GB1420888A - Photopolymerization of ethylenically unsaturated organic compounds - Google Patents

Photopolymerization of ethylenically unsaturated organic compounds

Info

Publication number
GB1420888A
GB1420888A GB724174A GB724174A GB1420888A GB 1420888 A GB1420888 A GB 1420888A GB 724174 A GB724174 A GB 724174A GB 724174 A GB724174 A GB 724174A GB 1420888 A GB1420888 A GB 1420888A
Authority
GB
United Kingdom
Prior art keywords
photopolymerization
ethylenically unsaturated
organic compounds
unsaturated organic
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB724174A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeneca Inc
Original Assignee
ICI Americas Inc
ICI United States Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICI Americas Inc, ICI United States Inc filed Critical ICI Americas Inc
Publication of GB1420888A publication Critical patent/GB1420888A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/01Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to unsaturated polyesters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/124Carbonyl compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/126Halogen compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/134Brightener containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
GB724174A 1973-03-16 1974-02-18 Photopolymerization of ethylenically unsaturated organic compounds Expired GB1420888A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US341854A US3860429A (en) 1973-03-16 1973-03-16 Photopolymerization of ethylenically unsaturated organic compounds

Publications (1)

Publication Number Publication Date
GB1420888A true GB1420888A (en) 1976-01-14

Family

ID=23339291

Family Applications (1)

Application Number Title Priority Date Filing Date
GB724174A Expired GB1420888A (en) 1973-03-16 1974-02-18 Photopolymerization of ethylenically unsaturated organic compounds

Country Status (7)

Country Link
US (1) US3860429A (enExample)
JP (1) JPS49128086A (enExample)
CA (1) CA1012397A (enExample)
DE (1) DE2410219A1 (enExample)
FR (1) FR2221466B1 (enExample)
GB (1) GB1420888A (enExample)
IT (1) IT1011064B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2204050A (en) * 1987-04-01 1988-11-02 Yokohama Rubber Co Ltd U-V curable resin composition for coating optical fibres

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1603908A (en) * 1978-05-31 1981-12-02 Kodak Ltd Radiationsensitive materials
RU2168707C2 (ru) * 1997-09-19 2001-06-10 Инофирма Корнинг Инкорпорейтед Объемная фазовая голограмма и способ ее получения
US8007982B2 (en) * 2006-12-20 2011-08-30 Sony Corporation Optical information recording medium

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3090664A (en) * 1958-03-31 1963-05-21 Du Pont Graft polymerizing an unsaturated organic acid or salt thereof onto a nitrogen containing polymer substrate
BE606744A (enExample) * 1960-08-10
US3511687A (en) * 1964-04-16 1970-05-12 Sherwin Williams Co High energy curing of photopolymerizable nonair inhibited polyester resin coatings
US3388995A (en) * 1964-08-10 1968-06-18 Gen Aniline & Film Corp Photopolymer offset printing plates
GB1137392A (en) * 1965-02-10 1968-12-18 Ici Ltd Addition polymerisation on a substrate
GB1123103A (en) * 1966-08-22 1968-08-14 Agfa Gevaert Nv Process for the photopolymerisation of ethylenically unsaturated monomers
US3374160A (en) * 1966-10-26 1968-03-19 Gen Motors Corp Photopolymerization with o-bromoacetophenone as a photoinitiator
FR2071069A5 (enExample) * 1969-12-17 1971-09-17 Progil
JPS5034964B1 (enExample) * 1970-03-30 1975-11-12
US3715211A (en) * 1971-02-01 1973-02-06 Horizons Inc Process and product of cold sealing an anodized aluminum article by a photo-polymerization process
US3711287A (en) * 1971-05-19 1973-01-16 Eastman Kodak Co Photoresist compositions
US3715293A (en) * 1971-12-17 1973-02-06 Union Carbide Corp Acetophenone-type photosensitizers for radiation curable coatings

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2204050A (en) * 1987-04-01 1988-11-02 Yokohama Rubber Co Ltd U-V curable resin composition for coating optical fibres
GB2204050B (en) * 1987-04-01 1991-04-24 Yokohama Rubber Co Ltd Optical fibre coated with an ultraviolet-ray curable resin composition

Also Published As

Publication number Publication date
IT1011064B (it) 1977-01-20
JPS49128086A (enExample) 1974-12-07
CA1012397A (en) 1977-06-21
FR2221466B1 (enExample) 1978-01-06
DE2410219A1 (de) 1974-09-19
US3860429A (en) 1975-01-14
FR2221466A1 (enExample) 1974-10-11

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee