHODE MASK FOR ELECTRON LITHOGRAPHY, METHOD FOR THEIR PRODUCTION AND METHOD FOR THEIR OPERATION |
DE3533632A1 (en) * | 1985-09-20 | 1987-04-02 | Siemens Ag | Method for producing a gate array at the customer's |
US6042994A (en) * | 1998-01-20 | 2000-03-28 | Alliedsignal Inc. | Nanoporous silica dielectric films modified by electron beam exposure and having low dielectric constant and low water content |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3080481A (en) * | 1959-04-17 | 1963-03-05 | Sprague Electric Co | Method of making transistors |
-
1978
- 1978-09-14 JP JP11246678A patent/JPS5496372A/en active Granted
- 1978-09-18 DE DE19782840553 patent/DE2840553A1/en not_active Withdrawn
- 1978-09-26 FR FR7828300A patent/FR2407499A1/en active Granted
- 1978-10-19 GB GB7841204A patent/GB2007158B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5496372A (en) | 1979-07-30 |
DE2840553A1 (en) | 1979-05-03 |
JPS5653207B2 (en) | 1981-12-17 |
FR2407499A1 (en) | 1979-05-25 |
GB2007158A (en) | 1979-05-16 |
FR2407499B1 (en) | 1982-07-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19961019 |