GB191312585A - Improvements relating to Photo-mechanical Printing. - Google Patents
Improvements relating to Photo-mechanical Printing.Info
- Publication number
- GB191312585A GB191312585A GB191312585DA GB191312585A GB 191312585 A GB191312585 A GB 191312585A GB 191312585D A GB191312585D A GB 191312585DA GB 191312585 A GB191312585 A GB 191312585A
- Authority
- GB
- United Kingdom
- Prior art keywords
- solvent
- resist
- action
- bichromate
- oil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
12,585. Tellkampf, A. June 22, 1912, [Convention date]. Etching.-In the preparation of a printing- surface in which a resist of bitumen or the like is used between the bichromated albumen sensitized layer which is exposed under a halftone negative and developed with water, a solvent composed of alcoholic liquids mixed with oils or fats is employed for dissolving the resist under the developed image. Such mixtures can stand for a long time on the bichromate layer without soaking into it, and the solvent action is only in a downward direction and does not have an undercutting action. A small quantity of acid may be added to the resist solvent to increase its action. The resist solvent may be applied in such a way as to form a thin film, by a brush, roller, cotton-wool, or moleskin, or by sawdust, corkdust, bran, or the like. The alcohol evaporates, leaving the oil on the plate, which has no solvent action either on the bichromate or the resist, and a quick termination to the solvent action is thus effected. The oil is eventually removed by means of turpentine, benzine, or benzole.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE191312585X | 1912-06-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB191312585A true GB191312585A (en) | 1913-10-23 |
Family
ID=32337494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB191312585D Expired GB191312585A (en) | 1912-06-22 | 1913-05-29 | Improvements relating to Photo-mechanical Printing. |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB191312585A (en) |
-
1913
- 1913-05-29 GB GB191312585D patent/GB191312585A/en not_active Expired
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE2529054C2 (en) | Process for the production of a resist image which is negative for the original | |
US5863710A (en) | Developer solution for photolithographic patterning | |
US3573975A (en) | Photochemical fabrication process | |
US20110020756A1 (en) | Calixarene Blended Molecular Glass Photoresists and Processes of Use | |
US5731132A (en) | Metal-ion free, aqueous developer for photoresist layers | |
DE112011103052T5 (en) | Photoresist composition for negative development and patterning process with it | |
DE2728886A1 (en) | CORROSION COMPOSITIONS AND METHOD OF USING THEREOF | |
EP0009031A1 (en) | Desensitizing solution and process for treating a diazo photosensitive printing plate. | |
DE4124426A1 (en) | LIGHT-SENSITIVE COMPOSITION | |
KR910016902A (en) | Wet-Etching Methods and Compositions | |
DE2007208A1 (en) | Positive copy varnish | |
GB438960A (en) | Improvements in photo-mechanical resists and compositions therefor | |
TW202204592A (en) | Electronic device manufacturing aqueous solution, method for manufacturing resist pattern and method for manufacturing device | |
US4351895A (en) | Deletion fluid for positive printing plates | |
US3130051A (en) | Process for producing negative working offset diazo printing plates | |
GB191312585A (en) | Improvements relating to Photo-mechanical Printing. | |
US2042003A (en) | Printing element and method of making same | |
DE3685766T2 (en) | PHOTO PAINT IMAGE PRODUCTION METHOD. | |
SU595694A1 (en) | Negative photoresist composition | |
US1911955A (en) | Phototransfer process | |
US2389504A (en) | Process of making reticles or the like | |
GB692366A (en) | Improvements in or relating to lithographic printing | |
US1957850A (en) | Printing plate and method of making the same | |
JPH0566570A (en) | Resist developer and pattern forming method | |
EP0221428A2 (en) | Liquid for the treatment of a photoresist composition, and process therefor |