GB1468747A - Producing composite images or to editing of images in imaging materials - Google Patents

Producing composite images or to editing of images in imaging materials

Info

Publication number
GB1468747A
GB1468747A GB3616176A GB3616176A GB1468747A GB 1468747 A GB1468747 A GB 1468747A GB 3616176 A GB3616176 A GB 3616176A GB 3616176 A GB3616176 A GB 3616176A GB 1468747 A GB1468747 A GB 1468747A
Authority
GB
United Kingdom
Prior art keywords
images
layers
opaque
resist
areas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB3616176A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Energy Conversion Devices Inc
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of GB1468747A publication Critical patent/GB1468747A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
GB3616176A 1973-04-12 1974-04-10 Producing composite images or to editing of images in imaging materials Expired GB1468747A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/350,372 US4379827A (en) 1971-12-08 1973-04-12 Imaging structure with tellurium metal film and energy sensitive material thereon

Publications (1)

Publication Number Publication Date
GB1468747A true GB1468747A (en) 1977-03-30

Family

ID=23376419

Family Applications (2)

Application Number Title Priority Date Filing Date
GB1594674A Expired GB1468746A (en) 1973-04-12 1974-04-10 Imaging materials
GB3616176A Expired GB1468747A (en) 1973-04-12 1974-04-10 Producing composite images or to editing of images in imaging materials

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB1594674A Expired GB1468746A (en) 1973-04-12 1974-04-10 Imaging materials

Country Status (11)

Country Link
US (1) US4379827A (enExample)
JP (1) JPS502925A (enExample)
AU (1) AU2837877A (enExample)
BE (1) BE860855Q (enExample)
CA (1) CA1017614A (enExample)
DE (1) DE2413154A1 (enExample)
FR (1) FR2225770B1 (enExample)
GB (2) GB1468746A (enExample)
IL (1) IL44251A0 (enExample)
IT (1) IT1020538B (enExample)
NL (1) NL7403758A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4552826A (en) * 1983-10-13 1985-11-12 Minnesota Mining And Manufacturing Company Method of forming composite image as in add-on non-silver microfiche

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5228905U (enExample) * 1975-08-21 1977-02-28
JPS5228906U (enExample) * 1975-08-21 1977-02-28
JPS5247801U (enExample) * 1975-10-02 1977-04-05
US4138262A (en) * 1976-09-20 1979-02-06 Energy Conversion Devices, Inc. Imaging film comprising bismuth image-forming layer
JPS5559758U (enExample) * 1978-10-17 1980-04-23
JPS56122130A (en) * 1980-02-28 1981-09-25 Sharp Corp Method for forming pattern of thin film transistor
US4364995A (en) 1981-02-04 1982-12-21 Minnesota Mining And Manufacturing Company Metal/metal oxide coatings
EP0082588A3 (en) * 1981-11-02 1983-10-26 Konica Corporation Photolithographic elements for the production of metal images
US4670372A (en) * 1984-10-15 1987-06-02 Petrarch Systems, Inc. Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant
GB2252844A (en) * 1991-02-14 1992-08-19 S B Services Pneumatic circuit track board
WO2006034600A1 (de) * 2004-09-29 2006-04-06 3D Ag Archivierungsmittel zur dauerhaften speicherung von optisch wahrnehmbaren informationen
US8933291B2 (en) * 2010-08-17 2015-01-13 Kimberly-Clark Worldwide, Inc. Dehydration sensors having buffered inks
CN107924123B (zh) * 2015-08-24 2021-08-06 学校法人关西大学 光刻用材料以及其的制造方法、光刻用组合物、图案形成方法、以及、化合物、树脂、以及它们的纯化方法
KR20190003528A (ko) * 2016-04-28 2019-01-09 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 레지스트 하층막 형성용 조성물, 리소그래피용 하층막, 및, 패턴 형성방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2914404A (en) * 1953-07-31 1959-11-24 Blaupunkt Werke Gmbh Method of producing two-dimensional circuits or circuit elements on supporting bases
NL255517A (enExample) * 1959-09-04
BE639500A (enExample) * 1962-12-14
GB1172517A (en) * 1965-12-02 1969-12-03 Rotaprint Ltd Photochemical Production of Plates for Offset Lithography
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3551154A (en) * 1966-12-28 1970-12-29 Ferrania Spa Light sensitive article comprising a quinone diazide and polymeric binder
US3639185A (en) * 1969-06-30 1972-02-01 Ibm Novel etchant and process for etching thin metal films
US3759711A (en) * 1970-09-16 1973-09-18 Eastman Kodak Co Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym
BE792434A (fr) * 1971-12-08 1973-03-30 Energy Conversion Devices Inc Matiere formatrice d'images et procede de production d'une image

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4552826A (en) * 1983-10-13 1985-11-12 Minnesota Mining And Manufacturing Company Method of forming composite image as in add-on non-silver microfiche

Also Published As

Publication number Publication date
AU2837877A (en) 1977-11-24
IT1020538B (it) 1977-12-30
DE2413154A1 (de) 1974-10-31
FR2225770A1 (enExample) 1974-11-08
FR2225770B1 (enExample) 1977-10-14
IL44251A0 (en) 1974-05-16
AU6610574A (en) 1975-08-28
GB1468746A (en) 1977-03-30
NL7403758A (enExample) 1974-10-15
BE860855Q (fr) 1978-03-16
US4379827A (en) 1983-04-12
CA1017614A (en) 1977-09-20
JPS502925A (enExample) 1975-01-13

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee