GB191312585A - Improvements relating to Photo-mechanical Printing. - Google Patents

Improvements relating to Photo-mechanical Printing.

Info

Publication number
GB191312585A
GB191312585A GB191312585DA GB191312585A GB 191312585 A GB191312585 A GB 191312585A GB 191312585D A GB191312585D A GB 191312585DA GB 191312585 A GB191312585 A GB 191312585A
Authority
GB
United Kingdom
Prior art keywords
solvent
resist
action
bichromate
oil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Inventor
Adolf Tellkampf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of GB191312585A publication Critical patent/GB191312585A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/325Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

12,585. Tellkampf, A. June 22, 1912, [Convention date]. Etching.-In the preparation of a printing- surface in which a resist of bitumen or the like is used between the bichromated albumen sensitized layer which is exposed under a halftone negative and developed with water, a solvent composed of alcoholic liquids mixed with oils or fats is employed for dissolving the resist under the developed image. Such mixtures can stand for a long time on the bichromate layer without soaking into it, and the solvent action is only in a downward direction and does not have an undercutting action. A small quantity of acid may be added to the resist solvent to increase its action. The resist solvent may be applied in such a way as to form a thin film, by a brush, roller, cotton-wool, or moleskin, or by sawdust, corkdust, bran, or the like. The alcohol evaporates, leaving the oil on the plate, which has no solvent action either on the bichromate or the resist, and a quick termination to the solvent action is thus effected. The oil is eventually removed by means of turpentine, benzine, or benzole.
GB191312585D 1912-06-22 1913-05-29 Improvements relating to Photo-mechanical Printing. Expired GB191312585A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE191312585X 1912-06-22

Publications (1)

Publication Number Publication Date
GB191312585A true GB191312585A (en) 1913-10-23

Family

ID=32337494

Family Applications (1)

Application Number Title Priority Date Filing Date
GB191312585D Expired GB191312585A (en) 1912-06-22 1913-05-29 Improvements relating to Photo-mechanical Printing.

Country Status (1)

Country Link
GB (1) GB191312585A (en)

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