GB1459272A - Optical projection and scanning apparatus - Google Patents

Optical projection and scanning apparatus

Info

Publication number
GB1459272A
GB1459272A GB1048474A GB1048474A GB1459272A GB 1459272 A GB1459272 A GB 1459272A GB 1048474 A GB1048474 A GB 1048474A GB 1048474 A GB1048474 A GB 1048474A GB 1459272 A GB1459272 A GB 1459272A
Authority
GB
United Kingdom
Prior art keywords
wafer
mask
mirror
carriage
arcuate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1048474A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of GB1459272A publication Critical patent/GB1459272A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
    • B23Q1/36—Springs
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB1048474A 1973-03-09 1974-03-08 Optical projection and scanning apparatus Expired GB1459272A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33986073A 1973-03-09 1973-03-09

Publications (1)

Publication Number Publication Date
GB1459272A true GB1459272A (en) 1976-12-22

Family

ID=23330939

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1048474A Expired GB1459272A (en) 1973-03-09 1974-03-08 Optical projection and scanning apparatus

Country Status (7)

Country Link
JP (1) JPS5026561A (enrdf_load_stackoverflow)
CA (1) CA1011979A (enrdf_load_stackoverflow)
CH (1) CH569985A5 (enrdf_load_stackoverflow)
DE (1) DE2410924A1 (enrdf_load_stackoverflow)
FR (1) FR2220807B3 (enrdf_load_stackoverflow)
GB (1) GB1459272A (enrdf_load_stackoverflow)
IT (1) IT1011068B (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3878419A (en) * 1973-12-17 1975-04-15 Carlo F Lafiandra Precision base mercury vapor lamp
CA1090183A (en) * 1976-09-22 1980-11-25 David A. Markle System for illuminating an annular field
JPS5467443A (en) * 1977-11-09 1979-05-30 Canon Inc Observer
JPS54123877A (en) * 1978-03-18 1979-09-26 Canon Inc Baking unit
JPS5576444U (enrdf_load_stackoverflow) * 1978-11-13 1980-05-26
FR2586853B1 (fr) * 1985-08-30 1988-07-29 Suisse Electronique Microtech Dispositif de micropositionnement
JP2567811B2 (ja) * 1994-02-14 1996-12-25 キヤノン株式会社 走査型露光装置

Also Published As

Publication number Publication date
CA1011979A (en) 1977-06-14
JPS5026561A (enrdf_load_stackoverflow) 1975-03-19
DE2410924A1 (de) 1974-09-26
FR2220807A1 (enrdf_load_stackoverflow) 1974-10-04
IT1011068B (it) 1977-01-20
CH569985A5 (enrdf_load_stackoverflow) 1975-11-28
FR2220807B3 (enrdf_load_stackoverflow) 1978-11-10

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee