GB1432090A - Vapour source assembly - Google Patents
Vapour source assemblyInfo
- Publication number
- GB1432090A GB1432090A GB2534874A GB2534874A GB1432090A GB 1432090 A GB1432090 A GB 1432090A GB 2534874 A GB2534874 A GB 2534874A GB 2534874 A GB2534874 A GB 2534874A GB 1432090 A GB1432090 A GB 1432090A
- Authority
- GB
- United Kingdom
- Prior art keywords
- crucible
- electron beam
- magnetic
- source assembly
- vapour source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 abstract 4
- 230000008020 evaporation Effects 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- 229920006384 Airco Polymers 0.000 abstract 1
- 229910000831 Steel Inorganic materials 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000010959 steel Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Toxicology (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
1432090 Vapour source assembly AIRCO Inc 7 June 1974 [8 Aug 1973] 25348/74 Heading C7F A vapour source assembly comprises a crucible 12 for material 13 to be vapourized, an electron beam gun 14, deflecting means for producing at least one magnetic field having lines of force transverse to the electron beam to deflect it along an arcuate path from gun 14 to crucible 12, said deflecting means including a pair of magnetic pole members 16, 17, positioned on opposite sides of the crucible, and magnetic shield means positioned between said pole members and said crucible to shunt lines of magnetic force around said crucible. Said shield means may be a steel cylinder 19 around crucible 12 and need only extend over half the liquid depth. The crucible may be watercooled via inlet 33 and pipes 31, and the electron beam may be caused to sweep the crucible surface by varying the current in 3 coils in U-configuration, only one coil 103 of which is shown; the electron beam source may be a heated W filament 61 with accelerating anode 91 and the beam 15 passes as shown to the crucible; evaporation of Al is referred to. The magnetic shielding reduces undesirable disruption of the beam 15, leading to more regular evaporation.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US38648973A | 1973-08-08 | 1973-08-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1432090A true GB1432090A (en) | 1976-04-14 |
Family
ID=23525795
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB2534874A Expired GB1432090A (en) | 1973-08-08 | 1974-06-07 | Vapour source assembly |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5325554B2 (en) |
CA (1) | CA1000803A (en) |
CH (1) | CH583301A5 (en) |
FR (1) | FR2240300B1 (en) |
GB (1) | GB1432090A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2138449A (en) * | 1983-04-22 | 1984-10-24 | White Eng Co | Method for pure ion plating using magnetic fields |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4891821A (en) * | 1989-03-27 | 1990-01-02 | Hanks Charles W | Magnetic correcting fence for adjacent e-guns |
-
1974
- 1974-05-31 CA CA201,366A patent/CA1000803A/en not_active Expired
- 1974-06-07 GB GB2534874A patent/GB1432090A/en not_active Expired
- 1974-06-18 FR FR7421172A patent/FR2240300B1/fr not_active Expired
- 1974-06-25 CH CH870674A patent/CH583301A5/xx not_active IP Right Cessation
- 1974-07-16 JP JP8163374A patent/JPS5325554B2/ja not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2138449A (en) * | 1983-04-22 | 1984-10-24 | White Eng Co | Method for pure ion plating using magnetic fields |
Also Published As
Publication number | Publication date |
---|---|
JPS5050275A (en) | 1975-05-06 |
CH583301A5 (en) | 1976-12-31 |
FR2240300A1 (en) | 1975-03-07 |
DE2429854B2 (en) | 1976-10-14 |
DE2429854A1 (en) | 1975-03-06 |
FR2240300B1 (en) | 1976-12-24 |
CA1000803A (en) | 1976-11-30 |
JPS5325554B2 (en) | 1978-07-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PE20 | Patent expired after termination of 20 years |
Effective date: 19940606 |