GB1546971A - Light-sensitive compositions - Google Patents

Light-sensitive compositions

Info

Publication number
GB1546971A
GB1546971A GB1703676A GB1703676A GB1546971A GB 1546971 A GB1546971 A GB 1546971A GB 1703676 A GB1703676 A GB 1703676A GB 1703676 A GB1703676 A GB 1703676A GB 1546971 A GB1546971 A GB 1546971A
Authority
GB
United Kingdom
Prior art keywords
light
sensitive compositions
sensitive
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1703676A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
American Hoechst Corp
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Hoechst Corp, Hoechst Celanese Corp filed Critical American Hoechst Corp
Publication of GB1546971A publication Critical patent/GB1546971A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
GB1703676A 1975-04-29 1976-04-27 Light-sensitive compositions Expired GB1546971A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US57266275A 1975-04-29 1975-04-29

Publications (1)

Publication Number Publication Date
GB1546971A true GB1546971A (en) 1979-06-06

Family

ID=24288819

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1703676A Expired GB1546971A (en) 1975-04-29 1976-04-27 Light-sensitive compositions

Country Status (4)

Country Link
BE (1) BE841190A (enExample)
DE (1) DE2617088A1 (enExample)
FR (1) FR2309896A1 (enExample)
GB (1) GB1546971A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1119447A (en) * 1978-09-06 1982-03-09 John P. Vikesland Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer
DE3023201A1 (de) * 1980-06-21 1982-01-07 Hoechst Ag, 6000 Frankfurt Positiv arbeitendes strahlungsempfindliches gemisch
EP0087262A1 (en) * 1982-02-22 1983-08-31 Minnesota Mining And Manufacturing Company Positive acting photosensitive compositions
DE3445276A1 (de) * 1984-12-12 1986-06-19 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
US5183722A (en) * 1989-12-01 1993-02-02 Tosoh Corporation Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition
US6462107B1 (en) * 1997-12-23 2002-10-08 The Texas A&M University System Photoimageable compositions and films for printed wiring board manufacture

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1538320A (fr) * 1965-11-02 1968-09-06 Ferrania Spa Procédé de fabrication de matrices présensibilisées pour l'impression offset
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
AR205345A1 (es) * 1973-06-20 1976-04-30 Minnesota Mining & Mfg Composicion organofilica fotosensible y placa litografica preparada con la misma

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2233288A1 (en) * 2009-03-23 2010-09-29 Founder Fine Chemical Industry Co., Ltd. Radiation sensitive composition and method for preparing radiation sensitive composition

Also Published As

Publication number Publication date
BE841190A (fr) 1976-10-27
FR2309896A1 (fr) 1976-11-26
DE2617088A1 (de) 1976-11-11
FR2309896B1 (enExample) 1979-04-20

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee