FR2220807A1 - - Google Patents

Info

Publication number
FR2220807A1
FR2220807A1 FR7407614A FR7407614A FR2220807A1 FR 2220807 A1 FR2220807 A1 FR 2220807A1 FR 7407614 A FR7407614 A FR 7407614A FR 7407614 A FR7407614 A FR 7407614A FR 2220807 A1 FR2220807 A1 FR 2220807A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7407614A
Other languages
French (fr)
Other versions
FR2220807B3 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of FR2220807A1 publication Critical patent/FR2220807A1/fr
Application granted granted Critical
Publication of FR2220807B3 publication Critical patent/FR2220807B3/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
    • B23Q1/36—Springs
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7407614A 1973-03-09 1974-03-06 Expired FR2220807B3 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33986073A 1973-03-09 1973-03-09

Publications (2)

Publication Number Publication Date
FR2220807A1 true FR2220807A1 (enrdf_load_stackoverflow) 1974-10-04
FR2220807B3 FR2220807B3 (enrdf_load_stackoverflow) 1978-11-10

Family

ID=23330939

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7407614A Expired FR2220807B3 (enrdf_load_stackoverflow) 1973-03-09 1974-03-06

Country Status (7)

Country Link
JP (1) JPS5026561A (enrdf_load_stackoverflow)
CA (1) CA1011979A (enrdf_load_stackoverflow)
CH (1) CH569985A5 (enrdf_load_stackoverflow)
DE (1) DE2410924A1 (enrdf_load_stackoverflow)
FR (1) FR2220807B3 (enrdf_load_stackoverflow)
GB (1) GB1459272A (enrdf_load_stackoverflow)
IT (1) IT1011068B (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2586853A1 (fr) * 1985-08-30 1987-03-06 Suisse Electronique Microtech Dispositif de micropositionnement

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3878419A (en) * 1973-12-17 1975-04-15 Carlo F Lafiandra Precision base mercury vapor lamp
CA1090183A (en) * 1976-09-22 1980-11-25 David A. Markle System for illuminating an annular field
JPS5467443A (en) * 1977-11-09 1979-05-30 Canon Inc Observer
JPS54123877A (en) * 1978-03-18 1979-09-26 Canon Inc Baking unit
JPS5576444U (enrdf_load_stackoverflow) * 1978-11-13 1980-05-26
JP2567811B2 (ja) * 1994-02-14 1996-12-25 キヤノン株式会社 走査型露光装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2586853A1 (fr) * 1985-08-30 1987-03-06 Suisse Electronique Microtech Dispositif de micropositionnement
EP0218546A1 (fr) * 1985-08-30 1987-04-15 Centre Suisse D'electronique Et De Microtechnique S.A. Dispositif de micropositionnement

Also Published As

Publication number Publication date
GB1459272A (en) 1976-12-22
CA1011979A (en) 1977-06-14
JPS5026561A (enrdf_load_stackoverflow) 1975-03-19
IT1011068B (it) 1977-01-20
DE2410924A1 (de) 1974-09-26
FR2220807B3 (enrdf_load_stackoverflow) 1978-11-10
CH569985A5 (enrdf_load_stackoverflow) 1975-11-28

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Legal Events

Date Code Title Description
JD Different final judgements